JP5172328B2 - 浸漬液を用いた広帯域顕微鏡観察用カタジオプトリック結像系 - Google Patents

浸漬液を用いた広帯域顕微鏡観察用カタジオプトリック結像系 Download PDF

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Publication number
JP5172328B2
JP5172328B2 JP2007506429A JP2007506429A JP5172328B2 JP 5172328 B2 JP5172328 B2 JP 5172328B2 JP 2007506429 A JP2007506429 A JP 2007506429A JP 2007506429 A JP2007506429 A JP 2007506429A JP 5172328 B2 JP5172328 B2 JP 5172328B2
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Japan
Prior art keywords
objective system
objective
lens
lens group
light
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Expired - Fee Related
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JP2007506429A
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Japanese (ja)
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JP2007531060A (ja
JP2007531060A5 (enExample
Inventor
ジェイ ジョーゼフ アームストロング
ユン ホー チャン
デイビッド アール シェイファー
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KLA Corp
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KLA Corp
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/02—Catoptric systems, e.g. image erecting and reversing system
    • G02B17/023—Catoptric systems, e.g. image erecting and reversing system for extending or folding an optical path, e.g. delay lines
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08—Catadioptric systems
    • G02B17/0804—Catadioptric systems using two curved mirrors
    • G02B17/0808—Catadioptric systems using two curved mirrors on-axis systems with at least one of the mirrors having a central aperture
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08—Catadioptric systems
    • G02B17/0804—Catadioptric systems using two curved mirrors
    • G02B17/0812—Catadioptric systems using two curved mirrors off-axis or unobscured systems in which all of the mirrors share a common axis of rotational symmetry
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08—Catadioptric systems
    • G02B17/0856—Catadioptric systems comprising a refractive element with a reflective surface, the reflection taking place inside the element, e.g. Mangin mirrors
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08—Catadioptric systems
    • G02B17/0892—Catadioptric systems specially adapted for the UV
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B21/00—Microscopes
    • G02B21/02—Objectives
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B21/00—Microscopes
    • G02B21/02—Objectives
    • G02B21/04—Objectives involving mirrors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70225—Optical aspects of catadioptric systems, i.e. comprising reflective and refractive elements
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B21/00—Microscopes
    • G02B21/33—Immersion oils, or microscope systems or objectives for use with immersion fluids

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Lenses (AREA)
  • Microscoopes, Condenser (AREA)
JP2007506429A 2004-03-29 2005-03-28 浸漬液を用いた広帯域顕微鏡観察用カタジオプトリック結像系 Expired - Fee Related JP5172328B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US10/812,111 2004-03-29
US10/812,111 US7307783B2 (en) 2003-02-21 2004-03-29 Catadioptric imaging system employing immersion liquid for use in broad band microscopy
PCT/US2005/010322 WO2005094304A2 (en) 2004-03-29 2005-03-28 Catadioptric imaging system employing immersion liquid for use in broad band microscopy

Publications (3)

Publication Number Publication Date
JP2007531060A JP2007531060A (ja) 2007-11-01
JP2007531060A5 JP2007531060A5 (enExample) 2008-03-13
JP5172328B2 true JP5172328B2 (ja) 2013-03-27

Family

ID=35064278

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2007506429A Expired - Fee Related JP5172328B2 (ja) 2004-03-29 2005-03-28 浸漬液を用いた広帯域顕微鏡観察用カタジオプトリック結像系

Country Status (4)

Country Link
US (2) US7307783B2 (enExample)
EP (1) EP1749230B1 (enExample)
JP (1) JP5172328B2 (enExample)
WO (1) WO2005094304A2 (enExample)

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US7957066B2 (en) * 2003-02-21 2011-06-07 Kla-Tencor Corporation Split field inspection system using small catadioptric objectives
US7884998B2 (en) * 2003-02-21 2011-02-08 Kla - Tencor Corporation Catadioptric microscope objective employing immersion liquid for use in broad band microscopy
CN1922528A (zh) * 2004-02-18 2007-02-28 康宁股份有限公司 用于具有深紫外光的高数值孔径成象的反折射成象系统
WO2007106624A2 (en) 2006-02-07 2007-09-20 Novadaq Technologies Inc. Near infrared imaging
GB0625775D0 (en) 2006-12-22 2007-02-07 Isis Innovation Focusing apparatus and method
EP2775349B1 (en) * 2007-03-08 2021-08-11 Cellavision AB A method for determining an in-focus position and a vision inspection system
US8665536B2 (en) * 2007-06-19 2014-03-04 Kla-Tencor Corporation External beam delivery system for laser dark-field illumination in a catadioptric optical system
US7633689B2 (en) 2007-07-18 2009-12-15 Asml Holding N.V. Catadioptric optical system for scatterometry
JP2010539543A (ja) 2007-09-13 2010-12-16 アプライド プレシジョン インコーポレイテッド 高分解能の画像形成およびリソグラフィのための試料基板上で浸液を供給する方法
US9341831B2 (en) 2011-06-10 2016-05-17 Canon Kabushiki Kaisha Optical system with catadioptric optical subsystem
DE102013112212B4 (de) * 2013-11-06 2022-03-10 Carl Zeiss Smt Gmbh Optische Zoomeinrichtung, optische Abbildungseinrichtung, optisches Zoomverfahren und Abbildungsverfahren für die Mikroskopie
EP3411694A4 (en) * 2016-02-03 2019-09-04 Kla-Tencor Corporation WAFER DEFECT INSPECTION AND TESTING SYSTEMS
US10656098B2 (en) 2016-02-03 2020-05-19 Kla-Tencor Corporation Wafer defect inspection and review systems
US10293122B2 (en) 2016-03-17 2019-05-21 Novadaq Technologies ULC Endoluminal introducer with contamination avoidance
CN107505692B (zh) * 2017-09-26 2020-04-10 张家港中贺自动化科技有限公司 一种折反射式物镜
CN108254912B (zh) * 2018-01-23 2020-03-27 电子科技大学 一种用于氮化物mocvd外延生长模式的实时显微监测系统
CN108873289B (zh) * 2018-09-04 2024-02-09 中国科学院长春光学精密机械与物理研究所 显微物镜光学系统及光学设备
CN109298517B (zh) * 2018-11-05 2020-10-30 中国航空工业集团公司洛阳电光设备研究所 一种多光谱同轴折反式无焦光学系统
AU2020385961A1 (en) 2019-11-22 2022-05-19 Howard Hughes Medical Institute Catadioptric microscopy
EP3893038A1 (en) * 2020-04-10 2021-10-13 Universität Zürich Multi-immersion microscope objective with minimally refractive surfaces
JP7772525B2 (ja) * 2020-10-28 2025-11-18 株式会社エビデント 光信号検出装置、ゲル部材、光信号検出方法
US11561476B1 (en) * 2021-07-10 2023-01-24 Kenneth Carlisle Johnson UV lithography system
CN119270451A (zh) * 2024-10-16 2025-01-07 苏州佳智彩光电科技有限公司 基于折返式光学装置的调焦方法、系统、计算机设备和存储介质

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Also Published As

Publication number Publication date
US7633675B2 (en) 2009-12-15
WO2005094304A9 (en) 2007-01-11
US20050152027A1 (en) 2005-07-14
JP2007531060A (ja) 2007-11-01
US20080247035A1 (en) 2008-10-09
EP1749230A4 (en) 2008-04-02
EP1749230B1 (en) 2015-06-03
EP1749230A2 (en) 2007-02-07
WO2005094304A3 (en) 2006-12-21
US7307783B2 (en) 2007-12-11
WO2005094304A2 (en) 2005-10-13

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