JP2007281298A - 半導体装置の製造方法 - Google Patents
半導体装置の製造方法 Download PDFInfo
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- JP2007281298A JP2007281298A JP2006107780A JP2006107780A JP2007281298A JP 2007281298 A JP2007281298 A JP 2007281298A JP 2006107780 A JP2006107780 A JP 2006107780A JP 2006107780 A JP2006107780 A JP 2006107780A JP 2007281298 A JP2007281298 A JP 2007281298A
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Abstract
【解決手段】成膜装置のドライクリーニング処理用のチャンバ27に備わるウエハステージ27a上に半導体ウエハSWを置いた後、還元ガスを供給して半導体ウエハSWの主面上をドライクリーニング処理し、続いて180℃に維持されたシャワーヘッド27cにより半導体ウエハSWを100から150℃の第1の温度で熱処理する。次いで半導体ウエハSWをチャンバ27から熱処理用のチャンバへ真空搬送した後、そのチャンバにおいて150から400℃の第2の温度で半導体ウエハSWを熱処理することにより、半導体ウエハSWの主面上に残留する生成物を除去する。
【選択図】図14
Description
(a)第1のチャンバに備わるウエハステージ上に半導体ウエハを置く工程;
(b)前記ウエハステージの上方に設置されたシャワーヘッドを介して還元ガスを供給し、前記半導体ウエハの主面上の前記シリコンの表面をドライクリーニング処理する工程;
(c)前記シャワーヘッドの加熱温度を利用した第1の温度で前記半導体ウエハを熱処理する工程;
(d)前記半導体ウエハを前記第1のチャンバから第2のチャンバへ搬送する工程;
(e)前記第2のチャンバにおいて、前記第1の温度よりも高い第2の温度で前記半導体ウエハを熱処理する工程。
(a)第1のチャンバに備わるウエハステージ上に半導体ウエハを置く工程;
(b)前記ウエハステージの上方に設置されたシャワーヘッドを介して還元ガスを供給し、前記半導体ウエハの主面上の前記シリコンの表面をドライクリーニング処理する工程;
(c)前記シャワーヘッドの加熱温度を利用した第1の温度で前記半導体ウエハを熱処理する工程、
ここで、前記シャワーヘッドは180℃よりも高い温度に維持される。
(a)第1のチャンバに備わるウエハステージ上に半導体ウエハを置く工程;
(b)前記ウエハステージの上方に設置されたシャワーヘッドを介して還元ガスを供給し、前記半導体ウエハの主面上の前記シリコンの表面をドライクリーニング処理する工程;
(c)前記半導体ウエハを前記第1のチャンバから第2のチャンバへ搬送する工程;
(d)前記第2のチャンバにおいて、第2の温度で前記半導体ウエハを熱処理する工程、
ここで、前記工程(b)では、前記半導体ウエハの側面および裏面に前記還元ガスが供給されない。
(b1)前記ウエハステージ上に置かれた前記半導体ウエハの周辺部をシーリングにより押さえる工程。
(b1)前記半導体ウエハを静電チャックにより前記ウエハステージ上に吸着する工程;
(b2)前記半導体ウエハの周辺部を前記半導体ウエハと接触させずにシャドウリングにより覆い、前記ウエハステージの周辺部から不活性ガスを流入させる工程。
(b1)前記ウエハステージ上に置かれた前記半導体ウエハの周辺部をシーリングにより押さえる工程;
(b2)前記ウエハステージの裏面側から不活性ガスを流入させる工程。
本発明の実施の形態1によるCMOS(Complementary Metal Oxide Semiconductor)デバイスの製造方法を図1から図19を用いて説明する。図1から図11および図17から図19はCMOSデバイスの要部断面図、図12はシリサイド材料の成膜装置の概略平面図、図13はシリサイド材料の成膜工程図、図14はシリサイド材料の成膜装置に備わるドライクリーニング処理用チャンバの概略断面図、図15はシリサイド材料の成膜装置に備わるドライクリーニング処理用チャンバにおける半導体ウエハの処理工程を説明するためのチャンバの概略断面図、図16はゲート電極の電気抵抗のばらつきを示すグラフ図である。
この時、還元反応により生成された生成物((NH4)2SiF6)が半導体ウエハSWの主面上に残留する。さらに、半導体ウエハSWはウエハステージ27a上に載せてあるだけであり、上記生成物は半導体ウエハSWの側面および裏面の一部にも残留する。半導体ウエハSWの側面および裏面の一部に残留する生成物は、半導体ウエハSWを他のチャンバへ搬送する場合などにおいて剥がれ、汚染や発塵の原因となる。そこで、ドライクリーニング処置に続いて、チャンバ27内において半導体ウエハSWに熱処理を施すことにより、半導体ウエハSWの主面上に残留する生成物を除去すると同時に、半導体ウエハSWの側面および裏面の一部に残留する生成物を除去する。
しかしながら、上記ドライクリーニング処理時に半導体ウエハSWに形成された生成物の組成が(NH4)2SiF6から僅かでもずれていると、温度100から150℃の熱処理では式(2)の反応が起こり難く、完全に生成物を除去することができなくなり、極微少の生成物が半導体ウエハSWの主面上に残留する。前述したように、半導体ウエハSWの主面上に微少な生成物が残留していると、その後半導体ウエハSWの主面上に形成されるニッケルシリサイド層の電気抵抗にばらつきが生じる。そこで、次工程において、半導体ウエハSWに150℃よりも高い温度の熱処理を施して、半導体ウエハSWの主面上に残留した微少の生成物を除去する。
前述した実施の形態1で説明したように、ニッケルシリサイド層33の形成工程において行われるドライクリーニング処理では、半導体ウエハSWの主面上、側面および裏面の一部に生成物が残留する。このため、ドライクリーニング処理用のチャンバ27に備わる180℃に設定されたシャワーヘッド27cによって半導体ウエハSWを100から150℃の温度で加熱して(NH4)2SiF6の組成の生成物を除去し、さらに、加熱処理用のチャンバ25,26により半導体ウエハを150℃よりも高い温度で加熱して(NH4)2SiF6から僅かに組成のずれた生成物の除去を行っている。
前述した実施の形態1で説明したように、ニッケルシリサイド層33の形成工程において行われるドライクリーニング処理では、一般に半導体ウエハSWをウエハステージ27aに単に置くだけであり、このため、半導体ウエハSWの主面上のみならず、半導体ウエハSWの側面および裏面の一部にも(NH4)2SiF6の組成の生成物が残留する。半導体ウエハSWの側面および裏面の一部に残留した生成物は、半導体ウエハSWを他のチャンバへ搬送する場合などにおいて剥がれて、汚染や発塵の原因となる。そこで、前述した実施の形態1および2では、ドライクリーニング処置に続いて、同じチャンバ27内で半導体ウエハSWに熱処理を施すことにより、半導体ウエハSWの主面上に残留する生成物を除去すると同時に、半導体ウエハSWの側面および裏面の一部に残留する生成物を除去している。
2 酸化シリコン膜
3 窒化シリコン膜
4 素子分離
4a 溝
4b 絶縁膜
5 レジストパターン
6 p型ウェル
7 レジストパターン
8 n型ウェル
9 ゲート絶縁膜
10n ゲート電極
10ns n型多結晶シリコン膜
10p ゲート電極
10ps p型多結晶シリコン膜
11 ソース・ドレイン拡張領域
12 ソース・ドレイン拡張領域
13 酸化シリコン膜
14 窒化シリコン膜
15 サイドウォール
16 ソース・ドレイン拡散領域
17 ソース・ドレイン拡散領域
18 ニッケル膜
19 窒化チタン膜
20 成膜装置
21a 第1搬送室
21b 第2搬送室
22 ゲートバルブ
23 ローダ
24 アンローダ
25,26,27 チャンバ
27a ウエハステージ
27b ウエハリフトピン
27c,27CH シャワーヘッド
27d リモートプラズマ発生装置
27e シーリング
27f シャドウリング
27g 排気室
28,29,30,31 チャンバ
32a,32b 搬送用ロボット
33 ニッケルシリサイド層
34a 第1絶縁膜
34b 第2絶縁膜
35 接続孔
36 バリアメタル膜
37 プラグ
38 ストッパ絶縁膜
39 絶縁膜
40 配線溝
41 バリアメタル膜
42 配線
43 キャップ絶縁膜
44 層間絶縁膜
45 ストッパ絶縁膜
46 絶縁膜
47 接続孔
48 配線溝
49 バリアメタル膜
50,51,52,53,54 配線
55 窒化シリコン膜
56 酸化シリコン膜
57 バンプ下地電極
58 バンプ電極
SW 半導体ウエハ
Claims (20)
- 自己整合反応によりニッケルシリサイド層を形成する半導体装置の製造方法であって、シリコン上にニッケル膜を堆積する前に以下の工程を含む半導体装置の製造方法:
(a)第1のチャンバに備わるウエハステージ上に半導体ウエハを置く工程;
(b)前記ウエハステージの上方に設置されたシャワーヘッドを介して還元ガスを供給し、前記半導体ウエハの主面上の前記シリコンの表面をドライクリーニング処理する工程;
(c)前記シャワーヘッドの加熱温度を利用した第1の温度で前記半導体ウエハを熱処理する工程;
(d)前記半導体ウエハを前記第1のチャンバから第2のチャンバへ搬送する工程;
(e)前記第2のチャンバにおいて、前記第1の温度よりも高い第2の温度で前記半導体ウエハを熱処理する工程。 - 請求項1記載の半導体装置の製造方法おいて、前記第1の温度は100から150℃である。
- 請求項1記載の半導体装置の製造方法において、前記第2の温度は150から400℃である。
- 請求項1記載の半導体装置の製造方法において、前記第2の温度は165から350℃である。
- 請求項1記載の半導体装置の製造方法において、前記第2の温度は180から220℃である。
- 請求項1記載の半導体装置の製造方法において、前記第2の温度は200℃である。
- 請求項1記載の半導体装置の製造方法において、前記第1のチャンバと前記第2のチャンバとの間の前記半導体ウエハの搬送は、真空搬送される。
- 自己整合反応によりニッケルシリサイド層を形成する半導体装置の製造方法であって、シリコン上にニッケル膜を堆積する前に以下の工程を含む半導体装置の製造方法:
(a)第1のチャンバに備わるウエハステージ上に半導体ウエハを置く工程;
(b)前記ウエハステージの上方に設置されたシャワーヘッドを介して還元ガスを供給し、前記半導体ウエハの主面上の前記シリコンの表面をドライクリーニング処理する工程;
(c)前記シャワーヘッドの加熱温度を利用した第1の温度で前記半導体ウエハを熱処理する工程、
ここで、前記シャワーヘッドは180℃よりも高い温度に維持される。 - 請求項8記載の半導体装置の製造方法において、前記第1の温度は180から220℃である。
- 請求項8記載の半導体装置の製造方法において、前記第1の温度は200℃である。
- 自己整合反応によりニッケルシリサイド層を形成する半導体装置の製造方法であって、シリコン上にニッケル膜を堆積する前に以下の工程を含む半導体装置の製造方法:
(a)第1のチャンバに備わるウエハステージ上に半導体ウエハを置く工程;
(b)前記ウエハステージの上方に設置されたシャワーヘッドを介して還元ガスを供給し、前記半導体ウエハの主面上の前記シリコンの表面をドライクリーニング処理する工程;
(c)前記半導体ウエハを前記第1のチャンバから第2のチャンバへ搬送する工程;
(d)前記第2のチャンバにおいて、第2の温度で前記半導体ウエハを熱処理する工程、
ここで、前記工程(b)では、前記半導体ウエハの側面および裏面に前記還元ガスが供給されない。 - 請求項11記載の半導体装置の製造方法において、前記第2の温度は150から400℃である。
- 請求項11記載の半導体装置の製造方法において、前記第2の温度は165から350℃である。
- 請求項11記載の半導体装置の製造方法において、前記第2の温度は180から220℃である。
- 請求項11記載の半導体装置の製造方法において、前記第2の温度は200℃である。
- 請求項11記載の半導体装置の製造方法において、前記工程(b)は以下の工程を含む:
(b1)前記ウエハステージ上に置かれた前記半導体ウエハの周辺部をシーリングにより押さえる工程。 - 請求項11記載の半導体装置の製造方法において、前記工程(b)は以下の工程を含む:
(b1)前記半導体ウエハを静電チャックにより前記ウエハステージ上に吸着する工程;
(b2)前記半導体ウエハの周辺部を前記半導体ウエハと接触させずにシャドウリングにより覆い、前記ウエハステージの周辺部から不活性ガスを流入させる工程。 - 請求項11記載の半導体装置の製造方法において、前記工程(b)は以下の工程を含む:
(b1)前記ウエハステージ上に置かれた前記半導体ウエハの周辺部をシーリングにより押さえる工程;
(b2)前記ウエハステージの裏面側から不活性ガスを流入させる工程。 - 請求項11記載の半導体装置の製造方法において、前記第1のチャンバと前記第2のチャンバとの間の前記半導体ウエハの搬送は、真空搬送される。
- 請求項1、8または11記載の半導体装置の製造方法において、前記シリコンは電界効果トランジスタのゲート電極を構成する多結晶シリコンまたはソース・ドレイン拡散領域が形成された前記半導体ウエハを構成する単結晶シリコンである。
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CN101055832B (zh) | 2010-12-08 |
KR20070101132A (ko) | 2007-10-16 |
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TWI405251B (zh) | 2013-08-11 |
TW200741831A (en) | 2007-11-01 |
JP5042517B2 (ja) | 2012-10-03 |
US7566662B2 (en) | 2009-07-28 |
US20070238321A1 (en) | 2007-10-11 |
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Free format text: JAPANESE INTERMEDIATE CODE: R313531 |
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R350 | Written notification of registration of transfer |
Free format text: JAPANESE INTERMEDIATE CODE: R350 |