JP2007308775A5 - - Google Patents

Download PDF

Info

Publication number
JP2007308775A5
JP2007308775A5 JP2006140138A JP2006140138A JP2007308775A5 JP 2007308775 A5 JP2007308775 A5 JP 2007308775A5 JP 2006140138 A JP2006140138 A JP 2006140138A JP 2006140138 A JP2006140138 A JP 2006140138A JP 2007308775 A5 JP2007308775 A5 JP 2007308775A5
Authority
JP
Japan
Prior art keywords
deposited film
exhaust
reaction vessel
substrate
film forming
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2006140138A
Other languages
English (en)
Japanese (ja)
Other versions
JP4827608B2 (ja
JP2007308775A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP2006140138A priority Critical patent/JP4827608B2/ja
Priority claimed from JP2006140138A external-priority patent/JP4827608B2/ja
Publication of JP2007308775A publication Critical patent/JP2007308775A/ja
Publication of JP2007308775A5 publication Critical patent/JP2007308775A5/ja
Application granted granted Critical
Publication of JP4827608B2 publication Critical patent/JP4827608B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

JP2006140138A 2006-05-19 2006-05-19 堆積膜形成装置、堆積膜形成方法および電子写真感光体の製造方法 Expired - Fee Related JP4827608B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2006140138A JP4827608B2 (ja) 2006-05-19 2006-05-19 堆積膜形成装置、堆積膜形成方法および電子写真感光体の製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2006140138A JP4827608B2 (ja) 2006-05-19 2006-05-19 堆積膜形成装置、堆積膜形成方法および電子写真感光体の製造方法

Publications (3)

Publication Number Publication Date
JP2007308775A JP2007308775A (ja) 2007-11-29
JP2007308775A5 true JP2007308775A5 (enExample) 2009-06-25
JP4827608B2 JP4827608B2 (ja) 2011-11-30

Family

ID=38841908

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2006140138A Expired - Fee Related JP4827608B2 (ja) 2006-05-19 2006-05-19 堆積膜形成装置、堆積膜形成方法および電子写真感光体の製造方法

Country Status (1)

Country Link
JP (1) JP4827608B2 (enExample)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5555077B2 (ja) * 2010-07-05 2014-07-23 キヤノン株式会社 処理容器の設置方法

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59170259A (ja) * 1983-03-17 1984-09-26 Minolta Camera Co Ltd 容量結合型グロ−放電分解装置
JPH0334061A (ja) * 1989-06-30 1991-02-14 Mitsubishi Electric Corp 文書編集方式
JPH09330884A (ja) * 1996-06-07 1997-12-22 Sony Corp エピタキシャル成長装置

Similar Documents

Publication Publication Date Title
CN103337450B (zh) 紫外光/臭氧表面清洗与氧化改性真空设备及其使用方法
JP2006303309A5 (enExample)
JP5458445B2 (ja) プラズマシステム
US8093072B2 (en) Substrate processing apparatus and method of manufacturing semiconductor device
JP2005504855A5 (enExample)
JP2009537993A5 (enExample)
JP2009212528A (ja) 基板処理装置
TW200745372A (en) Catalyst body chemical vapor phase growing apparatus
NL1033983A1 (nl) Inrichting voor het opwekken van extreem ultraviolette straling door middel van elektrische ontlading aan regenereerbare elektroden.
TW200802549A (en) Vertical plasma processing apparatus for semiconductor process
JP2012049376A5 (enExample)
US11161139B2 (en) Method and system for treating a surface
JP2007308775A5 (enExample)
JP4394134B2 (ja) ガス容器内部の洗浄方法
JP2008177419A5 (enExample)
KR101323214B1 (ko) 파티클 제거장치 및 이를 이용한 기판처리장치
KR20130077286A (ko) 히터 유닛 및 이를 포함하는 기판 처리 장치
JP2009260243A5 (ja) 基板処理装置の基板載置台、基板処理装置及び半導体デバイスの製造方法
JP2004228602A5 (enExample)
CN210001929U (zh) 一种远程等离子清洁pecvd腔室的设备
JP2008258240A5 (ja) 基板処理装置及び半導体装置の製造方法
JP6099508B2 (ja) ガス捕捉体およびそれを備えた半導体製造装置
KR100905464B1 (ko) 활성화된 플라즈마 처리장치
JP2001085409A5 (enExample)
KR20150096954A (ko) 배관 코팅 방법 및 그 장치