JP2008003581A - 感光性樹脂組成物及びそれを用いた回路基板 - Google Patents
感光性樹脂組成物及びそれを用いた回路基板 Download PDFInfo
- Publication number
- JP2008003581A JP2008003581A JP2007135568A JP2007135568A JP2008003581A JP 2008003581 A JP2008003581 A JP 2008003581A JP 2007135568 A JP2007135568 A JP 2007135568A JP 2007135568 A JP2007135568 A JP 2007135568A JP 2008003581 A JP2008003581 A JP 2008003581A
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- Prior art keywords
- group
- resin composition
- photosensitive resin
- film
- polyamic acid
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 239000011342 resin composition Substances 0.000 title claims abstract description 75
- 229920005575 poly(amic acid) Polymers 0.000 claims abstract description 40
- 239000010408 film Substances 0.000 claims description 70
- -1 carbamoyloxyimino group Chemical group 0.000 claims description 47
- 239000000758 substrate Substances 0.000 claims description 20
- 238000011161 development Methods 0.000 claims description 18
- 238000000034 method Methods 0.000 claims description 17
- 150000001875 compounds Chemical class 0.000 claims description 16
- 125000002723 alicyclic group Chemical group 0.000 claims description 12
- 125000003118 aryl group Chemical group 0.000 claims description 12
- 125000000732 arylene group Chemical group 0.000 claims description 12
- 239000003504 photosensitizing agent Substances 0.000 claims description 10
- 125000000547 substituted alkyl group Chemical group 0.000 claims description 10
- 239000007864 aqueous solution Substances 0.000 claims description 9
- 238000004519 manufacturing process Methods 0.000 claims description 8
- 229920001296 polysiloxane Polymers 0.000 claims description 8
- 238000010030 laminating Methods 0.000 claims description 7
- 239000013039 cover film Substances 0.000 claims description 5
- 125000000962 organic group Chemical group 0.000 claims description 5
- 238000012545 processing Methods 0.000 claims description 2
- 125000001183 hydrocarbyl group Chemical group 0.000 claims 1
- 239000003513 alkali Substances 0.000 abstract description 7
- 239000000203 mixture Substances 0.000 abstract description 6
- 239000006227 byproduct Substances 0.000 abstract description 5
- 125000004122 cyclic group Chemical group 0.000 abstract description 5
- 150000001923 cyclic compounds Chemical class 0.000 abstract description 2
- GTDPSWPPOUPBNX-UHFFFAOYSA-N ac1mqpva Chemical compound CC12C(=O)OC(=O)C1(C)C1(C)C2(C)C(=O)OC1=O GTDPSWPPOUPBNX-UHFFFAOYSA-N 0.000 description 21
- 239000000243 solution Substances 0.000 description 18
- 230000018109 developmental process Effects 0.000 description 16
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 15
- 239000002585 base Substances 0.000 description 15
- ARCGXLSVLAOJQL-UHFFFAOYSA-N trimellitic acid Chemical compound OC(=O)C1=CC=C(C(O)=O)C(C(O)=O)=C1 ARCGXLSVLAOJQL-UHFFFAOYSA-N 0.000 description 14
- 239000000463 material Substances 0.000 description 11
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 9
- 229920001721 polyimide Polymers 0.000 description 9
- 239000002904 solvent Substances 0.000 description 9
- 150000004985 diamines Chemical class 0.000 description 8
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 8
- 125000006158 tetracarboxylic acid group Chemical group 0.000 description 8
- 239000011248 coating agent Substances 0.000 description 7
- 238000000576 coating method Methods 0.000 description 7
- 238000010438 heat treatment Methods 0.000 description 7
- 150000003254 radicals Chemical class 0.000 description 7
- YEJRWHAVMIAJKC-UHFFFAOYSA-N 4-Butyrolactone Chemical compound O=C1CCCO1 YEJRWHAVMIAJKC-UHFFFAOYSA-N 0.000 description 6
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 6
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 6
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 6
- 239000004642 Polyimide Substances 0.000 description 6
- 150000008065 acid anhydrides Chemical class 0.000 description 6
- KZTYYGOKRVBIMI-UHFFFAOYSA-N diphenyl sulfone Chemical class C=1C=CC=CC=1S(=O)(=O)C1=CC=CC=C1 KZTYYGOKRVBIMI-UHFFFAOYSA-N 0.000 description 6
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 6
- 229910052753 mercury Inorganic materials 0.000 description 6
- 238000000206 photolithography Methods 0.000 description 6
- 239000000126 substance Substances 0.000 description 6
- 230000015572 biosynthetic process Effects 0.000 description 5
- 239000007921 spray Substances 0.000 description 5
- 238000003786 synthesis reaction Methods 0.000 description 5
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 4
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 4
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 4
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 4
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 4
- 238000004090 dissolution Methods 0.000 description 4
- 239000000975 dye Substances 0.000 description 4
- 150000002430 hydrocarbons Chemical group 0.000 description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 4
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 239000002253 acid Substances 0.000 description 3
- 125000002015 acyclic group Chemical group 0.000 description 3
- 238000003776 cleavage reaction Methods 0.000 description 3
- 238000001035 drying Methods 0.000 description 3
- 238000011156 evaluation Methods 0.000 description 3
- 238000009472 formulation Methods 0.000 description 3
- 150000002576 ketones Chemical class 0.000 description 3
- 239000007788 liquid Substances 0.000 description 3
- 238000002156 mixing Methods 0.000 description 3
- 125000000951 phenoxy group Chemical group [H]C1=C([H])C([H])=C(O*)C([H])=C1[H] 0.000 description 3
- 239000002994 raw material Substances 0.000 description 3
- 239000011347 resin Substances 0.000 description 3
- 229920005989 resin Polymers 0.000 description 3
- 230000007017 scission Effects 0.000 description 3
- YRHRIQCWCFGUEQ-UHFFFAOYSA-N thioxanthen-9-one Chemical class C1=CC=C2C(=O)C3=CC=CC=C3SC2=C1 YRHRIQCWCFGUEQ-UHFFFAOYSA-N 0.000 description 3
- BTJPUDCSZVCXFQ-UHFFFAOYSA-N 2,4-diethylthioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=CC(CC)=CC(CC)=C3SC2=C1 BTJPUDCSZVCXFQ-UHFFFAOYSA-N 0.000 description 2
- JEAQJTYJUMGUCD-UHFFFAOYSA-N 3,4,5-triphenylphthalic acid Chemical compound C=1C=CC=CC=1C=1C(C=2C=CC=CC=2)=C(C(O)=O)C(C(=O)O)=CC=1C1=CC=CC=C1 JEAQJTYJUMGUCD-UHFFFAOYSA-N 0.000 description 2
- DKKYOQYISDAQER-UHFFFAOYSA-N 3-[3-(3-aminophenoxy)phenoxy]aniline Chemical compound NC1=CC=CC(OC=2C=C(OC=3C=C(N)C=CC=3)C=CC=2)=C1 DKKYOQYISDAQER-UHFFFAOYSA-N 0.000 description 2
- VVBLNCFGVYUYGU-UHFFFAOYSA-N 4,4'-Bis(dimethylamino)benzophenone Chemical compound C1=CC(N(C)C)=CC=C1C(=O)C1=CC=C(N(C)C)C=C1 VVBLNCFGVYUYGU-UHFFFAOYSA-N 0.000 description 2
- JCRRFJIVUPSNTA-UHFFFAOYSA-N 4-[4-(4-aminophenoxy)phenoxy]aniline Chemical compound C1=CC(N)=CC=C1OC(C=C1)=CC=C1OC1=CC=C(N)C=C1 JCRRFJIVUPSNTA-UHFFFAOYSA-N 0.000 description 2
- PBCPTERMUCBORC-UHFFFAOYSA-N 6-hydroxyimino-6-phenylhexanoic acid Chemical compound ON=C(CCCCC(O)=O)c1ccccc1 PBCPTERMUCBORC-UHFFFAOYSA-N 0.000 description 2
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 229920002799 BoPET Polymers 0.000 description 2
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 2
- UFWIBTONFRDIAS-UHFFFAOYSA-N Naphthalene Chemical compound C1=CC=CC2=CC=CC=C21 UFWIBTONFRDIAS-UHFFFAOYSA-N 0.000 description 2
- 206010034972 Photosensitivity reaction Diseases 0.000 description 2
- ATUOYWHBWRKTHZ-UHFFFAOYSA-N Propane Chemical compound CCC ATUOYWHBWRKTHZ-UHFFFAOYSA-N 0.000 description 2
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 2
- 150000001412 amines Chemical class 0.000 description 2
- 125000003277 amino group Chemical group 0.000 description 2
- MWPLVEDNUUSJAV-UHFFFAOYSA-N anthracene Chemical compound C1=CC=CC2=CC3=CC=CC=C3C=C21 MWPLVEDNUUSJAV-UHFFFAOYSA-N 0.000 description 2
- 230000003373 anti-fouling effect Effects 0.000 description 2
- 150000004984 aromatic diamines Chemical class 0.000 description 2
- 150000008365 aromatic ketones Chemical class 0.000 description 2
- 239000012298 atmosphere Substances 0.000 description 2
- 239000012965 benzophenone Substances 0.000 description 2
- IMHDGJOMLMDPJN-UHFFFAOYSA-N biphenyl-2,2'-diol Chemical group OC1=CC=CC=C1C1=CC=CC=C1O IMHDGJOMLMDPJN-UHFFFAOYSA-N 0.000 description 2
- WKDNYTOXBCRNPV-UHFFFAOYSA-N bpda Chemical compound C1=C2C(=O)OC(=O)C2=CC(C=2C=C3C(=O)OC(C3=CC=2)=O)=C1 WKDNYTOXBCRNPV-UHFFFAOYSA-N 0.000 description 2
- 125000004106 butoxy group Chemical group [*]OC([H])([H])C([H])([H])C(C([H])([H])[H])([H])[H] 0.000 description 2
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- VHRGRCVQAFMJIZ-UHFFFAOYSA-N cadaverine Chemical compound NCCCCCN VHRGRCVQAFMJIZ-UHFFFAOYSA-N 0.000 description 2
- 239000003054 catalyst Substances 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 239000003795 chemical substances by application Substances 0.000 description 2
- 150000004775 coumarins Chemical class 0.000 description 2
- 125000006159 dianhydride group Chemical group 0.000 description 2
- USIUVYZYUHIAEV-UHFFFAOYSA-N diphenyl ether Natural products C=1C=CC=CC=1OC1=CC=CC=C1 USIUVYZYUHIAEV-UHFFFAOYSA-N 0.000 description 2
- 150000002148 esters Chemical class 0.000 description 2
- 150000002170 ethers Chemical class 0.000 description 2
- 125000001301 ethoxy group Chemical group [H]C([H])([H])C([H])([H])O* 0.000 description 2
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 230000009477 glass transition Effects 0.000 description 2
- 239000003112 inhibitor Substances 0.000 description 2
- 125000002510 isobutoxy group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])O* 0.000 description 2
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 2
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 2
- 238000003475 lamination Methods 0.000 description 2
- 229920001684 low density polyethylene Polymers 0.000 description 2
- 239000004702 low-density polyethylene Substances 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 description 2
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 125000001624 naphthyl group Chemical group 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- 239000012299 nitrogen atmosphere Substances 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- 239000003960 organic solvent Substances 0.000 description 2
- 230000036211 photosensitivity Effects 0.000 description 2
- 229920000139 polyethylene terephthalate Polymers 0.000 description 2
- 239000005020 polyethylene terephthalate Substances 0.000 description 2
- 230000008569 process Effects 0.000 description 2
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- 230000001681 protective effect Effects 0.000 description 2
- 125000005920 sec-butoxy group Chemical group 0.000 description 2
- 125000002914 sec-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 2
- 229910000029 sodium carbonate Inorganic materials 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- 238000003756 stirring Methods 0.000 description 2
- 125000001424 substituent group Chemical group 0.000 description 2
- 150000003457 sulfones Chemical class 0.000 description 2
- WGTYBPLFGIVFAS-UHFFFAOYSA-M tetramethylammonium hydroxide Chemical compound [OH-].C[N+](C)(C)C WGTYBPLFGIVFAS-UHFFFAOYSA-M 0.000 description 2
- FYSNRJHAOHDILO-UHFFFAOYSA-N thionyl chloride Chemical compound ClS(Cl)=O FYSNRJHAOHDILO-UHFFFAOYSA-N 0.000 description 2
- XFNJVJPLKCPIBV-UHFFFAOYSA-N trimethylenediamine Chemical compound NCCCN XFNJVJPLKCPIBV-UHFFFAOYSA-N 0.000 description 2
- NSGXIBWMJZWTPY-UHFFFAOYSA-N 1,1,1,3,3,3-hexafluoropropane Chemical compound FC(F)(F)CC(F)(F)F NSGXIBWMJZWTPY-UHFFFAOYSA-N 0.000 description 1
- GJZFGDYLJLCGHT-UHFFFAOYSA-N 1,2-diethylthioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=C(CC)C(CC)=CC=C3SC2=C1 GJZFGDYLJLCGHT-UHFFFAOYSA-N 0.000 description 1
- GEYOCULIXLDCMW-UHFFFAOYSA-N 1,2-phenylenediamine Chemical class NC1=CC=CC=C1N GEYOCULIXLDCMW-UHFFFAOYSA-N 0.000 description 1
- SBHHKGFHJWTZJN-UHFFFAOYSA-N 1,3-dimethylcyclobutane-1,2,3,4-tetracarboxylic acid Chemical compound OC(=O)C1(C)C(C(O)=O)C(C)(C(O)=O)C1C(O)=O SBHHKGFHJWTZJN-UHFFFAOYSA-N 0.000 description 1
- 125000001989 1,3-phenylene group Chemical group [H]C1=C([H])C([*:1])=C([H])C([*:2])=C1[H] 0.000 description 1
- WZCQRUWWHSTZEM-UHFFFAOYSA-N 1,3-phenylenediamine Chemical compound NC1=CC=CC(N)=C1 WZCQRUWWHSTZEM-UHFFFAOYSA-N 0.000 description 1
- AZQWKYJCGOJGHM-UHFFFAOYSA-N 1,4-benzoquinone Chemical compound O=C1C=CC(=O)C=C1 AZQWKYJCGOJGHM-UHFFFAOYSA-N 0.000 description 1
- 125000001140 1,4-phenylene group Chemical group [H]C1=C([H])C([*:2])=C([H])C([H])=C1[*:1] 0.000 description 1
- CBCKQZAAMUWICA-UHFFFAOYSA-N 1,4-phenylenediamine Chemical compound NC1=CC=C(N)C=C1 CBCKQZAAMUWICA-UHFFFAOYSA-N 0.000 description 1
- PWGJDPKCLMLPJW-UHFFFAOYSA-N 1,8-diaminooctane Chemical compound NCCCCCCCCN PWGJDPKCLMLPJW-UHFFFAOYSA-N 0.000 description 1
- CGSKOGYKWHUSLC-UHFFFAOYSA-N 1-(4-aminophenyl)-1,3,3-trimethyl-2h-inden-5-amine Chemical compound C12=CC=C(N)C=C2C(C)(C)CC1(C)C1=CC=C(N)C=C1 CGSKOGYKWHUSLC-UHFFFAOYSA-N 0.000 description 1
- UNYPOFWEGVYMRJ-UHFFFAOYSA-N 1-azidoanthracene-9,10-dione Chemical compound O=C1C2=CC=CC=C2C(=O)C2=C1C=CC=C2N=[N+]=[N-] UNYPOFWEGVYMRJ-UHFFFAOYSA-N 0.000 description 1
- VLDPXPPHXDGHEW-UHFFFAOYSA-N 1-chloro-2-dichlorophosphoryloxybenzene Chemical compound ClC1=CC=CC=C1OP(Cl)(Cl)=O VLDPXPPHXDGHEW-UHFFFAOYSA-N 0.000 description 1
- YIKSHDNOAYSSPX-UHFFFAOYSA-N 1-propan-2-ylthioxanthen-9-one Chemical compound S1C2=CC=CC=C2C(=O)C2=C1C=CC=C2C(C)C YIKSHDNOAYSSPX-UHFFFAOYSA-N 0.000 description 1
- UXOXUHMFQZEAFR-UHFFFAOYSA-N 2,2',5,5'-Tetrachlorobenzidine Chemical group C1=C(Cl)C(N)=CC(Cl)=C1C1=CC(Cl)=C(N)C=C1Cl UXOXUHMFQZEAFR-UHFFFAOYSA-N 0.000 description 1
- KKTUQAYCCLMNOA-UHFFFAOYSA-N 2,3-diaminobenzoic acid Chemical class NC1=CC=CC(C(O)=O)=C1N KKTUQAYCCLMNOA-UHFFFAOYSA-N 0.000 description 1
- PCAXITAPTVOLGL-UHFFFAOYSA-N 2,3-diaminophenol Chemical class NC1=CC=CC(O)=C1N PCAXITAPTVOLGL-UHFFFAOYSA-N 0.000 description 1
- LXQOQPGNCGEELI-UHFFFAOYSA-N 2,4-dinitroaniline Chemical compound NC1=CC=C([N+]([O-])=O)C=C1[N+]([O-])=O LXQOQPGNCGEELI-UHFFFAOYSA-N 0.000 description 1
- XPNZGOXGWANTBW-UHFFFAOYSA-N 2-[2-[2-(2-carboxyphenoxy)phenyl]sulfonylphenoxy]benzoic acid Chemical class OC(=O)C1=CC=CC=C1OC1=CC=CC=C1S(=O)(=O)C1=CC=CC=C1OC1=CC=CC=C1C(O)=O XPNZGOXGWANTBW-UHFFFAOYSA-N 0.000 description 1
- NARCYYCAXRVBGS-UHFFFAOYSA-N 2-[4-[4-(2-hydroxyphenoxy)phenyl]phenoxy]phenol Chemical group OC1=CC=CC=C1OC1=CC=C(C=2C=CC(OC=3C(=CC=CC=3)O)=CC=2)C=C1 NARCYYCAXRVBGS-UHFFFAOYSA-N 0.000 description 1
- OJPDDQSCZGTACX-UHFFFAOYSA-N 2-[n-(2-hydroxyethyl)anilino]ethanol Chemical compound OCCN(CCO)C1=CC=CC=C1 OJPDDQSCZGTACX-UHFFFAOYSA-N 0.000 description 1
- YYHRJJWMKQMOFN-UHFFFAOYSA-N 2-amino-4-(3-amino-4-carboxyphenyl)benzoic acid Chemical group C1=C(C(O)=O)C(N)=CC(C=2C=C(N)C(C(O)=O)=CC=2)=C1 YYHRJJWMKQMOFN-UHFFFAOYSA-N 0.000 description 1
- UTYHQSKRFPHMQQ-UHFFFAOYSA-N 2-amino-4-(3-amino-4-hydroxyphenoxy)phenol Chemical compound C1=C(O)C(N)=CC(OC=2C=C(N)C(O)=CC=2)=C1 UTYHQSKRFPHMQQ-UHFFFAOYSA-N 0.000 description 1
- KZLDGFZCFRXUIB-UHFFFAOYSA-N 2-amino-4-(3-amino-4-hydroxyphenyl)phenol Chemical group C1=C(O)C(N)=CC(C=2C=C(N)C(O)=CC=2)=C1 KZLDGFZCFRXUIB-UHFFFAOYSA-N 0.000 description 1
- KECOIASOKMSRFT-UHFFFAOYSA-N 2-amino-4-(3-amino-4-hydroxyphenyl)sulfonylphenol Chemical compound C1=C(O)C(N)=CC(S(=O)(=O)C=2C=C(N)C(O)=CC=2)=C1 KECOIASOKMSRFT-UHFFFAOYSA-N 0.000 description 1
- KCFVSHSJPIVGCG-UHFFFAOYSA-N 2-amino-4-[(3-amino-4-hydroxyphenyl)methyl]phenol Chemical compound C1=C(O)C(N)=CC(CC=2C=C(N)C(O)=CC=2)=C1 KCFVSHSJPIVGCG-UHFFFAOYSA-N 0.000 description 1
- GPWZWWICAGSVPI-UHFFFAOYSA-N 2-amino-4-[2-(3-amino-4-carboxyphenyl)-1,1,1,3,3,3-hexafluoropropan-2-yl]benzoic acid Chemical compound C1=C(C(O)=O)C(N)=CC(C(C=2C=C(N)C(C(O)=O)=CC=2)(C(F)(F)F)C(F)(F)F)=C1 GPWZWWICAGSVPI-UHFFFAOYSA-N 0.000 description 1
- DLLQVJOXCPRYAP-UHFFFAOYSA-N 2-amino-4-[2-(3-amino-4-carboxyphenyl)propan-2-yl]benzoic acid Chemical compound C=1C=C(C(O)=O)C(N)=CC=1C(C)(C)C1=CC=C(C(O)=O)C(N)=C1 DLLQVJOXCPRYAP-UHFFFAOYSA-N 0.000 description 1
- UHIDYCYNRPVZCK-UHFFFAOYSA-N 2-amino-4-[2-(3-amino-4-hydroxyphenyl)propan-2-yl]phenol Chemical compound C=1C=C(O)C(N)=CC=1C(C)(C)C1=CC=C(O)C(N)=C1 UHIDYCYNRPVZCK-UHFFFAOYSA-N 0.000 description 1
- XNMHGYOHNVQQEI-UHFFFAOYSA-N 2-amino-5-(4-amino-2,5-dicarboxyphenyl)terephthalic acid Chemical group C1=C(C(O)=O)C(N)=CC(C(O)=O)=C1C1=CC(C(O)=O)=C(N)C=C1C(O)=O XNMHGYOHNVQQEI-UHFFFAOYSA-N 0.000 description 1
- GOTHKMOMTHYAQH-UHFFFAOYSA-N 2-amino-5-(4-amino-2,5-dihydroxyphenyl)benzene-1,4-diol Chemical group C1=C(O)C(N)=CC(O)=C1C1=CC(O)=C(N)C=C1O GOTHKMOMTHYAQH-UHFFFAOYSA-N 0.000 description 1
- IIQLVLWFQUUZII-UHFFFAOYSA-N 2-amino-5-(4-amino-3-carboxyphenyl)benzoic acid Chemical group C1=C(C(O)=O)C(N)=CC=C1C1=CC=C(N)C(C(O)=O)=C1 IIQLVLWFQUUZII-UHFFFAOYSA-N 0.000 description 1
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Abstract
【解決手段】本発明の感光性樹脂組成物は、光塩基発生剤(A)とポリアミド酸(B)とを含有する感光性樹脂組成物であって、前記光塩基発生剤(A)は、光による解裂部位を環状構造内に含む環状化合物を含有することを特徴とする。
【選択図】なし
Description
本発明の光塩基発生剤は、波長が200nmから500nmの光に対して良好に分解し、塩基を発生することができる。その際、本発明の光塩基発生剤は、アシルオキシイミノ基又はカルバモイルオキシイミノ基が環状構造に含まれているため、光解裂反応で生成するラジカル種同士が共有結合で結ばれており、副生成物が生成しない。さらに、本発明における光塩基発生剤は、光による開裂後発生するラジカル種同士が共有結合で結ばれているため、ラジカル再カップリングの効率が非環状型の光塩基発生剤より高く、それにより塩基の発生効率を向上させることが可能である。
[光塩基発生剤合成例]
5−ベンゾイルペンタノイックアシッド7.5g(36ミリモル)(東京化成株式会社製)、ヒドロキシアンモニウムクロリド3.75g(和光純薬株式会社製)、メタノール30mlをフラスコに入れ、KOH5.6gを含む水溶液15mlを加え、攪拌しながら60℃で10分間加熱した後、室温まで冷却した後、氷浴で冷却し、1.2N塩酸水溶液で中和した。析出した白色固体をトルエンで再結晶し、5.4g(24ミリモル)の6−ヒドロキシイミノ−6−フェニルヘキサノイックアシッドを得た。
攪拌器を取り付けた1リットルのセパラブルフラスコに、窒素気流下にて、γ−ブチロラクトン271.1g(和光純薬株式会社製)、1,3−ビス(3−アミノフェノキシ)ベンゼン43.85g(150ミリモル)(和歌山精化株式会社製)を入れた後、氷浴中にて、無水フタル酸0.67g(4.5ミリモル)(和光純薬株式会社製)を添加し30分攪拌し、続いてオキシジフタル酸二無水物45.84g(148ミリモル)(マナック株式会社製)を添加し30分攪拌した。次いで室温にて20時間攪拌し、ポリアミド酸(B1)溶液(ポリアミド酸含有率25%)を得た。本ポリアミド酸溶液はそのまま感光性樹脂組成物の作製に用いた。
配合例は下記表1に示す。
光塩基発生剤(A)としては[光塩基発生剤合成例]で得られた式(7)で表される(A1)及び、式(8)で表される非環状型の光塩基発生剤(A2)を用いた。
上記表1に示した配合で作製した樹脂組成物ワニスを25μm厚のPETフィルム(R−310−25/三菱化学ポリエステルフィルム株式会社製)にブレードコーターで塗工後、95℃/30分間オーブンで乾燥し積層フィルムを得た。感光性樹脂組成物で構成されたフィルム層の厚みは何れの配合も20μmであった。
作製した積層フィルムをAL−700(旭化成株式会社製)を用い、銅パターン高さ12μmのL/S=100μm/100μmのテストパターンのFPC基板に、基板余熱60℃、ラミネート温度110℃にて0.34MPa、0.3m/minの条件でラミネートを行い、FPC基板上に積層した後、PETフィルムを剥離し、FPC基板上にカバーレイを得た。
得られたカバーレイに、ネガ型のマスクを用い超高圧水銀灯(HMW−201KB/オーク株式会社製)でコンタクト露光を行った。露光量は750mJ/cm2であった。露光後140℃のホットプレートにて3分間加熱した。現像は、3%の炭酸ナトリウム水溶液で現像温度40℃、スプレー圧0.2MPaでスプレー現像を行った。40℃の蒸留水にてスプレー圧0.2MPaでスプレー水洗を行い、得られたパターンを光学顕微鏡で観察した。100μmの円孔パターンの形成が可能であったものを○、パターン形成が困難であったものを×として評価を行った。
Claims (10)
- 光塩基発生剤(A)とポリアミド酸(B)とを含有する感光性樹脂組成物であって、前記光塩基発生剤(A)は、式(1)で表されるアシルオキシイミノ基を含有する化合物、及び/又は式(2)で表されるカルバモイルオキシイミノ基を含有する化合物を含有することを特徴とする感光性樹脂組成物。
- 前記ポリアミド酸(B)がシリコーン鎖を含むことを特徴とする請求項1に記載の感光性樹脂組成物。
- さらに光増感剤(C)を含有することを特徴とする請求項1から請求項3のいずれかに記載の感光性樹脂組成物。
- 請求項1から請求項4のいずれかに記載の感光性樹脂組成物で構成されたことを特徴とするフィルム。
- キャリアフィルムと、前記キャリアフィルム上に設けられた請求項5に記載のフィルムと、を具備することを特徴とする積層フィルム。
- 前記フィルム上に形成されたカバーフィルムを具備することを特徴とする請求項6に記載の積層フィルム。
- 請求項5に記載のフィルム、又は請求項6若しくは請求項7に記載の積層フィルムを用いて構成されたカバーレイを具備することを特徴とする回路基板。
- 請求項1から請求項4のいずれかに記載の感光性樹脂組成物を用いて、少なくとも配線を有する基材上に樹脂組成物層を形成する工程と、前記樹脂組成物層にパターン露光を行う工程と、前記パターン露光後の樹脂組成物層に対してアルカリ水溶液を用いて現像処理を行う工程と、現像処理後の樹脂組成物層をキュアする工程と、を具備することを特徴とする回路基板の製造方法。
- 少なくとも、請求項5に記載のフィルム、又は請求項6若しくは請求項7に記載の積層フィルムのいずれかを配線を有する基材上にラミネートして樹脂組成物層を形成する工程と、前記樹脂組成物層にパターン露光を行う工程と、前記パターン露光後の樹脂組成物層に対してアルカリ水溶液を用いて現像処理を行う工程と、現像処理後の樹脂組成物層をキュアする工程と、を具備することを特徴とする回路基板の製造方法。
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