JP2008102343A5 - - Google Patents

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Publication number
JP2008102343A5
JP2008102343A5 JP2006285262A JP2006285262A JP2008102343A5 JP 2008102343 A5 JP2008102343 A5 JP 2008102343A5 JP 2006285262 A JP2006285262 A JP 2006285262A JP 2006285262 A JP2006285262 A JP 2006285262A JP 2008102343 A5 JP2008102343 A5 JP 2008102343A5
Authority
JP
Japan
Prior art keywords
soluble polymer
containing water
resist substrate
substrate processing
processing solution
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2006285262A
Other languages
English (en)
Japanese (ja)
Other versions
JP2008102343A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP2006285262A priority Critical patent/JP2008102343A/ja
Priority claimed from JP2006285262A external-priority patent/JP2008102343A/ja
Priority to EP07829714A priority patent/EP2088469A4/en
Priority to US12/311,724 priority patent/US20100028817A1/en
Priority to KR1020097010135A priority patent/KR20090079242A/ko
Priority to CNA2007800377970A priority patent/CN101523295A/zh
Priority to PCT/JP2007/069978 priority patent/WO2008047720A1/ja
Priority to TW096138774A priority patent/TW200836025A/zh
Publication of JP2008102343A publication Critical patent/JP2008102343A/ja
Publication of JP2008102343A5 publication Critical patent/JP2008102343A5/ja
Pending legal-status Critical Current

Links

JP2006285262A 2006-10-19 2006-10-19 現像済みレジスト基板処理液とそれを用いたレジスト基板の処理方法 Pending JP2008102343A (ja)

Priority Applications (7)

Application Number Priority Date Filing Date Title
JP2006285262A JP2008102343A (ja) 2006-10-19 2006-10-19 現像済みレジスト基板処理液とそれを用いたレジスト基板の処理方法
EP07829714A EP2088469A4 (en) 2006-10-19 2007-10-12 SOLUTION FOR TREATING A RESISTANCE SUBSTRATE AFTER DEVELOPMENT PROCESSING AND METHOD FOR TREATING A RESIDUAL SUBSTRATE THEREFOR
US12/311,724 US20100028817A1 (en) 2006-10-19 2007-10-12 Solution for treatment of resist substrate after development processing and method for treatment of resist substrate using the same
KR1020097010135A KR20090079242A (ko) 2006-10-19 2007-10-12 현상 완료 레지스트 기판 처리액과 이를 사용한 레지스트 기판의 처리 방법
CNA2007800377970A CN101523295A (zh) 2006-10-19 2007-10-12 显影后抗蚀基板处理溶液及使用它的抗蚀基板处理方法
PCT/JP2007/069978 WO2008047720A1 (en) 2006-10-19 2007-10-12 Solution for treatment of resist substrate after development processing, and method for treatment of resist substrate using the same
TW096138774A TW200836025A (en) 2006-10-19 2007-10-17 Treatment liquid for developed resist substrate and treating method for resist substrate using therewith

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2006285262A JP2008102343A (ja) 2006-10-19 2006-10-19 現像済みレジスト基板処理液とそれを用いたレジスト基板の処理方法

Publications (2)

Publication Number Publication Date
JP2008102343A JP2008102343A (ja) 2008-05-01
JP2008102343A5 true JP2008102343A5 (https=) 2009-04-23

Family

ID=39313951

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2006285262A Pending JP2008102343A (ja) 2006-10-19 2006-10-19 現像済みレジスト基板処理液とそれを用いたレジスト基板の処理方法

Country Status (7)

Country Link
US (1) US20100028817A1 (https=)
EP (1) EP2088469A4 (https=)
JP (1) JP2008102343A (https=)
KR (1) KR20090079242A (https=)
CN (1) CN101523295A (https=)
TW (1) TW200836025A (https=)
WO (1) WO2008047720A1 (https=)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5000260B2 (ja) * 2006-10-19 2012-08-15 ＡｚエレクトロニックマテリアルズＩｐ株式会社 微細化されたパターンの形成方法およびそれに用いるレジスト基板処理液
JP5306755B2 (ja) * 2008-09-16 2013-10-02 ＡｚエレクトロニックマテリアルズＩｐ株式会社 基板処理液およびそれを用いたレジスト基板処理方法
JP5591623B2 (ja) * 2010-08-13 2014-09-17 ＡｚエレクトロニックマテリアルズＩｐ株式会社 リソグラフィー用リンス液およびそれを用いたパターン形成方法
JP5705669B2 (ja) * 2011-07-14 2015-04-22 メルクパフォーマンスマテリアルズＩｐ合同会社 微細パターン形成用組成物およびそれを用いた微細化されたパターン形成方法
US9097977B2 (en) 2012-05-15 2015-08-04 Tokyo Electron Limited Process sequence for reducing pattern roughness and deformity
CA2895717A1 (en) 2012-12-21 2014-06-26 Covanta Energy, Llc Gasification combustion system

Family Cites Families (22)

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Publication number Priority date Publication date Assignee Title
US3833531A (en) * 1970-04-22 1974-09-03 Hercules Inc Reaction products of epihalohydrin and polymers of diallylamine and salts thereof and their use in paper
US3700623A (en) * 1970-04-22 1972-10-24 Hercules Inc Reaction products of epihalohydrin and polymers of diallylamine and their use in paper
US4053512A (en) * 1976-08-02 1977-10-11 American Cyanamid Company Process for preparing poly(allyltrialkylammonium) salt flocculants
US4350759A (en) * 1981-03-30 1982-09-21 Polaroid Corporation Allyl amine polymeric binders for photographic emulsions
JPS60110987A (ja) * 1983-11-15 1985-06-17 日東紡績株式会社 染色堅牢度向上法
US4537831A (en) * 1984-02-22 1985-08-27 Air Products And Chemicals, Inc. Crosslinking of chlorine-containing polymers
US6203785B1 (en) * 1996-12-30 2001-03-20 Geltex Pharmaceuticals, Inc. Poly(diallylamine)-based bile acid sequestrants
TW372337B (en) * 1997-03-31 1999-10-21 Mitsubishi Electric Corp Material for forming micropattern and manufacturing method of semiconductor using the material and semiconductor apparatus
AU9184998A (en) * 1997-10-29 1999-05-17 Nitto Boseki Co. Ltd. Processes for producing n,n-dialkylallylamine polymers and n,n-dialkylallylaminepolymers
US7129199B2 (en) 2002-08-12 2006-10-31 Air Products And Chemicals, Inc. Process solutions containing surfactants
JP2001066782A (ja) * 1999-08-26 2001-03-16 Mitsubishi Electric Corp 半導体装置の製造方法並びに半導体装置
US7189783B2 (en) * 2001-11-27 2007-03-13 Fujitsu Limited Resist pattern thickening material, resist pattern and forming process thereof, and semiconductor device and manufacturing process thereof
JP4045180B2 (ja) 2002-12-03 2008-02-13 Ａｚエレクトロニックマテリアルズ株式会社 リソグラフィー用リンス液およびそれを用いたレジストパターン形成方法
EP1584633B1 (en) * 2003-04-01 2010-10-20 Nitto Boseki Co., Ltd. Modified polyallylamine and process for producing the same
JP4864698B2 (ja) * 2004-04-23 2012-02-01 東京応化工業株式会社 リソグラフィー用リンス液
JP2006011054A (ja) * 2004-06-25 2006-01-12 Shin Etsu Chem Co Ltd リンス液及びこれを用いたレジストパターン形成方法
JP2006030483A (ja) * 2004-07-14 2006-02-02 Tokyo Electron Ltd リンス処理方法および現像処理方法
JPWO2006025303A1 (ja) * 2004-09-01 2008-07-31 東京応化工業株式会社 リソグラフィー用リンス液とレジストパターン形成方法
JP4676325B2 (ja) * 2005-02-18 2011-04-27 富士通株式会社 レジストパターン厚肉化材料、レジストパターンの形成方法、半導体装置及びその製造方法
US7528200B2 (en) * 2006-02-01 2009-05-05 Ardes Enterprises, Inc. Epoxy hardener systems based on aminobis(methylene-ethyleneurea)
US7745077B2 (en) * 2008-06-18 2010-06-29 Az Electronic Materials Usa Corp. Composition for coating over a photoresist pattern
US20100028803A1 (en) * 2008-08-01 2010-02-04 Fujifilm Corporation Surface treating agent for resist pattern formation, resist composition, method of treating surface of resist pattern therewith and method of forming resist pattern

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