JP2007012954A5 - - Google Patents

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Publication number
JP2007012954A5
JP2007012954A5 JP2005193326A JP2005193326A JP2007012954A5 JP 2007012954 A5 JP2007012954 A5 JP 2007012954A5 JP 2005193326 A JP2005193326 A JP 2005193326A JP 2005193326 A JP2005193326 A JP 2005193326A JP 2007012954 A5 JP2007012954 A5 JP 2007012954A5
Authority
JP
Japan
Prior art keywords
exposed
liquid
contact angle
body side
exposure apparatus
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2005193326A
Other languages
English (en)
Japanese (ja)
Other versions
JP2007012954A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP2005193326A priority Critical patent/JP2007012954A/ja
Priority claimed from JP2005193326A external-priority patent/JP2007012954A/ja
Publication of JP2007012954A publication Critical patent/JP2007012954A/ja
Publication of JP2007012954A5 publication Critical patent/JP2007012954A5/ja
Pending legal-status Critical Current

Links

JP2005193326A 2005-07-01 2005-07-01 露光装置 Pending JP2007012954A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2005193326A JP2007012954A (ja) 2005-07-01 2005-07-01 露光装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005193326A JP2007012954A (ja) 2005-07-01 2005-07-01 露光装置

Publications (2)

Publication Number Publication Date
JP2007012954A JP2007012954A (ja) 2007-01-18
JP2007012954A5 true JP2007012954A5 (enExample) 2008-08-14

Family

ID=37751040

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2005193326A Pending JP2007012954A (ja) 2005-07-01 2005-07-01 露光装置

Country Status (1)

Country Link
JP (1) JP2007012954A (enExample)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2521163A1 (en) * 2009-12-28 2012-11-07 Nikon Corporation Liquid immersion member, method for manufacturing liquid immersion member, exposure apparatus, and device manufacturing method
EP2381310B1 (en) 2010-04-22 2015-05-06 ASML Netherlands BV Fluid handling structure and lithographic apparatus
NL2009472A (en) * 2011-10-24 2013-04-25 Asml Netherlands Bv A fluid handling structure, a lithographic apparatus and a device manufacturing method.

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4595320B2 (ja) * 2002-12-10 2010-12-08 株式会社ニコン 露光装置、及びデバイス製造方法
JP4352930B2 (ja) * 2003-02-26 2009-10-28 株式会社ニコン 露光装置、露光方法及びデバイス製造方法
EP1491956B1 (en) * 2003-06-27 2006-09-06 ASML Netherlands B.V. Lithographic apparatus and device manufacturing method
WO2005006415A1 (ja) * 2003-07-09 2005-01-20 Nikon Corporation 露光装置及びデバイス製造方法
JP4729876B2 (ja) * 2003-07-09 2011-07-20 株式会社ニコン 露光装置、露光方法、並びにデバイス製造方法
JP4295712B2 (ja) * 2003-11-14 2009-07-15 エーエスエムエル ネザーランズ ビー．ブイ． リソグラフィ装置及び装置製造方法
JP4797984B2 (ja) * 2004-02-19 2011-10-19 株式会社ニコン 露光装置及びデバイス製造方法
JP4622340B2 (ja) * 2004-03-04 2011-02-02 株式会社ニコン 露光装置、デバイス製造方法
KR101504445B1 (ko) * 2004-03-25 2015-03-19 가부시키가이샤 니콘 노광 장치 및 디바이스 제조 방법
JP4543767B2 (ja) * 2004-06-10 2010-09-15 株式会社ニコン 露光装置及びデバイス製造方法
JP2006310827A (ja) * 2005-03-31 2006-11-09 Nikon Corp 露光装置、露光方法、及びデバイス製造方法

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