JP2007007845A5 - - Google Patents
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- Publication number
- JP2007007845A5 JP2007007845A5 JP2006147338A JP2006147338A JP2007007845A5 JP 2007007845 A5 JP2007007845 A5 JP 2007007845A5 JP 2006147338 A JP2006147338 A JP 2006147338A JP 2006147338 A JP2006147338 A JP 2006147338A JP 2007007845 A5 JP2007007845 A5 JP 2007007845A5
- Authority
- JP
- Japan
- Prior art keywords
- layer
- polycrystalline silicon
- silicon
- microstructure
- forming
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 229910021420 polycrystalline silicon Inorganic materials 0.000 claims 29
- 229910021417 amorphous silicon Inorganic materials 0.000 claims 15
- 239000002184 metal Substances 0.000 claims 13
- 229910052751 metal Inorganic materials 0.000 claims 13
- 238000005530 etching Methods 0.000 claims 6
- 238000000034 method Methods 0.000 claims 6
- 238000004519 manufacturing process Methods 0.000 claims 5
- 238000002425 crystallisation Methods 0.000 claims 3
- 230000008025 crystallization Effects 0.000 claims 3
- 229910052581 Si3N4 Inorganic materials 0.000 claims 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims 2
- 150000002736 metal compounds Chemical class 0.000 claims 2
- 229910052710 silicon Inorganic materials 0.000 claims 2
- 239000010703 silicon Substances 0.000 claims 2
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 claims 2
- 229910052814 silicon oxide Inorganic materials 0.000 claims 2
- 239000003795 chemical substances by application Substances 0.000 claims 1
- 229910052802 copper Inorganic materials 0.000 claims 1
- 229910052737 gold Inorganic materials 0.000 claims 1
- 229910052741 iridium Inorganic materials 0.000 claims 1
- 229910052742 iron Inorganic materials 0.000 claims 1
- 238000005499 laser crystallization Methods 0.000 claims 1
- 229910052759 nickel Inorganic materials 0.000 claims 1
- 229910052762 osmium Inorganic materials 0.000 claims 1
- 229910052763 palladium Inorganic materials 0.000 claims 1
- 229910052697 platinum Inorganic materials 0.000 claims 1
- 229910052703 rhodium Inorganic materials 0.000 claims 1
- 229910052707 ruthenium Inorganic materials 0.000 claims 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2006147338A JP5084175B2 (ja) | 2005-05-31 | 2006-05-26 | 微小構造体、およびその作製方法 |
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2005160608 | 2005-05-31 | ||
| JP2005160608 | 2005-05-31 | ||
| JP2006147338A JP5084175B2 (ja) | 2005-05-31 | 2006-05-26 | 微小構造体、およびその作製方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2007007845A JP2007007845A (ja) | 2007-01-18 |
| JP2007007845A5 true JP2007007845A5 (https=) | 2009-05-07 |
| JP5084175B2 JP5084175B2 (ja) | 2012-11-28 |
Family
ID=37746962
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2006147338A Expired - Fee Related JP5084175B2 (ja) | 2005-05-31 | 2006-05-26 | 微小構造体、およびその作製方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP5084175B2 (https=) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP1837304A3 (en) | 2006-03-20 | 2012-04-18 | Semiconductor Energy Laboratory Co., Ltd. | Micromachine including a mechanical structure connected to an electrical circuit and method for manufacturing the same |
| US7642114B2 (en) | 2006-07-19 | 2010-01-05 | Semiconductor Energy Laboratory Co., Ltd. | Micro electro mechanical device and manufacturing method thereof |
| DE102007022715A1 (de) * | 2007-05-15 | 2008-07-10 | Siemens Ag | Presse |
Family Cites Families (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2791858B2 (ja) * | 1993-06-25 | 1998-08-27 | 株式会社半導体エネルギー研究所 | 半導体装置作製方法 |
| JPH097946A (ja) * | 1995-06-26 | 1997-01-10 | Toyota Motor Corp | 多結晶シリコン膜の製造方法 |
| JPH09246569A (ja) * | 1996-03-04 | 1997-09-19 | Toyota Motor Corp | シリコン構造体の製造方法とシリコン構造体およびシリコン構造体を備えた加速度センサ |
| JP3566809B2 (ja) * | 1996-08-12 | 2004-09-15 | 株式会社豊田中央研究所 | 多結晶シリコン薄膜の製造方法および多結晶シリコン薄膜構造体素子 |
| JPH1062447A (ja) * | 1996-08-19 | 1998-03-06 | Hitachi Ltd | 半導体加速度センサおよびその製造方法 |
| JPH10214978A (ja) * | 1997-01-30 | 1998-08-11 | Aisin Seiki Co Ltd | 半導体マイクロマシン及びその製造方法 |
| JP3592535B2 (ja) * | 1998-07-16 | 2004-11-24 | 株式会社半導体エネルギー研究所 | 半導体装置の作製方法 |
| US6930364B2 (en) * | 2001-09-13 | 2005-08-16 | Silicon Light Machines Corporation | Microelectronic mechanical system and methods |
| US7128783B2 (en) * | 2002-04-23 | 2006-10-31 | Sharp Laboratories Of America, Inc. | Thin-film crystal-structure-processed mechanical devices, and methods and systems for making |
| JP2004066606A (ja) * | 2002-08-06 | 2004-03-04 | Ricoh Co Ltd | 液滴吐出ヘッド及びその製造方法並びにインクジェット記録装置 |
| JP2004177357A (ja) * | 2002-11-29 | 2004-06-24 | Hitachi Metals Ltd | 半導体加速度センサ |
| JP4114552B2 (ja) * | 2003-06-10 | 2008-07-09 | ソニー株式会社 | マイクロマシンの製造方法 |
| JP4519804B2 (ja) * | 2005-05-27 | 2010-08-04 | 株式会社半導体エネルギー研究所 | 半導体装置の作製方法 |
-
2006
- 2006-05-26 JP JP2006147338A patent/JP5084175B2/ja not_active Expired - Fee Related
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