JP2013257599A5 - - Google Patents

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Publication number
JP2013257599A5
JP2013257599A5 JP2013207679A JP2013207679A JP2013257599A5 JP 2013257599 A5 JP2013257599 A5 JP 2013257599A5 JP 2013207679 A JP2013207679 A JP 2013207679A JP 2013207679 A JP2013207679 A JP 2013207679A JP 2013257599 A5 JP2013257599 A5 JP 2013257599A5
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JP
Japan
Prior art keywords
objective system
lens element
mangin mirror
assembly
light energy
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2013207679A
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English (en)
Japanese (ja)
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JP2013257599A (ja
JP5905430B2 (ja
Filing date
Publication date
Priority claimed from US10/646,073 external-priority patent/US8675276B2/en
Application filed filed Critical
Publication of JP2013257599A publication Critical patent/JP2013257599A/ja
Publication of JP2013257599A5 publication Critical patent/JP2013257599A5/ja
Application granted granted Critical
Publication of JP5905430B2 publication Critical patent/JP5905430B2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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JP2013207679A 2003-08-22 2013-10-02 広帯域顕微鏡用カタジオプトリック結像系 Expired - Lifetime JP5905430B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US10/646,073 2003-08-22
US10/646,073 US8675276B2 (en) 2003-02-21 2003-08-22 Catadioptric imaging system for broad band microscopy

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP2012145016A Division JP2012212166A (ja) 2003-08-22 2012-06-28 広帯域顕微鏡用カタジオプトリック結像系

Publications (3)

Publication Number Publication Date
JP2013257599A JP2013257599A (ja) 2013-12-26
JP2013257599A5 true JP2013257599A5 (enExample) 2014-07-17
JP5905430B2 JP5905430B2 (ja) 2016-04-20

Family

ID=38156745

Family Applications (3)

Application Number Title Priority Date Filing Date
JP2006524719A Pending JP2007514179A (ja) 2003-08-22 2004-08-18 広帯域顕微鏡用カタジオプトリック結像系
JP2012145016A Pending JP2012212166A (ja) 2003-08-22 2012-06-28 広帯域顕微鏡用カタジオプトリック結像系
JP2013207679A Expired - Lifetime JP5905430B2 (ja) 2003-08-22 2013-10-02 広帯域顕微鏡用カタジオプトリック結像系

Family Applications Before (2)

Application Number Title Priority Date Filing Date
JP2006524719A Pending JP2007514179A (ja) 2003-08-22 2004-08-18 広帯域顕微鏡用カタジオプトリック結像系
JP2012145016A Pending JP2012212166A (ja) 2003-08-22 2012-06-28 広帯域顕微鏡用カタジオプトリック結像系

Country Status (4)

Country Link
US (1) US8675276B2 (enExample)
EP (1) EP1664885B1 (enExample)
JP (3) JP2007514179A (enExample)
WO (1) WO2005022204A2 (enExample)

Families Citing this family (36)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW538256B (en) * 2000-01-14 2003-06-21 Zeiss Stiftung Microlithographic reduction projection catadioptric objective
US7307783B2 (en) * 2003-02-21 2007-12-11 Kla-Tencor Technologies Corporation Catadioptric imaging system employing immersion liquid for use in broad band microscopy
US7672043B2 (en) * 2003-02-21 2010-03-02 Kla-Tencor Technologies Corporation Catadioptric imaging system exhibiting enhanced deep ultraviolet spectral bandwidth
US7884998B2 (en) * 2003-02-21 2011-02-08 Kla - Tencor Corporation Catadioptric microscope objective employing immersion liquid for use in broad band microscopy
SG10201405231YA (en) 2003-05-06 2014-09-26 Nippon Kogaku Kk Projection optical system, exposure apparatus, and exposure method
US7348575B2 (en) * 2003-05-06 2008-03-25 Nikon Corporation Projection optical system, exposure apparatus, and exposure method
US8208198B2 (en) 2004-01-14 2012-06-26 Carl Zeiss Smt Gmbh Catadioptric projection objective
US6961186B2 (en) * 2003-09-26 2005-11-01 Takumi Technology Corp. Contact printing using a magnified mask image
US7466489B2 (en) 2003-12-15 2008-12-16 Susanne Beder Projection objective having a high aperture and a planar end surface
WO2005059645A2 (en) 2003-12-19 2005-06-30 Carl Zeiss Smt Ag Microlithography projection objective with crystal elements
KR101150037B1 (ko) 2004-01-14 2012-07-02 칼 짜이스 에스엠티 게엠베하 반사굴절식 투영 대물렌즈
US7463422B2 (en) 2004-01-14 2008-12-09 Carl Zeiss Smt Ag Projection exposure apparatus
US20080151364A1 (en) 2004-01-14 2008-06-26 Carl Zeiss Smt Ag Catadioptric projection objective
US7215431B2 (en) * 2004-03-04 2007-05-08 Therma-Wave, Inc. Systems and methods for immersion metrology
US7712905B2 (en) 2004-04-08 2010-05-11 Carl Zeiss Smt Ag Imaging system with mirror group
KR20170129271A (ko) 2004-05-17 2017-11-24 칼 짜이스 에스엠티 게엠베하 중간이미지를 갖는 카타디옵트릭 투사 대물렌즈
DE102005002710A1 (de) * 2005-01-19 2006-07-27 Linos Photonics Gmbh & Co. Kg Optisches System
WO2006107527A2 (en) * 2005-03-31 2006-10-12 Kla-Tencor Technologies Corporation Small ultra-high na catadioptric objective using aspheric surfaces
US20070141362A1 (en) * 2005-12-19 2007-06-21 Elkins Casey L Composition for coating substrate to prevent sticking
US7633689B2 (en) 2007-07-18 2009-12-15 Asml Holding N.V. Catadioptric optical system for scatterometry
JP5634989B2 (ja) * 2008-06-17 2014-12-03 ケーエルエー−テンカー・コーポレーションＫｌａ−Ｔｅｎｃｏｒ Ｃｏｒｐｏｒａｔｉｏｎ 対物光学系および試料検査装置
US20110143287A1 (en) * 2009-09-14 2011-06-16 Nikon Corporation Catadioptric system, aberration measuring apparatus, method of adjusting optical system, exposure apparatus, and device manufacturing method
JP5479206B2 (ja) * 2010-04-28 2014-04-23 キヤノン株式会社 反射屈折光学系及びそれを有する撮像装置
JP5627476B2 (ja) 2011-01-19 2014-11-19 キヤノン株式会社 反射屈折光学系及びそれを有する撮像装置
JP5656682B2 (ja) * 2011-02-22 2015-01-21 キヤノン株式会社 反射屈折光学系及びそれを有する撮像装置
US9341831B2 (en) 2011-06-10 2016-05-17 Canon Kabushiki Kaisha Optical system with catadioptric optical subsystem
JP5836686B2 (ja) * 2011-07-28 2015-12-24 キヤノン株式会社 反射屈折光学系及びそれを有する撮像装置
JP5868063B2 (ja) * 2011-08-05 2016-02-24 キヤノン株式会社 撮像装置
US8908294B2 (en) * 2012-05-18 2014-12-09 Canon Kabushiki Kaisha Catadioptric optical system with high numerical aperture
US9329373B2 (en) * 2013-02-13 2016-05-03 Canon Kabushiki Kaisha Catadioptric optical system with multi-reflection element for high numerical aperture imaging
DE102013105586B4 (de) 2013-05-30 2023-10-12 Carl Zeiss Ag Vorrichtung zur Abbildung einer Probe
DE102014113827A1 (de) 2014-09-24 2016-03-24 Carl Zeiss Microscopy Gmbh Vorrichtung zur Abbildung einer Probe
CN107505692B (zh) * 2017-09-26 2020-04-10 张家港中贺自动化科技有限公司 一种折反射式物镜
CN108873289B (zh) * 2018-09-04 2024-02-09 中国科学院长春光学精密机械与物理研究所 显微物镜光学系统及光学设备
DE102019115931A1 (de) * 2019-06-12 2020-12-17 Carl Zeiss Microscopy Gmbh Optische Anordnung für ein Mikroskop
JP7770532B2 (ja) * 2023-04-04 2025-11-14 エーエーシー オプティックス ソリューションズ ピーティーイー リミテッド 結像システム

Family Cites Families (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5510172B2 (enExample) * 1975-02-14 1980-03-14
DE2655041C2 (de) * 1976-12-04 1982-04-15 Fa. Carl Zeiss, 7920 Heidenheim Immersionsobjektiv zum Gebrauch mit mehreren optisch verschiedenen Immersionsmitteln
JPS56147038A (en) 1980-04-18 1981-11-14 Hitachi Ltd Pretreatment for supravital stained specimen and automatic classifying apparatus using said pretreating method
GB9008261D0 (en) * 1990-04-11 1990-06-13 Ares Serono Res & Dev Ltd Method of improving assay sensitivity
US5031976A (en) * 1990-09-24 1991-07-16 Kla Instruments, Corporation Catadioptric imaging system
US6512631B2 (en) * 1996-07-22 2003-01-28 Kla-Tencor Corporation Broad-band deep ultraviolet/vacuum ultraviolet catadioptric imaging system
US5999310A (en) 1996-07-22 1999-12-07 Shafer; David Ross Ultra-broadband UV microscope imaging system with wide range zoom capability
US6064517A (en) * 1996-07-22 2000-05-16 Kla-Tencor Corporation High NA system for multiple mode imaging
US5717518A (en) 1996-07-22 1998-02-10 Kla Instruments Corporation Broad spectrum ultraviolet catadioptric imaging system
US5825043A (en) * 1996-10-07 1998-10-20 Nikon Precision Inc. Focusing and tilting adjustment system for lithography aligner, manufacturing apparatus or inspection apparatus
JP4345232B2 (ja) 1998-12-25 2009-10-14 株式会社ニコン 反射屈折結像光学系および該光学系を備えた投影露光装置
DE10004396B4 (de) * 2000-02-02 2004-05-06 Corning Incorporated Immersionsmittel, Kopplungsanordnung und Kopplungsverfahren für Lichtwellenleiter
US6362923B1 (en) 2000-03-10 2002-03-26 Kla-Tencor Lens for microscopic inspection
JP2002083766A (ja) * 2000-06-19 2002-03-22 Nikon Corp 投影光学系、該光学系の製造方法、及び前記光学系を備えた投影露光装置
US6842298B1 (en) * 2000-09-12 2005-01-11 Kla-Tencor Technologies Corporation Broad band DUV, VUV long-working distance catadioptric imaging system
JP3985937B2 (ja) * 2001-07-10 2007-10-03 オリンパス株式会社 蛍光用顕微鏡対物レンズ
US6785051B2 (en) * 2001-07-18 2004-08-31 Corning Incorporated Intrinsic birefringence compensation for below 200 nanometer wavelength optical lithography components with cubic crystalline structures
JP4066079B2 (ja) 2001-11-26 2008-03-26 株式会社ニコン 対物レンズ及びそれを用いた光学装置
JP5370837B2 (ja) 2008-07-14 2013-12-18 戸仁子 柴野 斜形仕切り部付きバッグ

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