JP2008109134A - 真空処理装置及び真空処理方法 - Google Patents

真空処理装置及び真空処理方法 Download PDF

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Publication number
JP2008109134A
JP2008109134A JP2007270341A JP2007270341A JP2008109134A JP 2008109134 A JP2008109134 A JP 2008109134A JP 2007270341 A JP2007270341 A JP 2007270341A JP 2007270341 A JP2007270341 A JP 2007270341A JP 2008109134 A JP2008109134 A JP 2008109134A
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JP
Japan
Prior art keywords
cassette
processing
wafer
vacuum
wafers
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2007270341A
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English (en)
Japanese (ja)
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JP2008109134A5 (enrdf_load_stackoverflow
Inventor
Koji Nishihata
廣治 西畑
Kazuhiro Shiroo
和博 城尾
Shiyouji Ikuhara
祥二 幾原
Tetsuya Tawara
哲也 田原
Masashi Okiguchi
昌司 沖口
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Hitachi High Tech Corp
Original Assignee
Hitachi High Technologies Corp
Hitachi Ltd
Hitachi High Tech Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication date
Application filed by Hitachi High Technologies Corp, Hitachi Ltd, Hitachi High Tech Corp filed Critical Hitachi High Technologies Corp
Priority to JP2007270341A priority Critical patent/JP2008109134A/ja
Publication of JP2008109134A publication Critical patent/JP2008109134A/ja
Publication of JP2008109134A5 publication Critical patent/JP2008109134A5/ja
Pending legal-status Critical Current

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  • Drying Of Semiconductors (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Physical Vapour Deposition (AREA)
  • Chemical Vapour Deposition (AREA)
JP2007270341A 2007-10-17 2007-10-17 真空処理装置及び真空処理方法 Pending JP2008109134A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2007270341A JP2008109134A (ja) 2007-10-17 2007-10-17 真空処理装置及び真空処理方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2007270341A JP2008109134A (ja) 2007-10-17 2007-10-17 真空処理装置及び真空処理方法

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP2004153482A Division JP4121480B2 (ja) 2004-05-24 2004-05-24 真空処理方法及び真空処理装置

Publications (2)

Publication Number Publication Date
JP2008109134A true JP2008109134A (ja) 2008-05-08
JP2008109134A5 JP2008109134A5 (enrdf_load_stackoverflow) 2009-04-30

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ID=39442185

Family Applications (1)

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JP2007270341A Pending JP2008109134A (ja) 2007-10-17 2007-10-17 真空処理装置及び真空処理方法

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JP (1) JP2008109134A (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010161346A (ja) * 2008-12-10 2010-07-22 Hitachi Kokusai Electric Inc 基板処理装置及び基板処理装置における表示方法

Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63133532A (ja) * 1986-10-24 1988-06-06 ゼネラル　シグナル　コーポレーション 四重処理用プロセッサ
JPH03274746A (ja) * 1990-03-24 1991-12-05 Sony Corp マルチチャンバ装置
JPH0555148A (ja) * 1991-08-27 1993-03-05 Toshiba Mach Co Ltd マルチチヤンバ型枚葉処理方法およびその装置
JPH05226453A (ja) * 1992-02-17 1993-09-03 Hitachi Ltd 真空処理装置
JPH0697261A (ja) * 1992-09-09 1994-04-08 Kokusai Electric Co Ltd ウェーハ移載制御装置及びその制御方法
JPH06314729A (ja) * 1993-04-28 1994-11-08 Tel Varian Ltd 真空処理装置
JPH07320997A (ja) * 1994-05-24 1995-12-08 Tokyo Electron Ltd 処理装置
JPH0950948A (ja) * 1995-08-08 1997-02-18 Kokusai Electric Co Ltd 半導体製造装置の障害対処システム

Patent Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63133532A (ja) * 1986-10-24 1988-06-06 ゼネラル　シグナル　コーポレーション 四重処理用プロセッサ
JPH03274746A (ja) * 1990-03-24 1991-12-05 Sony Corp マルチチャンバ装置
JPH0555148A (ja) * 1991-08-27 1993-03-05 Toshiba Mach Co Ltd マルチチヤンバ型枚葉処理方法およびその装置
JPH05226453A (ja) * 1992-02-17 1993-09-03 Hitachi Ltd 真空処理装置
JPH0697261A (ja) * 1992-09-09 1994-04-08 Kokusai Electric Co Ltd ウェーハ移載制御装置及びその制御方法
JPH06314729A (ja) * 1993-04-28 1994-11-08 Tel Varian Ltd 真空処理装置
JPH07320997A (ja) * 1994-05-24 1995-12-08 Tokyo Electron Ltd 処理装置
JPH0950948A (ja) * 1995-08-08 1997-02-18 Kokusai Electric Co Ltd 半導体製造装置の障害対処システム

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010161346A (ja) * 2008-12-10 2010-07-22 Hitachi Kokusai Electric Inc 基板処理装置及び基板処理装置における表示方法
US8874259B2 (en) 2008-12-10 2014-10-28 Hitachi Kokusai Electric, Inc. Substrate processing apparatus and method of processing error of substrate processing apparatus

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