JP2008211219A5 - - Google Patents

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JP2008211219A5
JP2008211219A5 JP2008043004A JP2008043004A JP2008211219A5 JP 2008211219 A5 JP2008211219 A5 JP 2008211219A5 JP 2008043004 A JP2008043004 A JP 2008043004A JP 2008043004 A JP2008043004 A JP 2008043004A JP 2008211219 A5 JP2008211219 A5 JP 2008211219A5
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gas
manifold
processing chamber
flow
valve
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JP2008043004A
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JP5330709B2 (ja
JP2008211219A (ja
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Priority claimed from US11/678,623 external-priority patent/US7846497B2/en
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JP2008043004A 2007-02-26 2008-02-25 処理チャンバへのガスフローを制御する方法及び装置 Expired - Fee Related JP5330709B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US11/678,623 2007-02-26
US11/678,623 US7846497B2 (en) 2007-02-26 2007-02-26 Method and apparatus for controlling gas flow to a processing chamber

Publications (3)

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JP2008211219A JP2008211219A (ja) 2008-09-11
JP2008211219A5 true JP2008211219A5 (enExample) 2013-02-14
JP5330709B2 JP5330709B2 (ja) 2013-10-30

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JP2008043004A Expired - Fee Related JP5330709B2 (ja) 2007-02-26 2008-02-25 処理チャンバへのガスフローを制御する方法及び装置

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US (1) US7846497B2 (enExample)
EP (1) EP1961838A1 (enExample)
JP (1) JP5330709B2 (enExample)
KR (1) KR100975441B1 (enExample)
CN (1) CN101256935B (enExample)
SG (1) SG145668A1 (enExample)
TW (1) TW200846860A (enExample)

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