JP2008140956A5 - - Google Patents

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Publication number
JP2008140956A5
JP2008140956A5 JP2006325229A JP2006325229A JP2008140956A5 JP 2008140956 A5 JP2008140956 A5 JP 2008140956A5 JP 2006325229 A JP2006325229 A JP 2006325229A JP 2006325229 A JP2006325229 A JP 2006325229A JP 2008140956 A5 JP2008140956 A5 JP 2008140956A5
Authority
JP
Japan
Prior art keywords
exposure apparatus
command value
substrate
illumination system
light source
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2006325229A
Other languages
English (en)
Japanese (ja)
Other versions
JP2008140956A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP2006325229A priority Critical patent/JP2008140956A/ja
Priority claimed from JP2006325229A external-priority patent/JP2008140956A/ja
Priority to US11/877,482 priority patent/US7456934B2/en
Priority to TW096140486A priority patent/TW200827940A/zh
Priority to KR1020070110095A priority patent/KR20080050305A/ko
Publication of JP2008140956A publication Critical patent/JP2008140956A/ja
Publication of JP2008140956A5 publication Critical patent/JP2008140956A5/ja
Pending legal-status Critical Current

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JP2006325229A 2006-12-01 2006-12-01 露光装置 Pending JP2008140956A (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2006325229A JP2008140956A (ja) 2006-12-01 2006-12-01 露光装置
US11/877,482 US7456934B2 (en) 2006-12-01 2007-10-23 Exposure apparatus and device manufacturing method
TW096140486A TW200827940A (en) 2006-12-01 2007-10-26 Exposure apparatus and device manufacturing method
KR1020070110095A KR20080050305A (ko) 2006-12-01 2007-10-31 노광장치 및 디바이스의 제조방법

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2006325229A JP2008140956A (ja) 2006-12-01 2006-12-01 露光装置

Publications (2)

Publication Number Publication Date
JP2008140956A JP2008140956A (ja) 2008-06-19
JP2008140956A5 true JP2008140956A5 (enExample) 2009-01-22

Family

ID=39475312

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2006325229A Pending JP2008140956A (ja) 2006-12-01 2006-12-01 露光装置

Country Status (4)

Country Link
US (1) US7456934B2 (enExample)
JP (1) JP2008140956A (enExample)
KR (1) KR20080050305A (enExample)
TW (1) TW200827940A (enExample)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8149319B2 (en) * 2007-12-03 2012-04-03 Ricoh Co., Ltd. End-to-end design of electro-optic imaging systems for color-correlated objects
NL2006073A (en) * 2010-02-12 2011-08-15 Asml Netherlands Bv Lithographic apparatus and method.
US9599510B2 (en) * 2014-06-04 2017-03-21 Cymer, Llc Estimation of spectral feature of pulsed light beam
CN109616405A (zh) * 2018-12-05 2019-04-12 上海华力微电子有限公司 半导体刻蚀工艺真空腔体设备及刻蚀方法
JP7751664B2 (ja) * 2022-01-11 2025-10-08 ギガフォトン株式会社 電子デバイスの製造方法、レーザ装置、及び波長シーケンス算出システム

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2619473B2 (ja) * 1987-06-17 1997-06-11 株式会社日立製作所 縮小投影露光方法
US4937619A (en) 1986-08-08 1990-06-26 Hitachi, Ltd. Projection aligner and exposure method
JP3175180B2 (ja) * 1990-03-09 2001-06-11 キヤノン株式会社 露光方法及び露光装置
US5097291A (en) * 1991-04-22 1992-03-17 Nikon Corporation Energy amount control device
JP2852169B2 (ja) 1993-02-25 1999-01-27 日本電気株式会社 投影露光方法および装置
US6671294B2 (en) * 1997-07-22 2003-12-30 Cymer, Inc. Laser spectral engineering for lithographic process
US6853653B2 (en) * 1997-07-22 2005-02-08 Cymer, Inc. Laser spectral engineering for lithographic process
JPH11162824A (ja) 1997-12-02 1999-06-18 Sony Corp 露光装置
JP3039531B2 (ja) * 1998-08-17 2000-05-08 株式会社ニコン 回路パターンの製造方法
US7154928B2 (en) * 2004-06-23 2006-12-26 Cymer Inc. Laser output beam wavefront splitter for bandwidth spectrum control
US7088758B2 (en) * 2001-07-27 2006-08-08 Cymer, Inc. Relax gas discharge laser lithography light source
JP4580338B2 (ja) * 2004-12-23 2010-11-10 エーエスエムエル ネザーランズ ビー．ブイ． リソグラフィ装置、エキシマ・レーザ、およびデバイス製造方法
US7534552B2 (en) * 2004-12-23 2009-05-19 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method

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