DE102006060368B3 - Verfahren und Anordnung zur Stabilisierung der mittleren abgegebenen Strahlungsleistung einer gepulst betriebenen Strahlungsquelle - Google Patents
Verfahren und Anordnung zur Stabilisierung der mittleren abgegebenen Strahlungsleistung einer gepulst betriebenen Strahlungsquelle Download PDFInfo
- Publication number
- DE102006060368B3 DE102006060368B3 DE102006060368A DE102006060368A DE102006060368B3 DE 102006060368 B3 DE102006060368 B3 DE 102006060368B3 DE 102006060368 A DE102006060368 A DE 102006060368A DE 102006060368 A DE102006060368 A DE 102006060368A DE 102006060368 B3 DE102006060368 B3 DE 102006060368B3
- Authority
- DE
- Germany
- Prior art keywords
- pulse
- radiation
- pulse energy
- pulses
- energy
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 230000005855 radiation Effects 0.000 title claims abstract description 156
- 238000000034 method Methods 0.000 title claims abstract description 42
- 230000000087 stabilizing effect Effects 0.000 title claims abstract description 8
- 230000003287 optical effect Effects 0.000 claims description 12
- 238000005259 measurement Methods 0.000 claims description 11
- 230000033228 biological regulation Effects 0.000 claims description 8
- 239000004065 semiconductor Substances 0.000 claims description 8
- 230000005540 biological transmission Effects 0.000 claims description 7
- 230000008859 change Effects 0.000 claims description 6
- 238000009826 distribution Methods 0.000 claims description 6
- 238000004519 manufacturing process Methods 0.000 claims description 5
- 238000004364 calculation method Methods 0.000 claims description 4
- 230000001960 triggered effect Effects 0.000 claims description 4
- 235000012431 wafers Nutrition 0.000 description 33
- 210000002381 plasma Anatomy 0.000 description 18
- 238000004422 calculation algorithm Methods 0.000 description 7
- 230000001276 controlling effect Effects 0.000 description 7
- 230000002123 temporal effect Effects 0.000 description 7
- 230000008569 process Effects 0.000 description 4
- 238000004088 simulation Methods 0.000 description 4
- 238000010586 diagram Methods 0.000 description 3
- 238000013139 quantization Methods 0.000 description 3
- 230000009467 reduction Effects 0.000 description 3
- 238000013459 approach Methods 0.000 description 2
- 230000008901 benefit Effects 0.000 description 2
- 230000005284 excitation Effects 0.000 description 2
- 238000003384 imaging method Methods 0.000 description 2
- 238000001459 lithography Methods 0.000 description 2
- 230000006641 stabilisation Effects 0.000 description 2
- 238000011105 stabilization Methods 0.000 description 2
- 238000012935 Averaging Methods 0.000 description 1
- 230000003044 adaptive effect Effects 0.000 description 1
- 230000004075 alteration Effects 0.000 description 1
- 230000008033 biological extinction Effects 0.000 description 1
- 230000009172 bursting Effects 0.000 description 1
- 230000001364 causal effect Effects 0.000 description 1
- 230000008878 coupling Effects 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 238000005859 coupling reaction Methods 0.000 description 1
- 230000003111 delayed effect Effects 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000001900 extreme ultraviolet lithography Methods 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 238000005457 optimization Methods 0.000 description 1
- 230000002028 premature Effects 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 230000001105 regulatory effect Effects 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 230000001360 synchronised effect Effects 0.000 description 1
- 230000001052 transient effect Effects 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
- G03B27/00—Photographic printing apparatus
- G03B27/72—Controlling or varying light intensity, spectral composition, or exposure time in photographic printing apparatus
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J1/00—Photometry, e.g. photographic exposure meter
- G01J1/10—Photometry, e.g. photographic exposure meter by comparison with reference light or electric value provisionally void
- G01J1/16—Photometry, e.g. photographic exposure meter by comparison with reference light or electric value provisionally void using electric radiation detectors
- G01J1/18—Photometry, e.g. photographic exposure meter by comparison with reference light or electric value provisionally void using electric radiation detectors using comparison with a reference electric value
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J1/00—Photometry, e.g. photographic exposure meter
- G01J1/42—Photometry, e.g. photographic exposure meter using electric radiation detectors
- G01J1/4257—Photometry, e.g. photographic exposure meter using electric radiation detectors applied to monitoring the characteristics of a beam, e.g. laser beam, headlamp beam
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J11/00—Measuring the characteristics of individual optical pulses or of optical pulse trains
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70008—Production of exposure light, i.e. light sources
- G03F7/70041—Production of exposure light, i.e. light sources by pulsed sources, e.g. multiplexing, pulse duration, interval control or intensity control
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
- G03F7/70558—Dose control, i.e. achievement of a desired dose
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Optics & Photonics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE102006060368A DE102006060368B3 (de) | 2006-12-16 | 2006-12-16 | Verfahren und Anordnung zur Stabilisierung der mittleren abgegebenen Strahlungsleistung einer gepulst betriebenen Strahlungsquelle |
| JP2007305689A JP2008153645A (ja) | 2006-12-16 | 2007-11-27 | パルス放射線源の放出される放射線の出力の平均を安定化するための方法及び装置 |
| US11/949,924 US7974321B2 (en) | 2006-12-16 | 2007-12-04 | Method and arrangement for stabilizing the average emitted radiation output of a pulsed radiation source |
| NL2001094A NL2001094C2 (nl) | 2006-12-16 | 2007-12-14 | Werkwijze en inrichting voor het stabiliseren van het gemiddelde afgegeven stralingsvermogen van een gepulseerd uitgevoerde stralingsbron. |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE102006060368A DE102006060368B3 (de) | 2006-12-16 | 2006-12-16 | Verfahren und Anordnung zur Stabilisierung der mittleren abgegebenen Strahlungsleistung einer gepulst betriebenen Strahlungsquelle |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| DE102006060368B3 true DE102006060368B3 (de) | 2008-07-31 |
Family
ID=39526726
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE102006060368A Active DE102006060368B3 (de) | 2006-12-16 | 2006-12-16 | Verfahren und Anordnung zur Stabilisierung der mittleren abgegebenen Strahlungsleistung einer gepulst betriebenen Strahlungsquelle |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US7974321B2 (https=) |
| JP (1) | JP2008153645A (https=) |
| DE (1) | DE102006060368B3 (https=) |
| NL (1) | NL2001094C2 (https=) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102016212928B3 (de) * | 2016-07-14 | 2017-09-07 | Trumpf Laser Gmbh | Verfahren zur Erzeugung eines Laserpulses und Anordnung zur Erzeugung eines Treiberansteuersignals |
| DE102024128080A1 (de) * | 2024-09-27 | 2026-04-02 | Carl Zeiss Smt Gmbh | Verfahren zum Betreiben einer Entladungsplasmaquelle, sowie Entladungsplasmaquelle und optisches Metrologiesystem |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR101698141B1 (ko) * | 2009-12-08 | 2017-01-19 | 삼성전자 주식회사 | 마스크리스 노광장치 및 그 제어방법 |
| EP3514630B1 (en) * | 2013-06-18 | 2022-06-22 | ASML Netherlands B.V. | Free electron laser and method of generating an euv radiation beam using the same |
| US9939732B2 (en) * | 2015-10-27 | 2018-04-10 | Cymer, Llc | Controller for an optical system |
| JP7697779B2 (ja) | 2020-10-01 | 2025-06-24 | ギガフォトン株式会社 | 極端紫外光生成システム、及び電子デバイスの製造方法 |
| JP7814401B2 (ja) | 2021-02-04 | 2026-02-16 | エーエスエムエル ネザーランズ ビー．ブイ． | 光パルスを空間的にフィルタリングするための方法および装置 |
| JP7827545B2 (ja) * | 2022-05-25 | 2026-03-10 | ギガフォトン株式会社 | 極端紫外光生成装置及び電子デバイスの製造方法 |
| CN117791287B (zh) * | 2024-02-23 | 2024-04-30 | 深圳市智鼎自动化技术有限公司 | 激光脉冲能量控制系统及方法 |
Citations (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5608492A (en) * | 1994-01-26 | 1997-03-04 | Canon Kabushiki Kaisha | Scanning type exposure apparatus and method and device manufacturing method |
| US5986742A (en) * | 1996-04-01 | 1999-11-16 | Asml Lithography B.V. | Lithographic scanning exposure projection apparatus |
| US6005879A (en) * | 1997-04-23 | 1999-12-21 | Cymer, Inc. | Pulse energy control for excimer laser |
| US6456363B2 (en) * | 1993-02-24 | 2002-09-24 | Nikon Corporation | Exposure control apparatus and method |
| US6496247B2 (en) * | 1993-03-15 | 2002-12-17 | Nikon Corporation | Exposure apparatus and exposure method |
| US6538723B2 (en) * | 1996-08-05 | 2003-03-25 | Nikon Corporation | Scanning exposure in which an object and pulsed light are moved relatively, exposing a substrate by projecting a pattern on a mask onto the substrate with pulsed light from a light source, light sources therefor, and methods of manufacturing |
| DE10209161A1 (de) * | 2002-02-26 | 2003-09-11 | Xtreme Tech Gmbh | Verfahren zur Energieregelung von gepulst betriebenen, gasentladungsgekoppelten Strahlungsquellen |
| DE10219805A1 (de) * | 2002-04-30 | 2003-11-27 | Xtreme Tech Gmbh | Verfahren zur Stabilisierung der Strahlungsleistung einer gepulst betriebenen, gasentladungsgekoppelten Strahlungsquelle |
| DE10244105B3 (de) * | 2002-02-26 | 2004-09-16 | Xtreme Technologies Gmbh | Verfahren zur Energiestabilisierung gasentladungsgepumpter, in definierten Impulsfolgen betriebener Strahlungsquellen |
Family Cites Families (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US582621A (en) * | 1897-05-18 | Combined churn and butter-worker | ||
| US3747019A (en) * | 1970-07-16 | 1973-07-17 | Union Carbide Corp | Method and means for stabilizing the amplitude and repetition frequency of a repetitively q-switched laser |
| US4804978A (en) * | 1988-02-19 | 1989-02-14 | The Perkin-Elmer Corporation | Exposure control system for full field photolithography using pulsed sources |
| JPH02177313A (ja) * | 1988-12-28 | 1990-07-10 | Canon Inc | 露光制御装置 |
| JP3451604B2 (ja) * | 1994-06-17 | 2003-09-29 | 株式会社ニコン | 走査型露光装置 |
| US5632739A (en) * | 1994-10-13 | 1997-05-27 | The General Hospital Corporation | Two-pulse, lateral tissue illuminator |
| JPH09190966A (ja) | 1996-01-08 | 1997-07-22 | Canon Inc | 走査型露光装置及びそれを用いたデバイスの製造方法 |
| KR100210569B1 (ko) | 1995-09-29 | 1999-07-15 | 미따라이 하지메 | 노광방법 및 노광장치, 그리고 이를 이용한 디바이스제조방법 |
| US5852621A (en) * | 1997-07-21 | 1998-12-22 | Cymer, Inc. | Pulse laser with pulse energy trimmer |
| TW448487B (en) * | 1997-11-22 | 2001-08-01 | Nippon Kogaku Kk | Exposure apparatus, exposure method and manufacturing method of device |
| JP3807933B2 (ja) * | 2000-12-14 | 2006-08-09 | 株式会社ルネサステクノロジ | 投影露光装置及び投影露光方法 |
| FR2859545B1 (fr) * | 2003-09-05 | 2005-11-11 | Commissariat Energie Atomique | Procede et dispositif de lithographie par rayonnement dans l'extreme utraviolet |
-
2006
- 2006-12-16 DE DE102006060368A patent/DE102006060368B3/de active Active
-
2007
- 2007-11-27 JP JP2007305689A patent/JP2008153645A/ja active Pending
- 2007-12-04 US US11/949,924 patent/US7974321B2/en active Active
- 2007-12-14 NL NL2001094A patent/NL2001094C2/nl active Search and Examination
Patent Citations (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6456363B2 (en) * | 1993-02-24 | 2002-09-24 | Nikon Corporation | Exposure control apparatus and method |
| US6496247B2 (en) * | 1993-03-15 | 2002-12-17 | Nikon Corporation | Exposure apparatus and exposure method |
| US5608492A (en) * | 1994-01-26 | 1997-03-04 | Canon Kabushiki Kaisha | Scanning type exposure apparatus and method and device manufacturing method |
| US5986742A (en) * | 1996-04-01 | 1999-11-16 | Asml Lithography B.V. | Lithographic scanning exposure projection apparatus |
| US6538723B2 (en) * | 1996-08-05 | 2003-03-25 | Nikon Corporation | Scanning exposure in which an object and pulsed light are moved relatively, exposing a substrate by projecting a pattern on a mask onto the substrate with pulsed light from a light source, light sources therefor, and methods of manufacturing |
| US6005879A (en) * | 1997-04-23 | 1999-12-21 | Cymer, Inc. | Pulse energy control for excimer laser |
| DE10209161A1 (de) * | 2002-02-26 | 2003-09-11 | Xtreme Tech Gmbh | Verfahren zur Energieregelung von gepulst betriebenen, gasentladungsgekoppelten Strahlungsquellen |
| DE10244105B3 (de) * | 2002-02-26 | 2004-09-16 | Xtreme Technologies Gmbh | Verfahren zur Energiestabilisierung gasentladungsgepumpter, in definierten Impulsfolgen betriebener Strahlungsquellen |
| DE10219805A1 (de) * | 2002-04-30 | 2003-11-27 | Xtreme Tech Gmbh | Verfahren zur Stabilisierung der Strahlungsleistung einer gepulst betriebenen, gasentladungsgekoppelten Strahlungsquelle |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102016212928B3 (de) * | 2016-07-14 | 2017-09-07 | Trumpf Laser Gmbh | Verfahren zur Erzeugung eines Laserpulses und Anordnung zur Erzeugung eines Treiberansteuersignals |
| US11444426B2 (en) | 2016-07-14 | 2022-09-13 | Trumpf Laser Gmbh | Methods for producing a laser pulse and devices for producing a driver control signal |
| DE102024128080A1 (de) * | 2024-09-27 | 2026-04-02 | Carl Zeiss Smt Gmbh | Verfahren zum Betreiben einer Entladungsplasmaquelle, sowie Entladungsplasmaquelle und optisches Metrologiesystem |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2008153645A (ja) | 2008-07-03 |
| US7974321B2 (en) | 2011-07-05 |
| NL2001094C2 (nl) | 2011-01-31 |
| NL2001094A1 (nl) | 2008-06-17 |
| US20080143989A1 (en) | 2008-06-19 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| 8364 | No opposition during term of opposition | ||
| R082 | Change of representative |
Representative=s name: PATENTANWAELTE OEHMKE UND KOLLEGEN, 07743 JENA, DE Representative=s name: PATENTANWAELTE OEHMKE UND KOLLEGEN, DE |
|
| R081 | Change of applicant/patentee |
Owner name: USHIO DENKI KABUSHIKI KAISHA, JP Free format text: FORMER OWNER: XTREME TECHNOLOGIES GMBH, 07745 JENA, DE Effective date: 20110712 |
|
| R082 | Change of representative |
Representative=s name: PATENTANWAELTE OEHMKE UND KOLLEGEN, DE Effective date: 20110712 |
|
| R081 | Change of applicant/patentee |
Owner name: USHIO DENKI KABUSHIKI KAISHA, JP Free format text: FORMER OWNER: XTREME TECHNOLOGIES GMBH, 52074 AACHEN, DE Effective date: 20131114 |
|
| R082 | Change of representative |
Representative=s name: PATENTANWAELTE OEHMKE UND KOLLEGEN, DE Effective date: 20131114 |
|
| R082 | Change of representative |
Representative=s name: GLEIM PETRI PATENT- UND RECHTSANWALTSPARTNERSC, DE Representative=s name: GLEIM PETRI OEHMKE PATENT- UND RECHTSANWALTSPA, DE |
|
| R082 | Change of representative |
Representative=s name: GLEIM PETRI PATENT- UND RECHTSANWALTSPARTNERSC, DE |