JP2007316634A5 - - Google Patents
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- Publication number
- JP2007316634A5 JP2007316634A5 JP2007121775A JP2007121775A JP2007316634A5 JP 2007316634 A5 JP2007316634 A5 JP 2007316634A5 JP 2007121775 A JP2007121775 A JP 2007121775A JP 2007121775 A JP2007121775 A JP 2007121775A JP 2007316634 A5 JP2007316634 A5 JP 2007316634A5
- Authority
- JP
- Japan
- Prior art keywords
- polarization
- component
- optical
- optical element
- modulating
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 230000003287 optical effect Effects 0.000 claims 32
- 238000000034 method Methods 0.000 claims 18
- 230000010287 polarization Effects 0.000 claims 11
- 238000004519 manufacturing process Methods 0.000 claims 7
- 238000009826 distribution Methods 0.000 claims 5
- 238000005259 measurement Methods 0.000 claims 4
- 238000005286 illumination Methods 0.000 claims 3
- 239000011248 coating agent Substances 0.000 claims 2
- 238000000576 coating method Methods 0.000 claims 2
- 210000001747 pupil Anatomy 0.000 claims 2
- 239000000758 substrate Substances 0.000 claims 2
- 238000005516 engineering process Methods 0.000 claims 1
- 238000005304 joining Methods 0.000 claims 1
- 239000000463 material Substances 0.000 claims 1
- 238000001393 microlithography Methods 0.000 claims 1
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE102006021334A DE102006021334B3 (de) | 2006-05-05 | 2006-05-05 | Polarisationsbeeinflussendes optisches Element sowie Verfahren zu dessen Herstellung sowie optisches System und mikrolithographische Projektionsbelichtungsanlage mit einem solchen Element |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2007316634A JP2007316634A (ja) | 2007-12-06 |
| JP2007316634A5 true JP2007316634A5 (enExample) | 2010-06-17 |
| JP4617492B2 JP4617492B2 (ja) | 2011-01-26 |
Family
ID=38320133
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2007121775A Expired - Fee Related JP4617492B2 (ja) | 2006-05-05 | 2007-05-02 | 偏光変調光学素子および偏光変調光学素子の製造方法 |
Country Status (3)
| Country | Link |
|---|---|
| US (2) | US7903333B2 (enExample) |
| JP (1) | JP4617492B2 (enExample) |
| DE (1) | DE102006021334B3 (enExample) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102006021334B3 (de) * | 2006-05-05 | 2007-08-30 | Carl Zeiss Smt Ag | Polarisationsbeeinflussendes optisches Element sowie Verfahren zu dessen Herstellung sowie optisches System und mikrolithographische Projektionsbelichtungsanlage mit einem solchen Element |
| DE102007055567A1 (de) * | 2007-11-20 | 2009-05-28 | Carl Zeiss Smt Ag | Optisches System |
| DE102007058862A1 (de) * | 2007-12-06 | 2009-06-10 | Carl Zeiss Smt Ag | Optisches System, insbesondere für eine mikrolithographische Projektionsbelichtungsanlage |
| DE102012213553A1 (de) * | 2012-08-01 | 2013-08-22 | Carl Zeiss Smt Gmbh | Optisches System, insbesondere einer mikrolithographischen Projektionsbelichtungsanlage |
| DE102022118146B3 (de) * | 2022-07-20 | 2023-12-07 | Carl Zeiss Jena Gmbh | Verfahren zum Herstellen eines optischen Elements für eine Lithographieanlage |
| CN116466425B (zh) * | 2023-03-20 | 2025-08-15 | 中国工程物理研究院激光聚变研究中心 | 一种大口径二维连续偏振调制元件及制备方法 |
Family Cites Families (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE19535392A1 (de) * | 1995-09-23 | 1997-03-27 | Zeiss Carl Fa | Radial polarisationsdrehende optische Anordnung und Mikrolithographie-Projektionsbelichtungsanlage damit |
| DE19807120A1 (de) * | 1998-02-20 | 1999-08-26 | Zeiss Carl Fa | Optisches System mit Polarisationskompensator |
| EP1022617A3 (en) | 1999-01-20 | 2003-01-02 | ASML Netherlands B.V. | Optical correction plate, and its application in a lithographic projection apparatus |
| US6437916B1 (en) * | 2000-10-10 | 2002-08-20 | Jds Uniphase Corporation | Strain-stabilized birefringent crystal |
| DE10123725A1 (de) * | 2001-05-15 | 2002-11-21 | Zeiss Carl | Projektionsbelichtungsanlage der Mikrolithographie, Optisches System und Herstellverfahren |
| DE10133841A1 (de) * | 2001-07-18 | 2003-02-06 | Zeiss Carl | Objektiv mit Kristall-Linsen |
| DE10328938A1 (de) | 2003-06-27 | 2005-01-20 | Carl Zeiss Smt Ag | Korrektureinrichtung zur Kompensation von Störungen der Polarisationsverteilung sowie Projektionsobjektiv für die Mikrolithografie |
| CN1910522B (zh) | 2004-01-16 | 2010-05-26 | 卡尔蔡司Smt股份公司 | 偏振调制光学元件 |
| DE102006021334B3 (de) * | 2006-05-05 | 2007-08-30 | Carl Zeiss Smt Ag | Polarisationsbeeinflussendes optisches Element sowie Verfahren zu dessen Herstellung sowie optisches System und mikrolithographische Projektionsbelichtungsanlage mit einem solchen Element |
-
2006
- 2006-05-05 DE DE102006021334A patent/DE102006021334B3/de not_active Expired - Fee Related
-
2007
- 2007-04-24 US US11/739,232 patent/US7903333B2/en not_active Expired - Fee Related
- 2007-05-02 JP JP2007121775A patent/JP4617492B2/ja not_active Expired - Fee Related
-
2011
- 2011-01-18 US US13/008,282 patent/US8213079B2/en not_active Expired - Fee Related
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