JP2007117884A - 組成傾斜構造を有する酸素分離膜 - Google Patents
組成傾斜構造を有する酸素分離膜 Download PDFInfo
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- JP2007117884A JP2007117884A JP2005313381A JP2005313381A JP2007117884A JP 2007117884 A JP2007117884 A JP 2007117884A JP 2005313381 A JP2005313381 A JP 2005313381A JP 2005313381 A JP2005313381 A JP 2005313381A JP 2007117884 A JP2007117884 A JP 2007117884A
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- oxygen separation
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- 239000001301 oxygen Substances 0.000 title claims abstract description 313
- 229910052760 oxygen Inorganic materials 0.000 title claims abstract description 313
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 title claims abstract description 296
- 239000012528 membrane Substances 0.000 title claims abstract description 143
- 238000000926 separation method Methods 0.000 title claims abstract description 132
- 239000000203 mixture Substances 0.000 title claims abstract description 40
- 230000009467 reduction Effects 0.000 claims abstract description 99
- 239000011533 mixed conductor Substances 0.000 claims description 74
- 239000000463 material Substances 0.000 claims description 44
- 229910052782 aluminium Inorganic materials 0.000 claims description 6
- 229910052759 nickel Inorganic materials 0.000 claims description 4
- 229910052697 platinum Inorganic materials 0.000 claims description 4
- 229910052719 titanium Inorganic materials 0.000 claims description 4
- 229910052748 manganese Inorganic materials 0.000 claims description 3
- 229910052763 palladium Inorganic materials 0.000 claims description 3
- 229910052703 rhodium Inorganic materials 0.000 claims description 3
- 229910052726 zirconium Inorganic materials 0.000 claims description 3
- 229910052804 chromium Inorganic materials 0.000 claims description 2
- 229910052802 copper Inorganic materials 0.000 claims description 2
- 229910052733 gallium Inorganic materials 0.000 claims description 2
- 229910052737 gold Inorganic materials 0.000 claims description 2
- 229910052747 lanthanoid Inorganic materials 0.000 claims description 2
- 150000002602 lanthanoids Chemical class 0.000 claims description 2
- 229910052758 niobium Inorganic materials 0.000 claims description 2
- 230000005540 biological transmission Effects 0.000 abstract description 22
- 238000007254 oxidation reaction Methods 0.000 abstract description 10
- 230000003647 oxidation Effects 0.000 abstract description 5
- 239000010410 layer Substances 0.000 description 322
- 239000007789 gas Substances 0.000 description 55
- 239000003054 catalyst Substances 0.000 description 49
- 230000002829 reductive effect Effects 0.000 description 37
- 239000010408 film Substances 0.000 description 34
- 238000000034 method Methods 0.000 description 24
- 238000010494 dissociation reaction Methods 0.000 description 21
- 230000005593 dissociations Effects 0.000 description 21
- 230000006798 recombination Effects 0.000 description 21
- 238000005215 recombination Methods 0.000 description 21
- 238000004519 manufacturing process Methods 0.000 description 20
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 20
- 239000000843 powder Substances 0.000 description 17
- -1 oxygen ion Chemical class 0.000 description 16
- 230000008569 process Effects 0.000 description 16
- 150000001875 compounds Chemical class 0.000 description 15
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 14
- 239000010936 titanium Substances 0.000 description 11
- 239000002002 slurry Substances 0.000 description 10
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 10
- 230000000052 comparative effect Effects 0.000 description 9
- 238000005336 cracking Methods 0.000 description 9
- 230000007423 decrease Effects 0.000 description 8
- 238000010304 firing Methods 0.000 description 8
- 239000000446 fuel Substances 0.000 description 8
- 229910052757 nitrogen Inorganic materials 0.000 description 8
- 230000002093 peripheral effect Effects 0.000 description 8
- 230000008901 benefit Effects 0.000 description 6
- 238000006243 chemical reaction Methods 0.000 description 6
- 239000000470 constituent Substances 0.000 description 6
- 229930195733 hydrocarbon Natural products 0.000 description 6
- 150000002430 hydrocarbons Chemical class 0.000 description 6
- 239000007784 solid electrolyte Substances 0.000 description 6
- 230000015572 biosynthetic process Effects 0.000 description 5
- 239000000919 ceramic Substances 0.000 description 5
- 229910052739 hydrogen Inorganic materials 0.000 description 5
- 239000002245 particle Substances 0.000 description 5
- 239000012466 permeate Substances 0.000 description 5
- 239000011148 porous material Substances 0.000 description 5
- 238000011084 recovery Methods 0.000 description 5
- 239000010409 thin film Substances 0.000 description 5
- 239000004215 Carbon black (E152) Substances 0.000 description 4
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 4
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 239000001257 hydrogen Substances 0.000 description 4
- 239000010416 ion conductor Substances 0.000 description 4
- PXHVJJICTQNCMI-UHFFFAOYSA-N nickel Substances [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 4
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Substances [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 4
- 238000005498 polishing Methods 0.000 description 4
- 238000007789 sealing Methods 0.000 description 4
- 238000003786 synthesis reaction Methods 0.000 description 4
- 230000009471 action Effects 0.000 description 3
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical group [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 3
- 239000004020 conductor Substances 0.000 description 3
- 239000013078 crystal Substances 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- 239000007788 liquid Substances 0.000 description 3
- 229910052749 magnesium Chemical group 0.000 description 3
- 239000011777 magnesium Chemical group 0.000 description 3
- 238000000465 moulding Methods 0.000 description 3
- 239000002994 raw material Substances 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- 229910002138 La0.6Sr0.4CoO3 Inorganic materials 0.000 description 2
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical group [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 2
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 2
- 239000011230 binding agent Substances 0.000 description 2
- 230000008859 change Effects 0.000 description 2
- 238000011161 development Methods 0.000 description 2
- 238000003618 dip coating Methods 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 230000002706 hydrostatic effect Effects 0.000 description 2
- 150000002500 ions Chemical class 0.000 description 2
- 229910052742 iron Inorganic materials 0.000 description 2
- 238000010030 laminating Methods 0.000 description 2
- 238000003475 lamination Methods 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 238000002156 mixing Methods 0.000 description 2
- 239000003345 natural gas Substances 0.000 description 2
- 239000003960 organic solvent Substances 0.000 description 2
- 230000035699 permeability Effects 0.000 description 2
- 239000003566 sealing material Substances 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 238000012360 testing method Methods 0.000 description 2
- 229910052720 vanadium Inorganic materials 0.000 description 2
- 229910000859 α-Fe Inorganic materials 0.000 description 2
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- UGFAIRIUMAVXCW-UHFFFAOYSA-N Carbon monoxide Chemical compound [O+]#[C-] UGFAIRIUMAVXCW-UHFFFAOYSA-N 0.000 description 1
- 229910018921 CoO 3 Inorganic materials 0.000 description 1
- 229910020800 La-Sr-Co Inorganic materials 0.000 description 1
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- GEIAQOFPUVMAGM-UHFFFAOYSA-N ZrO Inorganic materials [Zr]=O GEIAQOFPUVMAGM-UHFFFAOYSA-N 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 229910002091 carbon monoxide Inorganic materials 0.000 description 1
- 230000003197 catalytic effect Effects 0.000 description 1
- 238000004939 coking Methods 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 239000002270 dispersing agent Substances 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 238000011049 filling Methods 0.000 description 1
- 238000004817 gas chromatography Methods 0.000 description 1
- 238000005469 granulation Methods 0.000 description 1
- 230000003179 granulation Effects 0.000 description 1
- 238000000227 grinding Methods 0.000 description 1
- 150000002431 hydrogen Chemical class 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 229910052738 indium Inorganic materials 0.000 description 1
- 229910052741 iridium Inorganic materials 0.000 description 1
- 238000005304 joining Methods 0.000 description 1
- 229910052746 lanthanum Inorganic materials 0.000 description 1
- FZLIPJUXYLNCLC-UHFFFAOYSA-N lanthanum atom Chemical compound [La] FZLIPJUXYLNCLC-UHFFFAOYSA-N 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- CPLXHLVBOLITMK-UHFFFAOYSA-N magnesium oxide Inorganic materials [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 description 1
- 229910000480 nickel oxide Inorganic materials 0.000 description 1
- AHKZTVQIVOEVFO-UHFFFAOYSA-N oxide(2-) Chemical compound [O-2] AHKZTVQIVOEVFO-UHFFFAOYSA-N 0.000 description 1
- GNRSAWUEBMWBQH-UHFFFAOYSA-N oxonickel Chemical compound [Ni]=O GNRSAWUEBMWBQH-UHFFFAOYSA-N 0.000 description 1
- 150000002926 oxygen Chemical class 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- 230000001737 promoting effect Effects 0.000 description 1
- 239000011241 protective layer Substances 0.000 description 1
- 238000002407 reforming Methods 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 229910052707 ruthenium Inorganic materials 0.000 description 1
- 229910052706 scandium Inorganic materials 0.000 description 1
- 238000006748 scratching Methods 0.000 description 1
- 230000002393 scratching effect Effects 0.000 description 1
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 1
- 229910010271 silicon carbide Inorganic materials 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 239000006104 solid solution Substances 0.000 description 1
- 238000001179 sorption measurement Methods 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 230000002194 synthesizing effect Effects 0.000 description 1
- 229910052718 tin Inorganic materials 0.000 description 1
- LEONUFNNVUYDNQ-UHFFFAOYSA-N vanadium atom Chemical compound [V] LEONUFNNVUYDNQ-UHFFFAOYSA-N 0.000 description 1
- 229910052727 yttrium Inorganic materials 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
Images
Classifications
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E60/00—Enabling technologies; Technologies with a potential or indirect contribution to GHG emissions mitigation
- Y02E60/30—Hydrogen technology
- Y02E60/50—Fuel cells
Landscapes
- Fuel Cell (AREA)
- Separation Using Semi-Permeable Membranes (AREA)
- Oxygen, Ozone, And Oxides In General (AREA)
Abstract
【解決手段】 酸素分離膜10は、還元膨張率が大きく且つ酸素透過性能の高い第2層14に、還元膨張率が小さく且つ酸素透過性能の低い第1層12,第3層16が積層された組成傾斜型になる。したがって、第2層14が第1層12によって還元雰囲気から保護され、延いては酸素分離膜全体の還元耐久性を十分に高めることができる。また、第1層12,第3層16は十分に薄いので、これを構成する混合伝導体の酸素透過性能が低くとも、酸素分離膜全体の高い酸素透過性能を得ることができる。しかも、還元側に設けられた第1層12と同一の混合伝導体から成る第3層16が酸化側にも同一の厚さ寸法で設けられていることから、使用時等において酸素分離膜10が高温に曝された場合にも、その両面における熱膨張量の相違が生じない。
【選択図】図1
Description
[{(1+Ered/100)-(1+Eair/100)}/(1+Eair/100)]×100 ・・・(1)
CH4+1/2O2 → CO+2H2 ・・・(2)
LN =[N2量(cc/min)/全ガス量(cc/min)]×100 ・・・(3)
Claims (4)
- 一般式(Ln1-xAex)MO3(但し、Lnはランタノイドのうちの1種または2種以上の組合せ、AeはBa、Sr、Caのうちから選ばれる1種または2種以上の組合せ、MはTi,Zr,Al,Ga,Nb,Ta,Fe,Co,Ni,Cu,Cr,Mn,Rh,Pd,Pt,およびAuのうちから選ばれる1種または2種以上の組合せ、0≦x≦1)で表される第1の混合伝導体から成る第1層と、
前記一般式で表され且つ前記第1の混合伝導体よりも還元膨張率が大きい第2の混合伝導体から成りその一面側に前記第1層が積層された第2層と、
前記一般式で表され且つ前記第2の混合伝導体よりも還元膨張率が小さい第3の混合伝導体から成り前記第2層の他面側に積層された第3層と
を、含むことを特徴とする組成傾斜構造を有する酸素分離膜。 - 前記第2層は0.14(%)以上の還元膨張率を有し、且つ前記第1層および前記第3層は0.14(%)未満の還元膨張率を有することを特徴とする請求項1に記載の組成傾斜構造を有する酸素分離膜。
- 前記第1層の厚さ寸法は前記第3層の厚さ寸法の1/3倍より大きく且つ3倍未満であることを特徴とする請求項1または請求項2に記載の組成傾斜構造を有する酸素分離膜。
- 前記第1層および前記第3層は同一材料から成ることを特徴とする請求項1乃至請求項3の何れかに記載の組成傾斜構造を有する酸素分離膜。
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JP2005313381A JP4500762B2 (ja) | 2005-10-27 | 2005-10-27 | 組成傾斜構造を有する酸素分離膜 |
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Publications (2)
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JP2007117884A true JP2007117884A (ja) | 2007-05-17 |
JP4500762B2 JP4500762B2 (ja) | 2010-07-14 |
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Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2007117969A (ja) * | 2005-10-31 | 2007-05-17 | Noritake Co Ltd | 組成傾斜型酸素分離膜 |
JP2009195864A (ja) * | 2008-02-25 | 2009-09-03 | Noritake Co Ltd | 酸素分離膜エレメントならびに該エレメントのシール方法及びシール材 |
US7968200B2 (en) | 2008-02-25 | 2011-06-28 | Noritake Co., Ltd | Ceramic product and ceramic member bonding method |
JP2015073922A (ja) * | 2013-10-07 | 2015-04-20 | 日本特殊陶業株式会社 | 酸素透過膜および改質器 |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2003040058A1 (fr) * | 2001-11-09 | 2003-05-15 | Noritake Co.,Limited | Materiau ceramique conducteur d'ions oxygene et son application |
JP2005095718A (ja) * | 2003-09-22 | 2005-04-14 | Noritake Co Ltd | 酸素分離膜エレメント及びその製造方法 |
JP2007069090A (ja) * | 2005-09-05 | 2007-03-22 | Noritake Co Ltd | 組成傾斜型酸素分離膜 |
JP2007073272A (ja) * | 2005-09-05 | 2007-03-22 | Noritake Co Ltd | 非電子伝導性組成傾斜型固体電解質膜 |
-
2005
- 2005-10-27 JP JP2005313381A patent/JP4500762B2/ja active Active
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2003040058A1 (fr) * | 2001-11-09 | 2003-05-15 | Noritake Co.,Limited | Materiau ceramique conducteur d'ions oxygene et son application |
JP2005095718A (ja) * | 2003-09-22 | 2005-04-14 | Noritake Co Ltd | 酸素分離膜エレメント及びその製造方法 |
JP2007069090A (ja) * | 2005-09-05 | 2007-03-22 | Noritake Co Ltd | 組成傾斜型酸素分離膜 |
JP2007073272A (ja) * | 2005-09-05 | 2007-03-22 | Noritake Co Ltd | 非電子伝導性組成傾斜型固体電解質膜 |
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2007117969A (ja) * | 2005-10-31 | 2007-05-17 | Noritake Co Ltd | 組成傾斜型酸素分離膜 |
JP4500763B2 (ja) * | 2005-10-31 | 2010-07-14 | 株式会社ノリタケカンパニーリミテド | 組成傾斜型酸素分離膜 |
JP2009195864A (ja) * | 2008-02-25 | 2009-09-03 | Noritake Co Ltd | 酸素分離膜エレメントならびに該エレメントのシール方法及びシール材 |
JP4523045B2 (ja) * | 2008-02-25 | 2010-08-11 | 株式会社ノリタケカンパニーリミテド | 酸素分離膜エレメントならびに該エレメントのシール方法及びシール材 |
US7968200B2 (en) | 2008-02-25 | 2011-06-28 | Noritake Co., Ltd | Ceramic product and ceramic member bonding method |
US8431227B2 (en) | 2008-02-25 | 2013-04-30 | Noritake Co., Ltd | Ceramic product and ceramic member bonding method |
JP2015073922A (ja) * | 2013-10-07 | 2015-04-20 | 日本特殊陶業株式会社 | 酸素透過膜および改質器 |
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