JP2007108194A - 多層膜ミラーの製造方法、光学系の製造方法、露光装置、及びデバイス製造方法 - Google Patents

多層膜ミラーの製造方法、光学系の製造方法、露光装置、及びデバイス製造方法 Download PDF

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Publication number
JP2007108194A
JP2007108194A JP2005295848A JP2005295848A JP2007108194A JP 2007108194 A JP2007108194 A JP 2007108194A JP 2005295848 A JP2005295848 A JP 2005295848A JP 2005295848 A JP2005295848 A JP 2005295848A JP 2007108194 A JP2007108194 A JP 2007108194A
Authority
JP
Japan
Prior art keywords
multilayer
surface shape
substrate
multilayer film
manufacturing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2005295848A
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English (en)
Japanese (ja)
Other versions
JP2007108194A5 (enExample
Inventor
Akira Miyake
明 三宅
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2005295848A priority Critical patent/JP2007108194A/ja
Priority to EP20060122024 priority patent/EP1775604B1/en
Priority to US11/548,107 priority patent/US7543948B2/en
Publication of JP2007108194A publication Critical patent/JP2007108194A/ja
Publication of JP2007108194A5 publication Critical patent/JP2007108194A5/ja
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/08—Mirrors
    • G02B5/0891—Ultraviolet [UV] mirrors
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/08—Mirrors
    • G02B5/0816—Multilayer mirrors, i.e. having two or more reflecting layers
    • G02B5/0825—Multilayer mirrors, i.e. having two or more reflecting layers the reflecting layers comprising dielectric materials only
    • G02B5/0841—Multilayer mirrors, i.e. having two or more reflecting layers the reflecting layers comprising dielectric materials only comprising organic materials, e.g. polymers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70316—Details of optical elements, e.g. of Bragg reflectors, extreme ultraviolet [EUV] multilayer or bilayer mirrors or diffractive optical elements
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
    • G21K1/06—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators
    • G21K1/062—Devices having a multilayer structure
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S359/00—Optical: systems and elements
    • Y10S359/90—Methods

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Optics & Photonics (AREA)
  • Nanotechnology (AREA)
  • Mathematical Physics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Theoretical Computer Science (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Engineering & Computer Science (AREA)
  • High Energy & Nuclear Physics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Optical Elements Other Than Lenses (AREA)
  • Optical Filters (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2005295848A 2005-10-11 2005-10-11 多層膜ミラーの製造方法、光学系の製造方法、露光装置、及びデバイス製造方法 Pending JP2007108194A (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2005295848A JP2007108194A (ja) 2005-10-11 2005-10-11 多層膜ミラーの製造方法、光学系の製造方法、露光装置、及びデバイス製造方法
EP20060122024 EP1775604B1 (en) 2005-10-11 2006-10-10 Multilayer mirror manufacturing method, optical system manufacturing method, exposure apparatus, and device manufacturing method
US11/548,107 US7543948B2 (en) 2005-10-11 2006-10-10 Multilayer mirror manufacturing method, optical system manufacturing method, exposure apparatus, and device manufacturing method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005295848A JP2007108194A (ja) 2005-10-11 2005-10-11 多層膜ミラーの製造方法、光学系の製造方法、露光装置、及びデバイス製造方法

Publications (2)

Publication Number Publication Date
JP2007108194A true JP2007108194A (ja) 2007-04-26
JP2007108194A5 JP2007108194A5 (enExample) 2008-11-27

Family

ID=37600760

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2005295848A Pending JP2007108194A (ja) 2005-10-11 2005-10-11 多層膜ミラーの製造方法、光学系の製造方法、露光装置、及びデバイス製造方法

Country Status (3)

Country Link
US (1) US7543948B2 (enExample)
EP (1) EP1775604B1 (enExample)
JP (1) JP2007108194A (enExample)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008109060A (ja) * 2005-11-10 2008-05-08 Asahi Glass Co Ltd Ｅｕｖリソグラフィ用反射型マスクブランクの多層反射膜を成膜する方法、ならびにｅｕｖリソグラフィ用反射型マスクブランクの製造方法
JP2017506363A (ja) * 2014-01-30 2017-03-02 カール・ツァイス・エスエムティー・ゲーエムベーハー ミラー素子を製造する方法
JP2017126062A (ja) * 2015-12-16 2017-07-20 カール・ツァイス・エスエムティー・ゲーエムベーハー 特にマイクロリソグラフィ投影露光装置用のミラー素子

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20100246036A1 (en) * 2007-07-27 2010-09-30 Lagana Paolo Preliminary Controlled Pre-Deformation Treatment for the Production of Mirrors
JP2010152096A (ja) * 2008-12-25 2010-07-08 Canon Inc ミラー基板、ミラー、露光装置、デバイス製造方法、およびミラーの製造方法
US10468149B2 (en) * 2017-02-03 2019-11-05 Globalfoundries Inc. Extreme ultraviolet mirrors and masks with improved reflectivity
US11605478B2 (en) * 2019-11-22 2023-03-14 Zygo Corporation Method of reducing roughness and/or defects on an optical surface and mirror formed by same
CN112577475A (zh) * 2021-01-14 2021-03-30 天津希格玛微电子技术有限公司 一种能够有效降低功耗的视频测距方法

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06186418A (ja) * 1992-06-30 1994-07-08 Victor Co Of Japan Ltd ダイクロイックミラーの製造方法

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4066344A (en) * 1976-08-30 1978-01-03 Dipak Chandra Talapatra Light-weight arch type structures for large reflective mirrors
JPH1138192A (ja) 1997-07-17 1999-02-12 Nikon Corp 多層膜反射鏡
US6011646A (en) * 1998-02-20 2000-01-04 The Regents Of The Unviersity Of California Method to adjust multilayer film stress induced deformation of optics
JP2001027700A (ja) 1999-07-14 2001-01-30 Nikon Corp 多層膜反射鏡、多層膜反射鏡の製造方法、多層膜反射鏡の応力の制御方法および露光装置
US6319635B1 (en) * 1999-12-06 2001-11-20 The Regents Of The University Of California Mitigation of substrate defects in reticles using multilayer buffer layers
JP4320970B2 (ja) * 2001-04-11 2009-08-26 株式会社ニコン 多層膜反射鏡の製造方法
JP2004273926A (ja) * 2003-03-11 2004-09-30 Canon Inc 露光装置
WO2004109778A1 (ja) * 2003-06-02 2004-12-16 Nikon Corporation 多層膜反射鏡及びｘ線露光装置
JP4095566B2 (ja) * 2003-09-05 2008-06-04 キヤノン株式会社 光学素子を評価する方法
JP2005308629A (ja) * 2004-04-23 2005-11-04 Canon Inc ミラーユニット及びそれの製造方法

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06186418A (ja) * 1992-06-30 1994-07-08 Victor Co Of Japan Ltd ダイクロイックミラーの製造方法

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008109060A (ja) * 2005-11-10 2008-05-08 Asahi Glass Co Ltd Ｅｕｖリソグラフィ用反射型マスクブランクの多層反射膜を成膜する方法、ならびにｅｕｖリソグラフィ用反射型マスクブランクの製造方法
JP2017506363A (ja) * 2014-01-30 2017-03-02 カール・ツァイス・エスエムティー・ゲーエムベーハー ミラー素子を製造する方法
US10423073B2 (en) 2014-01-30 2019-09-24 Carl Zeiss Smt Gmbh Method for producing a mirror element
JP2017126062A (ja) * 2015-12-16 2017-07-20 カール・ツァイス・エスエムティー・ゲーエムベーハー 特にマイクロリソグラフィ投影露光装置用のミラー素子

Also Published As

Publication number Publication date
US20070188870A1 (en) 2007-08-16
EP1775604B1 (en) 2015-04-29
EP1775604A1 (en) 2007-04-18
US7543948B2 (en) 2009-06-09

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