JP2007122027A5 - - Google Patents

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Publication number
JP2007122027A5
JP2007122027A5 JP2006257370A JP2006257370A JP2007122027A5 JP 2007122027 A5 JP2007122027 A5 JP 2007122027A5 JP 2006257370 A JP2006257370 A JP 2006257370A JP 2006257370 A JP2006257370 A JP 2006257370A JP 2007122027 A5 JP2007122027 A5 JP 2007122027A5
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JP
Japan
Prior art keywords
laser beam
exposure
opening
linear laser
openings
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2006257370A
Other languages
English (en)
Japanese (ja)
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JP2007122027A (ja
JP4884148B2 (ja
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Publication date
Application filed filed Critical
Priority to JP2006257370A priority Critical patent/JP4884148B2/ja
Priority claimed from JP2006257370A external-priority patent/JP4884148B2/ja
Publication of JP2007122027A publication Critical patent/JP2007122027A/ja
Publication of JP2007122027A5 publication Critical patent/JP2007122027A5/ja
Application granted granted Critical
Publication of JP4884148B2 publication Critical patent/JP4884148B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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JP2006257370A 2005-09-28 2006-09-22 レーザー処理装置、露光装置及び露光方法 Expired - Fee Related JP4884148B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2006257370A JP4884148B2 (ja) 2005-09-28 2006-09-22 レーザー処理装置、露光装置及び露光方法

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2005281610 2005-09-28
JP2005281610 2005-09-28
JP2006257370A JP4884148B2 (ja) 2005-09-28 2006-09-22 レーザー処理装置、露光装置及び露光方法

Publications (3)

Publication Number Publication Date
JP2007122027A JP2007122027A (ja) 2007-05-17
JP2007122027A5 true JP2007122027A5 (https=) 2009-10-22
JP4884148B2 JP4884148B2 (ja) 2012-02-29

Family

ID=38145870

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2006257370A Expired - Fee Related JP4884148B2 (ja) 2005-09-28 2006-09-22 レーザー処理装置、露光装置及び露光方法

Country Status (1)

Country Link
JP (1) JP4884148B2 (https=)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6046976B2 (ja) * 2012-05-17 2016-12-21 株式会社アルバック 露光装置
JP7056188B2 (ja) * 2018-01-31 2022-04-19 日本ゼオン株式会社 表面処理方法及び表面処理用マスク構造体
WO2024218918A1 (ja) * 2023-04-19 2024-10-24 信越エンジニアリング株式会社 レーザ照射装置、レーザ加工装置、レーザ加工方法、レーザ露光装置、レーザ露光方法、マスクの設置方法、レーザ加工装置の設置方法、レーザ露光装置の設置方法、マスク及びレーザ照射システム

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3082652B2 (ja) * 1994-12-27 2000-08-28 キヤノン株式会社 照明装置及びそれを用いたデバイスの製造方法
JPH08250401A (ja) * 1995-03-14 1996-09-27 Sharp Corp 半導体装置の製造方法および半導体装置製造用フォトマスク
JPH11237744A (ja) * 1997-12-18 1999-08-31 Sanee Giken Kk 露光装置および露光方法
US6593064B1 (en) * 1998-06-19 2003-07-15 Creo Inc. High resolution optical stepper
JP5314842B2 (ja) * 2006-08-25 2013-10-16 株式会社半導体エネルギー研究所 半導体装置の作製方法

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