JP2008016038A - 流体を分配するための停止/吸引弁を調節する制御システム - Google Patents
流体を分配するための停止/吸引弁を調節する制御システム Download PDFInfo
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- JP2008016038A JP2008016038A JP2007185233A JP2007185233A JP2008016038A JP 2008016038 A JP2008016038 A JP 2008016038A JP 2007185233 A JP2007185233 A JP 2007185233A JP 2007185233 A JP2007185233 A JP 2007185233A JP 2008016038 A JP2008016038 A JP 2008016038A
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- Prior art keywords
- pressure
- stop
- valve
- suction valve
- fluid
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
-
- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05D—SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
- G05D16/00—Control of fluid pressure
- G05D16/20—Control of fluid pressure characterised by the use of electric means
- G05D16/2006—Control of fluid pressure characterised by the use of electric means with direct action of electric energy on controlling means
- G05D16/2013—Control of fluid pressure characterised by the use of electric means with direct action of electric energy on controlling means using throttling means as controlling means
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C11/00—Component parts, details or accessories not specifically provided for in groups B05C1/00 - B05C9/00
- B05C11/10—Storage, supply or control of liquid or other fluent material; Recovery of excess liquid or other fluent material
- B05C11/1002—Means for controlling supply, i.e. flow or pressure, of liquid or other fluent material to the applying apparatus, e.g. valves
- B05C11/1007—Means for controlling supply, i.e. flow or pressure, of liquid or other fluent material to the applying apparatus, e.g. valves responsive to condition of liquid or other fluent material
- B05C11/1013—Means for controlling supply, i.e. flow or pressure, of liquid or other fluent material to the applying apparatus, e.g. valves responsive to condition of liquid or other fluent material responsive to flow or pressure of liquid or other fluent material
-
- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05D—SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
- G05D16/00—Control of fluid pressure
- G05D16/20—Control of fluid pressure characterised by the use of electric means
- G05D16/2006—Control of fluid pressure characterised by the use of electric means with direct action of electric energy on controlling means
- G05D16/2013—Control of fluid pressure characterised by the use of electric means with direct action of electric energy on controlling means using throttling means as controlling means
- G05D16/2026—Control of fluid pressure characterised by the use of electric means with direct action of electric energy on controlling means using throttling means as controlling means with a plurality of throttling means
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C11/00—Component parts, details or accessories not specifically provided for in groups B05C1/00 - B05C9/00
- B05C11/10—Storage, supply or control of liquid or other fluent material; Recovery of excess liquid or other fluent material
- B05C11/1002—Means for controlling supply, i.e. flow or pressure, of liquid or other fluent material to the applying apparatus, e.g. valves
- B05C11/1026—Valves
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C5/00—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work
- B05C5/02—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work the liquid or other fluent material being discharged through an outlet orifice by pressure, e.g. from an outlet device in contact or almost in contact, with the work
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/16—Coating processes; Apparatus therefor
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T137/00—Fluid handling
- Y10T137/0318—Processes
- Y10T137/0324—With control of flow by a condition or characteristic of a fluid
- Y10T137/0379—By fluid pressure
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T137/00—Fluid handling
- Y10T137/2278—Pressure modulating relays or followers
- Y10T137/2409—With counter-balancing pressure feedback to the modulating device
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T137/00—Fluid handling
- Y10T137/7722—Line condition change responsive valves
- Y10T137/7758—Pilot or servo controlled
- Y10T137/7759—Responsive to change in rate of fluid flow
- Y10T137/776—Control by pressures across flow line valve
Abstract
【課題】流体を精密に分配するように停止/吸引弁を調整する制御システムを提供する。
【解決手段】第1及び第2の流れ制限装置20,21は停止/吸引弁10の停止部分及び吸引部分とそれぞれ流体的に連通した第1及び第2の空気出口を有する。第1及び第2の圧力センサ24,25は第1の空気出口内の圧力及び第2の空気出口内の圧力を感知する。コンピュータプロセッサ30は第1及び第2の圧力センサに応答して第1及び第2の空気出口の圧力をそれぞれ制御する。停止/吸引弁の停止部分及び吸収部分の各々を所定の開放位置に維持するように、所定の時間に亘り前記第1及び第2の空気出口の圧力が維持され、且つ所定の時間に亘り停止/吸引弁の停止部分及び吸収部分の各々を所定の閉鎖位置に維持するように、第1及び第2の空気出口の圧力が制御される。
【選択図】 図1
Description
−停止弁の開き遷移時間
−吸引弁の閉じ遷移時間
−吸引弁の開き遷移時間
−停止弁の開き遅延時間
−停止弁の閉じ遅延時間
−入力又はトリガー部の機械類の形態
−入力又はトリガー部の作動可能状態
−出力又は認識機械類の形態
−出力又は認識作動可能な状態
工場の較正は、直列的なリンクを介して行われる。
−制御ソレノイド(吸引)のオフセット
−制御ソレノイド(停止)の勾配
−制御ソレノイド(吸引)の勾配
−制御アルゴリズムの入力(システムパラメータ、空圧供給管の長さ等)
開始信号が分配ポンプ又はトラックによりコントローラに送られる。この信号が一度び受け取られたならば、コントローラは、制御ソレノイドの出口側における圧力を測定し且つ制御ソレノイドに対する電流又は現在の「位置」を計算し且つこの値をD/A変換器に送り、この値が制御ソレノイドに付与される。このことは、停止/吸引弁への正確な圧力を保ち得るよう10乃至15ミリ秒ごとに繰り返される。コントローラが一度びプログラム化した圧力に達したことを感知したならば、信号は、ポンプ又はトラックに戻される。この圧力は、開始信号が除去されるまで保たれる。コントローラが、圧力が0に戻ったことを感知すると、ポンプには再度、信号が送られる。
12: 液体の入口管
13: 液体の出口管
20、21: 流れ制限装置(ソレノイド)
24、25: 圧力変換器
27: 圧力変換器
30: 制御回路(コンピュータプロセッサ)
Claims (5)
- 流体を分配するための停止/吸引弁を調節する制御システムにおいて、
前記停止/吸引弁の停止部分と流体的に連通した第1の空気出口を有する第1の流れ制限装置と、
前記停止/吸引弁の吸引部分と流体的に連通した第2の空気出口を有する第2の流れ制限装置と、
前記第1の空気出口内の圧力を感知する第1の圧力センサと、
前記第2の空気出口内の圧力を感知する第2の圧力センサと、
該第1及び第2の圧力センサに応答して、所定の時間に亘り前記停止/吸引弁の停止部分及び吸収部分の各々を所定の開放位置に調節するために、所定の時間での前記第1及び第2の空気出口の圧力をそれぞれ制御するコンピュータプロセッサであって、前記コンピュータプロセッサは、前記停止/吸引弁の停止部分及び吸収部分の各々を所定の開放位置に維持するように、所定の時間に亘り前記第1及び第2の空気出口の圧力を維持し、且つ所定の時間に亘り前記停止/吸引弁の停止部分及び吸収部分の各々を所定の閉鎖位置に維持するように、前記第1及び第2の空気出口の圧力を制御する前記コンピュータプロセッサと、
を備える、制御システム。 - 請求項1の制御システムにおいて、前記第1及び第2の流れ制限装置がソレノイドである、制御システム。
- 請求項1又は2の制御システムにおいて、前記停止/吸引弁が空圧弁である、制御システム。
- 請求項1ないし3の何れかの制御システムにおいて、前記停止/吸引弁と流体的に連通したノズルを更に備える、制御システム。
- 請求項1ないし4のいずれかの制御システムにおいて、前記停止/吸引弁に流体を供給するポンプを更に備える、制御システム。
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US11651199P | 1999-01-20 | 1999-01-20 | |
US14337099P | 1999-07-12 | 1999-07-12 |
Related Parent Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2000594579A Division JP2002535122A (ja) | 1999-01-20 | 2000-01-20 | 流れコントローラ |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2010163589A Division JP2011003203A (ja) | 1999-01-20 | 2010-07-21 | 流体を分配するための停止/吸引弁を調節する制御システム |
Publications (1)
Publication Number | Publication Date |
---|---|
JP2008016038A true JP2008016038A (ja) | 2008-01-24 |
Family
ID=26814324
Family Applications (4)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2000594579A Abandoned JP2002535122A (ja) | 1999-01-20 | 2000-01-20 | 流れコントローラ |
JP2007036275A Pending JP2007144422A (ja) | 1999-01-20 | 2007-02-16 | 多数点分配制御システム |
JP2007185233A Abandoned JP2008016038A (ja) | 1999-01-20 | 2007-07-17 | 流体を分配するための停止/吸引弁を調節する制御システム |
JP2010163589A Pending JP2011003203A (ja) | 1999-01-20 | 2010-07-21 | 流体を分配するための停止/吸引弁を調節する制御システム |
Family Applications Before (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2000594579A Abandoned JP2002535122A (ja) | 1999-01-20 | 2000-01-20 | 流れコントローラ |
JP2007036275A Pending JP2007144422A (ja) | 1999-01-20 | 2007-02-16 | 多数点分配制御システム |
Family Applications After (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2010163589A Pending JP2011003203A (ja) | 1999-01-20 | 2010-07-21 | 流体を分配するための停止/吸引弁を調節する制御システム |
Country Status (9)
Country | Link |
---|---|
US (2) | US6348098B1 (ja) |
EP (1) | EP1146967A4 (ja) |
JP (4) | JP2002535122A (ja) |
KR (1) | KR100590303B1 (ja) |
AU (1) | AU3211900A (ja) |
ID (1) | ID29539A (ja) |
IL (1) | IL143765A0 (ja) |
TW (1) | TW440757B (ja) |
WO (1) | WO2000043130A1 (ja) |
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US5900045A (en) * | 1997-04-18 | 1999-05-04 | Taiwan Semiconductor Manufacturing Co.Ltd. | Method and apparatus for eliminating air bubbles from a liquid dispensing line |
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KR100590303B1 (ko) * | 1999-01-20 | 2006-06-15 | 엔테그리스, 아이엔씨. | 유동 제어기 |
-
2000
- 2000-01-20 KR KR1020017009022A patent/KR100590303B1/ko not_active IP Right Cessation
- 2000-01-20 US US09/488,146 patent/US6348098B1/en not_active Expired - Lifetime
- 2000-01-20 ID ID20011593A patent/ID29539A/id unknown
- 2000-01-20 IL IL14376500A patent/IL143765A0/xx unknown
- 2000-01-20 EP EP00909945A patent/EP1146967A4/en not_active Withdrawn
- 2000-01-20 AU AU32119/00A patent/AU3211900A/en not_active Abandoned
- 2000-01-20 WO PCT/US2000/001493 patent/WO2000043130A1/en active IP Right Grant
- 2000-01-20 JP JP2000594579A patent/JP2002535122A/ja not_active Abandoned
- 2000-01-26 TW TW89100903A patent/TW440757B/zh not_active IP Right Cessation
-
2001
- 2001-11-16 US US09/991,392 patent/US6527862B2/en not_active Expired - Lifetime
-
2007
- 2007-02-16 JP JP2007036275A patent/JP2007144422A/ja active Pending
- 2007-07-17 JP JP2007185233A patent/JP2008016038A/ja not_active Abandoned
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2010
- 2010-07-21 JP JP2010163589A patent/JP2011003203A/ja active Pending
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JPH09299862A (ja) * | 1996-05-17 | 1997-11-25 | Koganei Corp | 薬液供給装置 |
JPH10246350A (ja) * | 1997-03-05 | 1998-09-14 | Smc Corp | サックバックバルブ |
JPH10252919A (ja) * | 1997-03-18 | 1998-09-22 | Smc Corp | サックバックバルブ |
JPH10318423A (ja) * | 1997-05-14 | 1998-12-04 | Smc Corp | サックバックバルブ |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
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WO2023126040A1 (en) * | 2022-01-03 | 2023-07-06 | Nel Hydrogen A/S | Compressor with reduced start-up torque |
Also Published As
Publication number | Publication date |
---|---|
EP1146967A4 (en) | 2009-05-20 |
WO2000043130A1 (en) | 2000-07-27 |
US6348098B1 (en) | 2002-02-19 |
KR100590303B1 (ko) | 2006-06-15 |
EP1146967A1 (en) | 2001-10-24 |
US6527862B2 (en) | 2003-03-04 |
IL143765A0 (en) | 2002-04-21 |
JP2002535122A (ja) | 2002-10-22 |
US20020029740A1 (en) | 2002-03-14 |
KR20010101571A (ko) | 2001-11-14 |
ID29539A (id) | 2001-09-06 |
JP2011003203A (ja) | 2011-01-06 |
JP2007144422A (ja) | 2007-06-14 |
AU3211900A (en) | 2000-08-07 |
TW440757B (en) | 2001-06-16 |
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