KR101698236B1 - 노광 장치 및 디바이스의 제조 방법 - Google Patents

노광 장치 및 디바이스의 제조 방법 Download PDF

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KR101698236B1
KR101698236B1 KR1020130164484A KR20130164484A KR101698236B1 KR 101698236 B1 KR101698236 B1 KR 101698236B1 KR 1020130164484 A KR1020130164484 A KR 1020130164484A KR 20130164484 A KR20130164484 A KR 20130164484A KR 101698236 B1 KR101698236 B1 KR 101698236B1
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substrate
illuminance
oxygen concentration
optical system
light
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Korean (ko)
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KR20140085355A (ko
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료 사사키
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캐논 가부시끼가이샤
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70558—Dose control, i.e. achievement of a desired dose
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70933—Purge, e.g. exchanging fluid or gas to remove pollutants

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Toxicology (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
KR1020130164484A 2012-12-27 2013-12-26 노광 장치 및 디바이스의 제조 방법 Active KR101698236B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2012284352A JP6099970B2 (ja) 2012-12-27 2012-12-27 露光装置及びデバイスの製造方法
JPJP-P-2012-284352 2012-12-27

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KR20140085355A KR20140085355A (ko) 2014-07-07
KR101698236B1 true KR101698236B1 (ko) 2017-01-19

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Country Link
US (1) US9280050B2 (enExample)
JP (1) JP6099970B2 (enExample)
KR (1) KR101698236B1 (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20180100495A (ko) * 2017-03-01 2018-09-11 가부시키가이샤 스크린 홀딩스 노광 장치, 기판 처리 장치, 기판의 노광 방법 및 기판 처리 방법

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6343326B2 (ja) * 2016-11-18 2018-06-13 キヤノン株式会社 露光装置、および物品の製造方法
JP7152876B2 (ja) * 2018-05-17 2022-10-13 キヤノン株式会社 露光装置及び物品の製造方法
JP7278836B2 (ja) * 2019-03-29 2023-05-22 キヤノン株式会社 露光装置、露光方法、および物品の製造方法
KR102829107B1 (ko) 2019-05-02 2025-07-07 삼성전자주식회사 Euv 노광 장치 및 그를 이용한 반도체 소자의 제조 방법
US11860555B2 (en) * 2021-03-30 2024-01-02 Changxin Memory Technologies, Inc. Alignment mark count acquiring method and device

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4273421B2 (ja) 2002-08-29 2009-06-03 株式会社ニコン 温度制御方法及び装置、並びに露光方法及び装置

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0719058B2 (ja) 1984-08-21 1995-03-06 ソニー株式会社 パタ−ン形成方法及び露光装置
JPS61213814A (ja) * 1985-03-20 1986-09-22 Hitachi Ltd 投影露光装置
JPH01195445A (ja) 1988-01-29 1989-08-07 Matsushita Electric Ind Co Ltd レジストの露光方法
JP4011643B2 (ja) * 1996-01-05 2007-11-21 キヤノン株式会社 半導体製造装置
AU6853598A (en) * 1997-04-18 1998-11-13 Nikon Corporation Aligner, exposure method using the aligner, and method of manufacture of circuitdevice
JPH1187230A (ja) * 1997-09-01 1999-03-30 Canon Inc 露光装置およびデバイス製造方法
JPH11354409A (ja) * 1998-06-09 1999-12-24 Canon Inc 照明装置、これを備えた投影露光装置、及び半導体装置の製造方法
US6690450B2 (en) * 2000-01-31 2004-02-10 Nikon Corporation Exposure method, exposure apparatus, method for producing exposure apparatus, and method for producing device
JP2003257822A (ja) * 2002-02-28 2003-09-12 Nikon Corp 光学装置及び露光装置
US20050175497A1 (en) * 2002-08-29 2005-08-11 Nikon Corporation Temperature control method and apparatus and exposure method and apparatus
JP2004281854A (ja) * 2003-03-18 2004-10-07 Canon Inc 露光装置
JP2005142185A (ja) * 2003-11-04 2005-06-02 Canon Inc 露光装置及びその環境制御方法
JP5448724B2 (ja) 2009-10-29 2014-03-19 キヤノン株式会社 露光装置及びデバイスの製造方法
JP5936328B2 (ja) * 2010-10-22 2016-06-22 キヤノン株式会社 露光装置およびデバイス製造方法
JP6099969B2 (ja) 2012-12-27 2017-03-22 キヤノン株式会社 露光装置及びデバイスの製造方法

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4273421B2 (ja) 2002-08-29 2009-06-03 株式会社ニコン 温度制御方法及び装置、並びに露光方法及び装置

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20180100495A (ko) * 2017-03-01 2018-09-11 가부시키가이샤 스크린 홀딩스 노광 장치, 기판 처리 장치, 기판의 노광 방법 및 기판 처리 방법
KR102103632B1 (ko) 2017-03-01 2020-04-22 가부시키가이샤 스크린 홀딩스 노광 장치, 기판 처리 장치, 기판의 노광 방법 및 기판 처리 방법

Also Published As

Publication number Publication date
JP2014127620A (ja) 2014-07-07
US20140186755A1 (en) 2014-07-03
KR20140085355A (ko) 2014-07-07
US9280050B2 (en) 2016-03-08
JP6099970B2 (ja) 2017-03-22

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