JP2007158224A - 露光方法 - Google Patents

露光方法 Download PDF

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Publication number
JP2007158224A
JP2007158224A JP2005354543A JP2005354543A JP2007158224A JP 2007158224 A JP2007158224 A JP 2007158224A JP 2005354543 A JP2005354543 A JP 2005354543A JP 2005354543 A JP2005354543 A JP 2005354543A JP 2007158224 A JP2007158224 A JP 2007158224A
Authority
JP
Japan
Prior art keywords
correction
correction amount
illuminance
slit
exposure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP2005354543A
Other languages
English (en)
Japanese (ja)
Other versions
JP2007158224A5 (https=
Inventor
Haruna Kawashima
春名 川島
Ayako Katono
綾子 上遠野
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2005354543A priority Critical patent/JP2007158224A/ja
Priority to US11/567,499 priority patent/US7619716B2/en
Publication of JP2007158224A publication Critical patent/JP2007158224A/ja
Publication of JP2007158224A5 publication Critical patent/JP2007158224A5/ja
Withdrawn legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70425—Imaging strategies, e.g. for increasing throughput or resolution, printing product fields larger than the image field or compensating lithography- or non-lithography errors, e.g. proximity correction, mix-and-match, stitching or double patterning
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70558—Dose control, i.e. achievement of a desired dose

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2005354543A 2005-12-08 2005-12-08 露光方法 Withdrawn JP2007158224A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2005354543A JP2007158224A (ja) 2005-12-08 2005-12-08 露光方法
US11/567,499 US7619716B2 (en) 2005-12-08 2006-12-06 Exposure method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005354543A JP2007158224A (ja) 2005-12-08 2005-12-08 露光方法

Publications (2)

Publication Number Publication Date
JP2007158224A true JP2007158224A (ja) 2007-06-21
JP2007158224A5 JP2007158224A5 (https=) 2009-01-29

Family

ID=38179832

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2005354543A Withdrawn JP2007158224A (ja) 2005-12-08 2005-12-08 露光方法

Country Status (2)

Country Link
US (1) US7619716B2 (https=)
JP (1) JP2007158224A (https=)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010182704A (ja) * 2009-02-03 2010-08-19 Nikon Corp 補正ユニット、照明光学系、露光装置、およびデバイス製造方法
JP2010225900A (ja) * 2009-03-24 2010-10-07 Toshiba Corp 露光装置および電子デバイスの製造方法

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6422307B2 (ja) 2014-11-05 2018-11-14 キヤノン株式会社 露光方法、露光装置、および物品の製造方法
EP3570110A1 (en) * 2018-05-16 2019-11-20 ASML Netherlands B.V. Estimating a parameter of a substrate

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3232473B2 (ja) 1996-01-10 2001-11-26 キヤノン株式会社 投影露光装置及びそれを用いたデバイスの製造方法
JP3937580B2 (ja) * 1998-04-30 2007-06-27 キヤノン株式会社 投影露光装置及びそれを用いたデバイスの製造方法
US6771350B2 (en) * 2000-02-25 2004-08-03 Nikon Corporation Exposure apparatus and exposure method capable of controlling illumination distribution

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010182704A (ja) * 2009-02-03 2010-08-19 Nikon Corp 補正ユニット、照明光学系、露光装置、およびデバイス製造方法
JP2010225900A (ja) * 2009-03-24 2010-10-07 Toshiba Corp 露光装置および電子デバイスの製造方法

Also Published As

Publication number Publication date
US7619716B2 (en) 2009-11-17
US20070132981A1 (en) 2007-06-14

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