JP2007234822A5 - - Google Patents

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Publication number
JP2007234822A5
JP2007234822A5 JP2006053804A JP2006053804A JP2007234822A5 JP 2007234822 A5 JP2007234822 A5 JP 2007234822A5 JP 2006053804 A JP2006053804 A JP 2006053804A JP 2006053804 A JP2006053804 A JP 2006053804A JP 2007234822 A5 JP2007234822 A5 JP 2007234822A5
Authority
JP
Japan
Prior art keywords
exposure apparatus
capping layer
optical element
substrate
repairing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP2006053804A
Other languages
English (en)
Japanese (ja)
Other versions
JP2007234822A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP2006053804A priority Critical patent/JP2007234822A/ja
Priority claimed from JP2006053804A external-priority patent/JP2007234822A/ja
Priority to US11/677,241 priority patent/US8004657B2/en
Priority to TW096106877A priority patent/TW200745725A/zh
Priority to KR1020070019990A priority patent/KR100861388B1/ko
Publication of JP2007234822A publication Critical patent/JP2007234822A/ja
Publication of JP2007234822A5 publication Critical patent/JP2007234822A5/ja
Withdrawn legal-status Critical Current

Links

JP2006053804A 2006-02-28 2006-02-28 露光装置及びその制御方法並びにデバイス製造方法 Withdrawn JP2007234822A (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2006053804A JP2007234822A (ja) 2006-02-28 2006-02-28 露光装置及びその制御方法並びにデバイス製造方法
US11/677,241 US8004657B2 (en) 2006-02-28 2007-02-21 Exposure apparatus, control method for the same, and device manufacturing method
TW096106877A TW200745725A (en) 2006-02-28 2007-02-27 Exposure apparatus, control method for the same, and device manufacturing method
KR1020070019990A KR100861388B1 (ko) 2006-02-28 2007-02-28 노광 장치 및 그 제어 방법, 및 디바이스 제조 방법

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2006053804A JP2007234822A (ja) 2006-02-28 2006-02-28 露光装置及びその制御方法並びにデバイス製造方法

Publications (2)

Publication Number Publication Date
JP2007234822A JP2007234822A (ja) 2007-09-13
JP2007234822A5 true JP2007234822A5 (enExample) 2009-03-26

Family

ID=38444405

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2006053804A Withdrawn JP2007234822A (ja) 2006-02-28 2006-02-28 露光装置及びその制御方法並びにデバイス製造方法

Country Status (4)

Country Link
US (1) US8004657B2 (enExample)
JP (1) JP2007234822A (enExample)
KR (1) KR100861388B1 (enExample)
TW (1) TW200745725A (enExample)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007234822A (ja) 2006-02-28 2007-09-13 Canon Inc 露光装置及びその制御方法並びにデバイス製造方法
US9645502B2 (en) 2011-04-08 2017-05-09 Asml Netherlands B.V. Lithographic apparatus, programmable patterning device and lithographic method
WO2017080817A1 (en) * 2015-11-11 2017-05-18 Asml Netherlands B.V. A radiation system and optical device
DE102016224200A1 (de) * 2016-12-06 2018-06-07 Carl Zeiss Smt Gmbh Verfahren zum Reparieren von reflektiven optischen Elementen für die EUV-Lithographie

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5429730A (en) * 1992-11-02 1995-07-04 Kabushiki Kaisha Toshiba Method of repairing defect of structure
US5835560A (en) 1994-05-24 1998-11-10 Canon Kabushiki Kaisha Exposure apparatus
US6228512B1 (en) * 1999-05-26 2001-05-08 The Regents Of The University Of California MoRu/Be multilayers for extreme ultraviolet applications
US6533952B2 (en) * 1999-06-08 2003-03-18 Euv Llc Mitigation of radiation induced surface contamination
TW561279B (en) 1999-07-02 2003-11-11 Asml Netherlands Bv Reflector for reflecting radiation in a desired wavelength range, lithographic projection apparatus containing the same and method for their preparation
JP4560182B2 (ja) 2000-07-06 2010-10-13 キヤノン株式会社 減圧処理装置、半導体製造装置およびデバイス製造方法
TW548524B (en) * 2000-09-04 2003-08-21 Asm Lithography Bv Lithographic projection apparatus, device manufacturing method and device manufactured thereby
US6954255B2 (en) 2001-06-15 2005-10-11 Canon Kabushiki Kaisha Exposure apparatus
JP2003022950A (ja) 2001-07-05 2003-01-24 Canon Inc Ｘ線光源用デブリ除去装置及び、デブリ除去装置を用いた露光装置
JP2003115451A (ja) 2001-07-30 2003-04-18 Canon Inc 露光装置及びそれを用いたデバイスの製造方法
US20050109278A1 (en) * 2003-11-26 2005-05-26 Ted Liang Method to locally protect extreme ultraviolet multilayer blanks used for lithography
US7561247B2 (en) * 2005-08-22 2009-07-14 Asml Netherlands B.V. Method for the removal of deposition on an optical element, method for the protection of an optical element, device manufacturing method, apparatus including an optical element, and lithographic apparatus
JP2007067344A (ja) 2005-09-02 2007-03-15 Canon Inc 露光装置および方法ならびにデバイス製造方法
KR20070054019A (ko) * 2005-11-22 2007-05-28 삼성전자주식회사 원자힘 현미경 리소그래피 기술을 이용한 극자외선 마스크수정 방법
JP2007234822A (ja) 2006-02-28 2007-09-13 Canon Inc 露光装置及びその制御方法並びにデバイス製造方法

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