JP2007531060A5 - - Google Patents

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Publication number
JP2007531060A5
JP2007531060A5 JP2007506429A JP2007506429A JP2007531060A5 JP 2007531060 A5 JP2007531060 A5 JP 2007531060A5 JP 2007506429 A JP2007506429 A JP 2007506429A JP 2007506429 A JP2007506429 A JP 2007506429A JP 2007531060 A5 JP2007531060 A5 JP 2007531060A5
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JP
Japan
Prior art keywords
objective system
objective
light energy
lens
mirror array
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2007506429A
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English (en)
Japanese (ja)
Other versions
JP5172328B2 (ja
JP2007531060A (ja
Filing date
Publication date
Priority claimed from US10/812,111 external-priority patent/US7307783B2/en
Application filed filed Critical
Publication of JP2007531060A publication Critical patent/JP2007531060A/ja
Publication of JP2007531060A5 publication Critical patent/JP2007531060A5/ja
Application granted granted Critical
Publication of JP5172328B2 publication Critical patent/JP5172328B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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JP2007506429A 2004-03-29 2005-03-28 浸漬液を用いた広帯域顕微鏡観察用カタジオプトリック結像系 Expired - Fee Related JP5172328B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US10/812,111 US7307783B2 (en) 2003-02-21 2004-03-29 Catadioptric imaging system employing immersion liquid for use in broad band microscopy
US10/812,111 2004-03-29
PCT/US2005/010322 WO2005094304A2 (en) 2004-03-29 2005-03-28 Catadioptric imaging system employing immersion liquid for use in broad band microscopy

Publications (3)

Publication Number Publication Date
JP2007531060A JP2007531060A (ja) 2007-11-01
JP2007531060A5 true JP2007531060A5 (enExample) 2008-03-13
JP5172328B2 JP5172328B2 (ja) 2013-03-27

Family

ID=35064278

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2007506429A Expired - Fee Related JP5172328B2 (ja) 2004-03-29 2005-03-28 浸漬液を用いた広帯域顕微鏡観察用カタジオプトリック結像系

Country Status (4)

Country Link
US (2) US7307783B2 (enExample)
EP (1) EP1749230B1 (enExample)
JP (1) JP5172328B2 (enExample)
WO (1) WO2005094304A2 (enExample)

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WO2002007587A2 (en) 2000-07-14 2002-01-31 Xillix Technologies Corporation Compact fluorescent endoscopy video system
US20060241496A1 (en) 2002-01-15 2006-10-26 Xillix Technologies Corp. Filter for use with imaging endoscopes
US7957066B2 (en) * 2003-02-21 2011-06-07 Kla-Tencor Corporation Split field inspection system using small catadioptric objectives
US7884998B2 (en) * 2003-02-21 2011-02-08 Kla - Tencor Corporation Catadioptric microscope objective employing immersion liquid for use in broad band microscopy
EP1721201A1 (en) * 2004-02-18 2006-11-15 Corning Incorporated Catadioptric imaging system for high numerical aperture imaging with deep ultraviolet light
US20090303317A1 (en) * 2006-02-07 2009-12-10 Novadaq Technologies Inc. Near infrared imaging
GB0625775D0 (en) 2006-12-22 2007-02-07 Isis Innovation Focusing apparatus and method
EP1986046B1 (en) 2007-03-08 2014-07-16 Cellavision AB A method for determining an in-focus position and a vision inspection system
US8665536B2 (en) * 2007-06-19 2014-03-04 Kla-Tencor Corporation External beam delivery system for laser dark-field illumination in a catadioptric optical system
US7633689B2 (en) * 2007-07-18 2009-12-15 Asml Holding N.V. Catadioptric optical system for scatterometry
WO2009036192A1 (en) * 2007-09-13 2009-03-19 Applied Precision, Inc. Method of dispersing immersion liquid on a specimen substrate for high resolution imaging and lithographie
JP5909548B2 (ja) * 2011-06-10 2016-04-26 キヤノン株式会社 反射屈折光学系
DE102013112212B4 (de) 2013-11-06 2022-03-10 Carl Zeiss Smt Gmbh Optische Zoomeinrichtung, optische Abbildungseinrichtung, optisches Zoomverfahren und Abbildungsverfahren für die Mikroskopie
US10656098B2 (en) 2016-02-03 2020-05-19 Kla-Tencor Corporation Wafer defect inspection and review systems
WO2017136286A1 (en) 2016-02-03 2017-08-10 Kla-Tencor Corporation Wafer defect inspection and review systems
US10293122B2 (en) 2016-03-17 2019-05-21 Novadaq Technologies ULC Endoluminal introducer with contamination avoidance
CN107505692B (zh) * 2017-09-26 2020-04-10 张家港中贺自动化科技有限公司 一种折反射式物镜
CN108254912B (zh) * 2018-01-23 2020-03-27 电子科技大学 一种用于氮化物mocvd外延生长模式的实时显微监测系统
CN108873289B (zh) 2018-09-04 2024-02-09 中国科学院长春光学精密机械与物理研究所 显微物镜光学系统及光学设备
CN109298517B (zh) * 2018-11-05 2020-10-30 中国航空工业集团公司洛阳电光设备研究所 一种多光谱同轴折反式无焦光学系统
CA3160205A1 (en) 2019-11-22 2021-05-27 Howard Hughes Medical Institute Catadioptric microscopy
EP3893038A1 (en) * 2020-04-10 2021-10-13 Universität Zürich Multi-immersion microscope objective with minimally refractive surfaces
JP7772525B2 (ja) * 2020-10-28 2025-11-18 株式会社エビデント 光信号検出装置、ゲル部材、光信号検出方法
US11561476B1 (en) * 2021-07-10 2023-01-24 Kenneth Carlisle Johnson UV lithography system
CN119270451A (zh) * 2024-10-16 2025-01-07 苏州佳智彩光电科技有限公司 基于折返式光学装置的调焦方法、系统、计算机设备和存储介质

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US8675276B2 (en) * 2003-02-21 2014-03-18 Kla-Tencor Corporation Catadioptric imaging system for broad band microscopy

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