JP2008081726A5 - - Google Patents
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- Publication number
- JP2008081726A5 JP2008081726A5 JP2007142854A JP2007142854A JP2008081726A5 JP 2008081726 A5 JP2008081726 A5 JP 2008081726A5 JP 2007142854 A JP2007142854 A JP 2007142854A JP 2007142854 A JP2007142854 A JP 2007142854A JP 2008081726 A5 JP2008081726 A5 JP 2008081726A5
- Authority
- JP
- Japan
- Prior art keywords
- organic
- inorganic composite
- forming
- acrylic monomer
- forming material
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 239000002131 composite material Substances 0.000 claims 12
- 239000000463 material Substances 0.000 claims 11
- 230000003287 optical effect Effects 0.000 claims 6
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 claims 5
- 239000000178 monomer Substances 0.000 claims 5
- 150000001412 amines Chemical class 0.000 claims 4
- -1 fluorene compound Chemical class 0.000 claims 4
- 239000010419 fine particle Substances 0.000 claims 3
- 238000004519 manufacturing process Methods 0.000 claims 3
- 229910044991 metal oxide Inorganic materials 0.000 claims 3
- 150000004706 metal oxides Chemical class 0.000 claims 3
- NIHNNTQXNPWCJQ-UHFFFAOYSA-N o-biphenylenemethane Natural products C1=CC=C2CC3=CC=CC=C3C2=C1 NIHNNTQXNPWCJQ-UHFFFAOYSA-N 0.000 claims 3
- 150000003973 alkyl amines Chemical class 0.000 claims 2
- DMBHHRLKUKUOEG-UHFFFAOYSA-N diphenylamine Chemical compound C=1C=CC=CC=1NC1=CC=CC=C1 DMBHHRLKUKUOEG-UHFFFAOYSA-N 0.000 claims 2
- 239000006185 dispersion Substances 0.000 claims 2
- 239000003999 initiator Substances 0.000 claims 2
- 230000000379 polymerizing effect Effects 0.000 claims 2
- PAYRUJLWNCNPSJ-UHFFFAOYSA-N N-phenyl amine Natural products NC1=CC=CC=C1 PAYRUJLWNCNPSJ-UHFFFAOYSA-N 0.000 claims 1
- 125000003647 acryloyl group Chemical group O=C([*])C([H])=C([H])[H] 0.000 claims 1
- 125000002490 anilino group Chemical group [H]N(*)C1=C([H])C([H])=C([H])C([H])=C1[H] 0.000 claims 1
- 230000015572 biosynthetic process Effects 0.000 claims 1
- 230000001678 irradiating effect Effects 0.000 claims 1
- 229910000484 niobium oxide Inorganic materials 0.000 claims 1
- URLJKFSTXLNXLG-UHFFFAOYSA-N niobium(5+);oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Nb+5].[Nb+5] URLJKFSTXLNXLG-UHFFFAOYSA-N 0.000 claims 1
- 239000002530 phenolic antioxidant Substances 0.000 claims 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims 1
- 239000011347 resin Substances 0.000 claims 1
- 229920005989 resin Polymers 0.000 claims 1
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2007142854A JP2008081726A (ja) | 2006-08-30 | 2007-05-30 | 有機無機複合体形成用材料及び有機無機複合体並びにそれを用いた光学素子 |
| US11/847,091 US20080161444A1 (en) | 2006-08-30 | 2007-08-29 | Organic-inorganic composite forming material, organic-inorganic composite and optical element using the same |
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2006233973 | 2006-08-30 | ||
| JP2007142854A JP2008081726A (ja) | 2006-08-30 | 2007-05-30 | 有機無機複合体形成用材料及び有機無機複合体並びにそれを用いた光学素子 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2008081726A JP2008081726A (ja) | 2008-04-10 |
| JP2008081726A5 true JP2008081726A5 (enExample) | 2010-03-25 |
Family
ID=39352893
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2007142854A Withdrawn JP2008081726A (ja) | 2006-08-30 | 2007-05-30 | 有機無機複合体形成用材料及び有機無機複合体並びにそれを用いた光学素子 |
Country Status (2)
| Country | Link |
|---|---|
| US (1) | US20080161444A1 (enExample) |
| JP (1) | JP2008081726A (enExample) |
Families Citing this family (20)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4952906B2 (ja) * | 2006-11-15 | 2012-06-13 | ソニーケミカル＆インフォメーションデバイス株式会社 | 封止樹脂組成物及び発光素子 |
| JP2009256462A (ja) * | 2008-04-16 | 2009-11-05 | Olympus Corp | 光学用の材料組成物およびそれを用いた光学素子 |
| JP2009280731A (ja) * | 2008-05-23 | 2009-12-03 | Olympus Corp | 光学用の材料組成物およびそれを用いた光学素子 |
| JP5632122B2 (ja) * | 2008-06-17 | 2014-11-26 | 株式会社日本触媒 | 複合粒子、樹脂組成物、及び、その硬化物 |
| JP5618510B2 (ja) * | 2008-09-22 | 2014-11-05 | キヤノン株式会社 | 光学材料および光学素子 |
| JP5590851B2 (ja) * | 2008-12-10 | 2014-09-17 | キヤノン株式会社 | 回折光学素子、積層型回折光学素子及びその製造方法 |
| KR101107003B1 (ko) | 2009-04-09 | 2012-01-25 | 제일모직주식회사 | 이미지 센서 및 그 제조 방법 |
| KR101201831B1 (ko) | 2009-07-09 | 2012-11-15 | 제일모직주식회사 | 유-무기 하이브리드 조성물 및 이미지 센서 |
| ES2381808T3 (es) * | 2009-11-03 | 2012-05-31 | Bayer Materialscience Ag | Formulaciones de fotopolímeros con módulo mecánico ajustable Guv |
| KR101782182B1 (ko) * | 2009-11-03 | 2017-09-26 | 코베스트로 도이칠란드 아게 | 상이한 기록 공단량체를 갖는 광중합체 제제 |
| TWI488908B (zh) * | 2009-11-03 | 2015-06-21 | Bayer Materialscience Ag | 製造全像膜的方法 |
| TWI510355B (zh) * | 2010-01-29 | 2015-12-01 | Aji Co Ltd | 造形方法 |
| JP2012078155A (ja) * | 2010-09-30 | 2012-04-19 | Omron Corp | 受光レンズ、および光学式変位センサ |
| JP5815304B2 (ja) * | 2011-06-29 | 2015-11-17 | 日揮触媒化成株式会社 | 光学薄膜形成用塗料および光学薄膜 |
| JP2014198819A (ja) * | 2013-03-11 | 2014-10-23 | 富士フイルム株式会社 | 芳香環含有化合物、硬化性樹脂組成物、光学部品およびレンズ |
| CN105409327A (zh) * | 2013-05-22 | 2016-03-16 | 三菱丽阳株式会社 | 光取出薄膜及其制造方法、以及面发光体 |
| WO2020237259A1 (en) * | 2019-05-20 | 2020-11-26 | Crane & Co., Inc. | Use of nanoparticles to tune index of refraction of layers of a polymeric matrix to optimize microoptic (mo) focus |
| KR102794145B1 (ko) * | 2019-06-04 | 2025-04-11 | 주식회사 동진쎄미켐 | 광중합성 조성물 및 이를 이용한 경화막, 표시장치 |
| EP3789110A1 (en) * | 2019-09-06 | 2021-03-10 | Korea Atomic Energy Research Institute | Radionuclide adsorbent, method of preparing the same and method of removing radionuclide using the same |
| KR20230147696A (ko) * | 2021-02-24 | 2023-10-23 | 도쿄 오카 고교 가부시키가이샤 | 광 경화성 액상 조성물, 경화물, 및 경화물의 제조 방법 |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6632535B1 (en) * | 2000-06-08 | 2003-10-14 | Q2100, Inc. | Method of forming antireflective coatings |
| JP2006308844A (ja) * | 2005-04-28 | 2006-11-09 | Seiko Epson Corp | プラスチックレンズ及びプラスチックレンズの製造方法 |
-
2007
- 2007-05-30 JP JP2007142854A patent/JP2008081726A/ja not_active Withdrawn
- 2007-08-29 US US11/847,091 patent/US20080161444A1/en not_active Abandoned
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