JP2008153645A5 - - Google Patents

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Publication number
JP2008153645A5
JP2008153645A5 JP2007305689A JP2007305689A JP2008153645A5 JP 2008153645 A5 JP2008153645 A5 JP 2008153645A5 JP 2007305689 A JP2007305689 A JP 2007305689A JP 2007305689 A JP2007305689 A JP 2007305689A JP 2008153645 A5 JP2008153645 A5 JP 2008153645A5
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JP
Japan
Prior art keywords
pulse
radiation
pulse energy
current
burst
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Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2007305689A
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English (en)
Japanese (ja)
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JP2008153645A (ja
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Publication date
Priority claimed from DE102006060368A external-priority patent/DE102006060368B3/de
Application filed filed Critical
Publication of JP2008153645A publication Critical patent/JP2008153645A/ja
Publication of JP2008153645A5 publication Critical patent/JP2008153645A5/ja
Pending legal-status Critical Current

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JP2007305689A 2006-12-16 2007-11-27 パルス放射線源の放出される放射線の出力の平均を安定化するための方法及び装置 Pending JP2008153645A (ja)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE102006060368A DE102006060368B3 (de) 2006-12-16 2006-12-16 Verfahren und Anordnung zur Stabilisierung der mittleren abgegebenen Strahlungsleistung einer gepulst betriebenen Strahlungsquelle

Publications (2)

Publication Number Publication Date
JP2008153645A JP2008153645A (ja) 2008-07-03
JP2008153645A5 true JP2008153645A5 (https=) 2009-03-19

Family

ID=39526726

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2007305689A Pending JP2008153645A (ja) 2006-12-16 2007-11-27 パルス放射線源の放出される放射線の出力の平均を安定化するための方法及び装置

Country Status (4)

Country Link
US (1) US7974321B2 (https=)
JP (1) JP2008153645A (https=)
DE (1) DE102006060368B3 (https=)
NL (1) NL2001094C2 (https=)

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KR101698141B1 (ko) * 2009-12-08 2017-01-19 삼성전자 주식회사 마스크리스 노광장치 및 그 제어방법
EP3514630B1 (en) * 2013-06-18 2022-06-22 ASML Netherlands B.V. Free electron laser and method of generating an euv radiation beam using the same
US9939732B2 (en) * 2015-10-27 2018-04-10 Cymer, Llc Controller for an optical system
DE102016212928B3 (de) 2016-07-14 2017-09-07 Trumpf Laser Gmbh Verfahren zur Erzeugung eines Laserpulses und Anordnung zur Erzeugung eines Treiberansteuersignals
JP7697779B2 (ja) 2020-10-01 2025-06-24 ギガフォトン株式会社 極端紫外光生成システム、及び電子デバイスの製造方法
JP7814401B2 (ja) 2021-02-04 2026-02-16 エーエスエムエル ネザーランズ ビー．ブイ． 光パルスを空間的にフィルタリングするための方法および装置
JP7827545B2 (ja) * 2022-05-25 2026-03-10 ギガフォトン株式会社 極端紫外光生成装置及び電子デバイスの製造方法
CN117791287B (zh) * 2024-02-23 2024-04-30 深圳市智鼎自动化技术有限公司 激光脉冲能量控制系统及方法
DE102024128080A1 (de) * 2024-09-27 2026-04-02 Carl Zeiss Smt Gmbh Verfahren zum Betreiben einer Entladungsplasmaquelle, sowie Entladungsplasmaquelle und optisches Metrologiesystem

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US4804978A (en) * 1988-02-19 1989-02-14 The Perkin-Elmer Corporation Exposure control system for full field photolithography using pulsed sources
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