JP2008288593A - 薄膜トランジスタのための半導体レイヤ - Google Patents
薄膜トランジスタのための半導体レイヤ Download PDFInfo
- Publication number
- JP2008288593A JP2008288593A JP2008129208A JP2008129208A JP2008288593A JP 2008288593 A JP2008288593 A JP 2008288593A JP 2008129208 A JP2008129208 A JP 2008129208A JP 2008129208 A JP2008129208 A JP 2008129208A JP 2008288593 A JP2008288593 A JP 2008288593A
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- JP
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- Prior art keywords
- zinc
- solution
- semiconductor layer
- thin film
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
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- 239000004065 semiconductor Substances 0.000 title claims abstract description 47
- 239000010409 thin film Substances 0.000 title claims abstract description 21
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 claims abstract description 79
- 239000011787 zinc oxide Substances 0.000 claims abstract description 39
- 239000000758 substrate Substances 0.000 claims abstract description 30
- 239000008139 complexing agent Substances 0.000 claims abstract description 24
- 238000000034 method Methods 0.000 claims abstract description 22
- 238000004519 manufacturing process Methods 0.000 claims abstract description 8
- 238000010438 heat treatment Methods 0.000 claims description 27
- 150000003751 zinc Chemical class 0.000 claims description 19
- ONDPHDOFVYQSGI-UHFFFAOYSA-N zinc nitrate Chemical compound [Zn+2].[O-][N+]([O-])=O.[O-][N+]([O-])=O ONDPHDOFVYQSGI-UHFFFAOYSA-N 0.000 claims description 12
- VNDYJBBGRKZCSX-UHFFFAOYSA-L zinc bromide Chemical compound Br[Zn]Br VNDYJBBGRKZCSX-UHFFFAOYSA-L 0.000 claims description 6
- JIAARYAFYJHUJI-UHFFFAOYSA-L zinc dichloride Chemical compound [Cl-].[Cl-].[Zn+2] JIAARYAFYJHUJI-UHFFFAOYSA-L 0.000 claims description 6
- ZOIORXHNWRGPMV-UHFFFAOYSA-N acetic acid;zinc Chemical compound [Zn].CC(O)=O.CC(O)=O ZOIORXHNWRGPMV-UHFFFAOYSA-N 0.000 claims description 3
- 150000001732 carboxylic acid derivatives Chemical group 0.000 claims description 3
- 239000004246 zinc acetate Substances 0.000 claims description 3
- 229940102001 zinc bromide Drugs 0.000 claims description 3
- 239000011592 zinc chloride Substances 0.000 claims description 3
- 235000005074 zinc chloride Nutrition 0.000 claims description 3
- NWONKYPBYAMBJT-UHFFFAOYSA-L zinc sulfate Chemical compound [Zn+2].[O-]S([O-])(=O)=O NWONKYPBYAMBJT-UHFFFAOYSA-L 0.000 claims description 3
- 229960001763 zinc sulfate Drugs 0.000 claims description 3
- 229910000368 zinc sulfate Inorganic materials 0.000 claims description 3
- 150000004677 hydrates Chemical class 0.000 claims description 2
- NHXVNEDMKGDNPR-UHFFFAOYSA-N zinc;pentane-2,4-dione Chemical compound [Zn+2].CC(=O)[CH-]C(C)=O.CC(=O)[CH-]C(C)=O NHXVNEDMKGDNPR-UHFFFAOYSA-N 0.000 claims description 2
- ZPEJZWGMHAKWNL-UHFFFAOYSA-L zinc;oxalate Chemical compound [Zn+2].[O-]C(=O)C([O-])=O ZPEJZWGMHAKWNL-UHFFFAOYSA-L 0.000 claims 1
- 230000002349 favourable effect Effects 0.000 abstract 1
- 239000000243 solution Substances 0.000 description 38
- VKYKSIONXSXAKP-UHFFFAOYSA-N hexamethylenetetramine Chemical group C1N(C2)CN3CN1CN2C3 VKYKSIONXSXAKP-UHFFFAOYSA-N 0.000 description 21
- 239000011701 zinc Substances 0.000 description 19
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 13
- 229910052725 zinc Inorganic materials 0.000 description 13
- 235000010299 hexamethylene tetramine Nutrition 0.000 description 10
- 239000004312 hexamethylene tetramine Substances 0.000 description 10
- 238000004140 cleaning Methods 0.000 description 8
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- 239000007788 liquid Substances 0.000 description 7
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- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 6
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 6
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 6
- MVPPADPHJFYWMZ-UHFFFAOYSA-N chlorobenzene Chemical compound ClC1=CC=CC=C1 MVPPADPHJFYWMZ-UHFFFAOYSA-N 0.000 description 6
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- CNRZQDQNVUKEJG-UHFFFAOYSA-N oxo-bis(oxoalumanyloxy)titanium Chemical compound O=[Al]O[Ti](=O)O[Al]=O CNRZQDQNVUKEJG-UHFFFAOYSA-N 0.000 description 6
- 230000008569 process Effects 0.000 description 6
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- OPKOKAMJFNKNAS-UHFFFAOYSA-N N-methylethanolamine Chemical compound CNCCO OPKOKAMJFNKNAS-UHFFFAOYSA-N 0.000 description 4
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Images
Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02518—Deposited layers
- H01L21/02521—Materials
- H01L21/02551—Group 12/16 materials
- H01L21/02554—Oxides
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02612—Formation types
- H01L21/02617—Deposition types
- H01L21/02623—Liquid deposition
- H01L21/02628—Liquid deposition using solutions
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
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- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H01L29/76—Unipolar devices, e.g. field effect transistors
- H01L29/772—Field effect transistors
- H01L29/78—Field effect transistors with field effect produced by an insulated gate
- H01L29/786—Thin film transistors, i.e. transistors with a channel being at least partly a thin film
- H01L29/7869—Thin film transistors, i.e. transistors with a channel being at least partly a thin film having a semiconductor body comprising an oxide semiconductor material, e.g. zinc oxide, copper aluminium oxide, cadmium stannate
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Abstract
【解決手段】酸化亜鉛及び錯化剤から成る溶液を製造し、その溶液を基板に付着させ、その溶液を加熱して基板上に半導体レイヤを形成する。この酸化亜鉛半導体レイヤを用いる薄膜トランジスタは、移動度及びオン/オフ割合が好ましい。
【選択図】図1
Description
B.サン他著「コロイダル・ナノロッドの自己集合に基づく溶液処理酸化亜鉛電界効果トランジスタ」(ナノ・レット、第5巻、第12号、2408−2413ページ、2005年)(B.Sun et al.,"Solution−Processed Zinc Oxide Field−Effect Transistors Based on Self−Assembly of Colloidal Nanorods,"Nano Lett., Vol.5, No.12, pp.2408−2413(2005))
〜260nmのスパッタリングされた酸化インジウム・スズ(ITO)層が塗布されたガラス支持体(〜2×2cm)、及び酸化アルニウム(Al2O3)及び酸化スズ(TiO2)(ATO;Ci=70nF/cm2)を使用した。ガラスが支持材料の機能を果たし、ITOがゲート電極の機能を果たし、ATOが誘電体層の機能を果たす。基板はアルゴン・プラズマによって洗浄し、次にヘキサメチレンテトラミンに対する亜鉛(Zn2+)のモル比が1:1であり、室温での亜鉛濃度([Zn2+])が約0.1Mである、硝酸亜鉛とヘキサメチレンテトラミンを含む容器中に浸せきさせた。この容器は約1℃/分の速度で90℃まで加熱した。反応温度が90℃に達した後で、容器を室温まで冷却した。基板は蒸留水で5分間超音波洗浄されて、沈殿したフィルムの表面に付着した沈殿物を除去した。基板は1時間にわたって25℃で乾燥し、ホットプレート上で150℃で30分間乾燥させた。最後に、チャネル長が90ミクロン、チャネル幅が5000ミクロンのアルミニウム製ソース−ドレイン電極対のアレイが、亜鉛層の上部で蒸発されて、図3と同様に亜鉛TFTを形成する。
ISD = Ciμ(W/2L)(VG−VT)
ここで、ISDは、飽和領域におけるドレイン電流であり、W及びLはそれぞれチャネル幅とチャネル長であり、Ciは誘電体層の単位領域ごとの静電容量であり、VG及びVTは、それぞれゲート電圧及びしきい値電圧である。デバイスの伝達特性及び出力特性は、ZnOがN型半導体であることを示した。L=90ミクロン及びW=5,000ミクロンの寸法を有する種々のTFTを使用して、1.0cm2/V・sの平均移動度、及び104の電流オン/オフ比率割合が得られた。
Claims (4)
- 亜鉛塩及び錯化剤から成る溶液を提供することと、
前記溶液に基板を接触させることと、
前記基板上に酸化亜鉛半導体レイヤを形成するように前記溶液を加熱することと、
を含む、薄膜トランジスタのための酸化亜鉛半導体レイヤを製造する方法。 - 前記亜鉛塩は、硝酸亜鉛、塩化亜鉛、臭化亜鉛、シュウ酸亜鉛、亜鉛アセチルアセトネート、硫酸亜鉛、酢酸亜鉛、及びそれらの水和物から成る群から選択される、請求項1の方法。
- 前記錯化剤は、カルボキシル酸又はオルガノアミンである、請求項1の方法。
- 請求項1の方法によって形成された薄膜トランジスタ。
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US11/749,419 US20080286907A1 (en) | 2007-05-16 | 2007-05-16 | Semiconductor layer for thin film transistors |
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US (1) | US20080286907A1 (ja) |
EP (1) | EP1993122A3 (ja) |
JP (1) | JP2008288593A (ja) |
KR (1) | KR20080101734A (ja) |
CN (1) | CN101582383A (ja) |
CA (1) | CA2631046A1 (ja) |
TW (1) | TW200910427A (ja) |
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