JP2007518267A5 - - Google Patents

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Publication number
JP2007518267A5
JP2007518267A5 JP2006549286A JP2006549286A JP2007518267A5 JP 2007518267 A5 JP2007518267 A5 JP 2007518267A5 JP 2006549286 A JP2006549286 A JP 2006549286A JP 2006549286 A JP2006549286 A JP 2006549286A JP 2007518267 A5 JP2007518267 A5 JP 2007518267A5
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JP
Japan
Prior art keywords
metal block
evaporation
aerosol
inlet
evaporation chamber
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2006549286A
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English (en)
Japanese (ja)
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JP2007518267A (ja
Filing date
Publication date
Priority claimed from US10/769,011 external-priority patent/US20050147749A1/en
Application filed filed Critical
Publication of JP2007518267A publication Critical patent/JP2007518267A/ja
Publication of JP2007518267A5 publication Critical patent/JP2007518267A5/ja
Pending legal-status Critical Current

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JP2006549286A 2004-01-05 2004-12-15 液状前駆物質のための高性能蒸発器、及び、半導体の薄膜蒸着における複数の液状前駆物質の蒸発 Pending JP2007518267A (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US53428604P 2004-01-05 2004-01-05
US10/769,011 US20050147749A1 (en) 2004-01-05 2004-01-30 High-performance vaporizer for liquid-precursor and multi-liquid-precursor vaporization in semiconductor thin film deposition
PCT/US2004/041944 WO2005068682A2 (en) 2004-01-05 2004-12-15 High-performance vaporizer for liquid-precursor and multi-liquid-precursor vaporization in semiconductor thin film deposition

Publications (2)

Publication Number Publication Date
JP2007518267A JP2007518267A (ja) 2007-07-05
JP2007518267A5 true JP2007518267A5 (enExample) 2008-02-14

Family

ID=34713809

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2006549286A Pending JP2007518267A (ja) 2004-01-05 2004-12-15 液状前駆物質のための高性能蒸発器、及び、半導体の薄膜蒸着における複数の液状前駆物質の蒸発

Country Status (4)

Country Link
US (1) US20050147749A1 (enExample)
EP (1) EP1704267A2 (enExample)
JP (1) JP2007518267A (enExample)
WO (1) WO2005068682A2 (enExample)

Families Citing this family (50)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7045015B2 (en) 1998-09-30 2006-05-16 Optomec Design Company Apparatuses and method for maskless mesoscale material deposition
US7938079B2 (en) * 1998-09-30 2011-05-10 Optomec Design Company Annular aerosol jet deposition using an extended nozzle
US7108894B2 (en) * 1998-09-30 2006-09-19 Optomec Design Company Direct Write™ System
US8110247B2 (en) 1998-09-30 2012-02-07 Optomec Design Company Laser processing for heat-sensitive mesoscale deposition of oxygen-sensitive materials
US7708835B2 (en) * 2004-11-29 2010-05-04 Tokyo Electron Limited Film precursor tray for use in a film precursor evaporation system and method of using
US7638002B2 (en) * 2004-11-29 2009-12-29 Tokyo Electron Limited Multi-tray film precursor evaporation system and thin film deposition system incorporating same
US7674671B2 (en) 2004-12-13 2010-03-09 Optomec Design Company Aerodynamic jetting of aerosolized fluids for fabrication of passive structures
US7938341B2 (en) * 2004-12-13 2011-05-10 Optomec Design Company Miniature aerosol jet and aerosol jet array
US7651570B2 (en) * 2005-03-31 2010-01-26 Tokyo Electron Limited Solid precursor vaporization system for use in chemical vapor deposition
US7402213B2 (en) * 2006-02-03 2008-07-22 Applied Materials, Inc. Stripping and removal of organic-containing materials from electronic device substrate surfaces
JP4762835B2 (ja) * 2006-09-07 2011-08-31 東京エレクトロン株式会社 基板処理方法、基板処理装置、プログラムおよびプログラム記録媒体
US7846256B2 (en) * 2007-02-23 2010-12-07 Tokyo Electron Limited Ampule tray for and method of precursor surface area
TWI482662B (zh) 2007-08-30 2015-05-01 Optomec Inc 機械上一體式及緊密式耦合之列印頭以及噴霧源
TWI538737B (zh) 2007-08-31 2016-06-21 阿普托麥克股份有限公司 材料沉積總成
US8297223B2 (en) * 2007-10-02 2012-10-30 Msp Corporation Method and apparatus for particle filtration and enhancing tool performance in film deposition
US8887658B2 (en) 2007-10-09 2014-11-18 Optomec, Inc. Multiple sheath multiple capillary aerosol jet
FI20080674A0 (fi) * 2008-12-22 2008-12-22 Beneq Oy Menetelmä lasin pinnoittamiseksi
DE102009026808A1 (de) * 2009-06-08 2010-12-09 aDROP Feuchtemeßtechnik GmbH Vorrichtung zum Verdampfen von Flüssigkeiten
US8465791B2 (en) * 2009-10-16 2013-06-18 Msp Corporation Method for counting particles in a gas
KR100962475B1 (ko) * 2009-11-20 2010-06-10 주식회사 태한이엔씨 기화기
KR101387634B1 (ko) * 2010-02-05 2014-04-22 엠 에스피 코포레이션 액상 전구체 증발을 위한 미세 액적 분무기
US20110232588A1 (en) * 2010-03-26 2011-09-29 Msp Corporation Integrated system for vapor generation and thin film deposition
DE102011051931A1 (de) * 2011-07-19 2013-01-24 Aixtron Se Vorrichtung und Verfahren zum Bestimmen des Dampfdrucks eines in einem Trägergasstrom verdampften Ausgangsstoffes
WO2013058980A2 (en) * 2011-10-17 2013-04-25 Brooks Instrument, Llc Integrated multi-headed atomizer and vaporization system and method
JP6156972B2 (ja) * 2012-04-06 2017-07-05 株式会社日立国際電気 半導体装置の製造方法、基板処理装置、気化システムおよびミストフィルタ
JP5889710B2 (ja) * 2012-05-16 2016-03-22 東京エレクトロン株式会社 成膜装置および成膜方法
WO2016130709A1 (en) 2015-02-10 2016-08-18 Optomec, Inc. Fabrication of three-dimensional structures by in-flight curing of aerosols
US9797593B2 (en) * 2015-05-11 2017-10-24 Msp Corporation Apparatus and method for vapor generation and film deposition
US10287679B2 (en) * 2015-05-11 2019-05-14 Msp Corporation Apparatus and method for vapor generation and film deposition
WO2016187115A1 (en) * 2015-05-15 2016-11-24 John Cameron Hybrid vapor delivery system utilizing nebulized and non-nebulized elements
JP6675865B2 (ja) * 2015-12-11 2020-04-08 株式会社堀場エステック 液体材料気化装置
KR102483924B1 (ko) * 2016-02-18 2023-01-02 삼성전자주식회사 기화기 및 이를 구비하는 박막 증착 장치
US10981193B2 (en) 2017-04-05 2021-04-20 Nova Engineering Films, Inc. Depositing of material by spraying precursor using supercritical fluid
US11117161B2 (en) 2017-04-05 2021-09-14 Nova Engineering Films, Inc. Producing thin films of nanoscale thickness by spraying precursor and supercritical fluid
US10147597B1 (en) 2017-09-14 2018-12-04 Lam Research Corporation Turbulent flow spiral multi-zone precursor vaporizer
CN111447982B (zh) * 2017-10-23 2022-09-13 Msp公司 用于蒸汽发生和薄膜沉积的设备和方法
EP3723909B1 (en) 2017-11-13 2023-10-25 Optomec, Inc. Shuttering of aerosol streams
CN109338338B (zh) * 2018-12-25 2023-07-14 西安电子科技大学 一种雾化辅助cvd薄膜沉积装置
CN113366602A (zh) * 2019-01-31 2021-09-07 朗姆研究公司 用于先进半导体应用的多通道液体输送系统
JP2021031769A (ja) * 2019-08-21 2021-03-01 エーエスエム アイピー ホールディング ビー．ブイ． 成膜原料混合ガス生成装置及び成膜装置
JP2023505780A (ja) * 2019-12-11 2023-02-13 ラム リサーチ コーポレーション 液体前駆体気化器
US11661653B2 (en) * 2019-12-18 2023-05-30 L'air Liquide, Societe Anonyme Pour L'etude Et L'exploitation Des Procedes Georges Claude Vapor delivery systems for solid and liquid materials
KR102300561B1 (ko) * 2020-07-31 2021-09-13 삼성전자주식회사 증착 시스템 및 공정 시스템
JP7589890B2 (ja) * 2020-10-07 2024-11-26 株式会社フジキン 気化装置、ガス供給装置及びガス供給装置の制御方法
US20220267898A1 (en) * 2021-02-12 2022-08-25 Eugenus, Inc. Precursor delivery system and method for high speed cyclic deposition
TWM633563U (zh) * 2021-03-02 2022-11-01 日商信越化學工業股份有限公司 製膜系統及製膜裝置
TW202247905A (zh) 2021-04-29 2022-12-16 美商阿普托麥克股份有限公司 用於氣溶膠噴射裝置之高可靠性鞘護輸送路徑
CN114892270A (zh) * 2022-04-07 2022-08-12 西安电子科技大学 一种具有冷壁分时分步输运功能的多雾化源Mist-CVD设备
CN114743900A (zh) * 2022-04-25 2022-07-12 北京北方华创微电子装备有限公司 汽化系统以及半导体工艺设备
FR3145099A1 (fr) * 2023-01-19 2024-07-26 Semco Technologies Chambre d'évaporation d'un dispositif évaporateur de composés chimiques

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3808035A (en) * 1970-12-09 1974-04-30 M Stelter Deposition of single or multiple layers on substrates from dilute gas sweep to produce optical components, electro-optical components, and the like
US5160664A (en) * 1991-05-31 1992-11-03 Msp Corporation High output monodisperse aerosol generator
JPH06291040A (ja) * 1992-03-03 1994-10-18 Rintetsuku:Kk 液体気化供給方法と液体気化供給器
US5531183A (en) * 1994-07-13 1996-07-02 Applied Materials, Inc. Vaporization sequence for multiple liquid precursors used in semiconductor thin film applications
US5997642A (en) * 1996-05-21 1999-12-07 Symetrix Corporation Method and apparatus for misted deposition of integrated circuit quality thin films
US5876503A (en) * 1996-11-27 1999-03-02 Advanced Technology Materials, Inc. Multiple vaporizer reagent supply system for chemical vapor deposition utilizing dissimilar precursor compositions
US6409839B1 (en) * 1997-06-02 2002-06-25 Msp Corporation Method and apparatus for vapor generation and film deposition
US6258170B1 (en) * 1997-09-11 2001-07-10 Applied Materials, Inc. Vaporization and deposition apparatus
US5944860A (en) * 1997-12-18 1999-08-31 Honeywell Inc. Air plenum filter adapter component
US6210485B1 (en) * 1998-07-21 2001-04-03 Applied Materials, Inc. Chemical vapor deposition vaporizer
US6216708B1 (en) * 1998-07-23 2001-04-17 Micron Technology, Inc. On-line cleaning method for CVD vaporizers
JP3470055B2 (ja) * 1999-01-22 2003-11-25 株式会社渡邊商行 Ｍｏｃｖｄ用気化器及び原料溶液の気化方法
JP2000345345A (ja) * 1999-06-04 2000-12-12 Mitsubishi Electric Corp Ｃｖｄ装置およびｃｖｄ装置用気化装置
US6548112B1 (en) * 1999-11-18 2003-04-15 Tokyo Electron Limited Apparatus and method for delivery of precursor vapor from low vapor pressure liquid sources to a CVD chamber
US6635114B2 (en) * 1999-12-17 2003-10-21 Applied Material, Inc. High temperature filter for CVD apparatus
US7163197B2 (en) * 2000-09-26 2007-01-16 Shimadzu Corporation Liquid substance supply device for vaporizing system, vaporizer, and vaporization performance appraisal method
EP1363745B1 (en) * 2001-02-28 2006-10-25 Porter Instrument Company, Inc. Atomizer
JP2003273030A (ja) * 2002-03-18 2003-09-26 Watanabe Shoko:Kk Ｃｖｄ薄膜堆積の方法

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