JP2014127620A5 - - Google Patents
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- Publication number
- JP2014127620A5 JP2014127620A5 JP2012284352A JP2012284352A JP2014127620A5 JP 2014127620 A5 JP2014127620 A5 JP 2014127620A5 JP 2012284352 A JP2012284352 A JP 2012284352A JP 2012284352 A JP2012284352 A JP 2012284352A JP 2014127620 A5 JP2014127620 A5 JP 2014127620A5
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- oxygen concentration
- optical system
- exposure apparatus
- light
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000758 substrate Substances 0.000 claims description 34
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 19
- 239000001301 oxygen Substances 0.000 claims description 19
- 229910052760 oxygen Inorganic materials 0.000 claims description 19
- 230000003287 optical effect Effects 0.000 claims description 18
- 238000005259 measurement Methods 0.000 claims description 6
- 238000005286 illumination Methods 0.000 claims description 4
- 230000001678 irradiating effect Effects 0.000 claims description 4
- 239000007789 gas Substances 0.000 claims 3
- 238000011156 evaluation Methods 0.000 claims 2
- 239000011261 inert gas Substances 0.000 claims 1
- 238000004519 manufacturing process Methods 0.000 claims 1
- 238000000034 method Methods 0.000 claims 1
- 238000012545 processing Methods 0.000 claims 1
- 238000012546 transfer Methods 0.000 claims 1
Priority Applications (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2012284352A JP6099970B2 (ja) | 2012-12-27 | 2012-12-27 | 露光装置及びデバイスの製造方法 |
| US14/138,559 US9280050B2 (en) | 2012-12-27 | 2013-12-23 | Exposure apparatus and method of device fabrication |
| KR1020130164484A KR101698236B1 (ko) | 2012-12-27 | 2013-12-26 | 노광 장치 및 디바이스의 제조 방법 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2012284352A JP6099970B2 (ja) | 2012-12-27 | 2012-12-27 | 露光装置及びデバイスの製造方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2014127620A JP2014127620A (ja) | 2014-07-07 |
| JP2014127620A5 true JP2014127620A5 (enExample) | 2016-02-25 |
| JP6099970B2 JP6099970B2 (ja) | 2017-03-22 |
Family
ID=51017561
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2012284352A Active JP6099970B2 (ja) | 2012-12-27 | 2012-12-27 | 露光装置及びデバイスの製造方法 |
Country Status (3)
| Country | Link |
|---|---|
| US (1) | US9280050B2 (enExample) |
| JP (1) | JP6099970B2 (enExample) |
| KR (1) | KR101698236B1 (enExample) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP6343326B2 (ja) * | 2016-11-18 | 2018-06-13 | キヤノン株式会社 | 露光装置、および物品の製造方法 |
| JP6985803B2 (ja) * | 2017-03-01 | 2021-12-22 | 株式会社Screenホールディングス | 露光装置、基板処理装置、基板の露光方法および基板処理方法 |
| JP7152876B2 (ja) * | 2018-05-17 | 2022-10-13 | キヤノン株式会社 | 露光装置及び物品の製造方法 |
| JP7278836B2 (ja) * | 2019-03-29 | 2023-05-22 | キヤノン株式会社 | 露光装置、露光方法、および物品の製造方法 |
| KR102829107B1 (ko) | 2019-05-02 | 2025-07-07 | 삼성전자주식회사 | Euv 노광 장치 및 그를 이용한 반도체 소자의 제조 방법 |
| US11860555B2 (en) * | 2021-03-30 | 2024-01-02 | Changxin Memory Technologies, Inc. | Alignment mark count acquiring method and device |
Family Cites Families (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0719058B2 (ja) | 1984-08-21 | 1995-03-06 | ソニー株式会社 | パタ−ン形成方法及び露光装置 |
| JPS61213814A (ja) * | 1985-03-20 | 1986-09-22 | Hitachi Ltd | 投影露光装置 |
| JPH01195445A (ja) | 1988-01-29 | 1989-08-07 | Matsushita Electric Ind Co Ltd | レジストの露光方法 |
| JP4011643B2 (ja) * | 1996-01-05 | 2007-11-21 | キヤノン株式会社 | 半導体製造装置 |
| AU6853598A (en) * | 1997-04-18 | 1998-11-13 | Nikon Corporation | Aligner, exposure method using the aligner, and method of manufacture of circuitdevice |
| JPH1187230A (ja) * | 1997-09-01 | 1999-03-30 | Canon Inc | 露光装置およびデバイス製造方法 |
| JPH11354409A (ja) * | 1998-06-09 | 1999-12-24 | Canon Inc | 照明装置、これを備えた投影露光装置、及び半導体装置の製造方法 |
| US6690450B2 (en) * | 2000-01-31 | 2004-02-10 | Nikon Corporation | Exposure method, exposure apparatus, method for producing exposure apparatus, and method for producing device |
| JP2003257822A (ja) * | 2002-02-28 | 2003-09-12 | Nikon Corp | 光学装置及び露光装置 |
| US20050175497A1 (en) * | 2002-08-29 | 2005-08-11 | Nikon Corporation | Temperature control method and apparatus and exposure method and apparatus |
| JP4273421B2 (ja) * | 2002-08-29 | 2009-06-03 | 株式会社ニコン | 温度制御方法及び装置、並びに露光方法及び装置 |
| JP2004281854A (ja) * | 2003-03-18 | 2004-10-07 | Canon Inc | 露光装置 |
| JP2005142185A (ja) * | 2003-11-04 | 2005-06-02 | Canon Inc | 露光装置及びその環境制御方法 |
| JP5448724B2 (ja) | 2009-10-29 | 2014-03-19 | キヤノン株式会社 | 露光装置及びデバイスの製造方法 |
| JP5936328B2 (ja) * | 2010-10-22 | 2016-06-22 | キヤノン株式会社 | 露光装置およびデバイス製造方法 |
| JP6099969B2 (ja) | 2012-12-27 | 2017-03-22 | キヤノン株式会社 | 露光装置及びデバイスの製造方法 |
-
2012
- 2012-12-27 JP JP2012284352A patent/JP6099970B2/ja active Active
-
2013
- 2013-12-23 US US14/138,559 patent/US9280050B2/en not_active Expired - Fee Related
- 2013-12-26 KR KR1020130164484A patent/KR101698236B1/ko active Active
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