JP2006515114A5 - - Google Patents

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Publication number
JP2006515114A5
JP2006515114A5 JP2004571185A JP2004571185A JP2006515114A5 JP 2006515114 A5 JP2006515114 A5 JP 2006515114A5 JP 2004571185 A JP2004571185 A JP 2004571185A JP 2004571185 A JP2004571185 A JP 2004571185A JP 2006515114 A5 JP2006515114 A5 JP 2006515114A5
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JP
Japan
Prior art keywords
next process
process state
workpieces
processed
estimating
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JP2004571185A
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English (en)
Japanese (ja)
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JP2006515114A (ja
JP4745668B2 (ja
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Priority claimed from US10/406,675 external-priority patent/US6766214B1/en
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Publication of JP2006515114A publication Critical patent/JP2006515114A/ja
Publication of JP2006515114A5 publication Critical patent/JP2006515114A5/ja
Application granted granted Critical
Publication of JP4745668B2 publication Critical patent/JP4745668B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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JP2004571185A 2003-04-03 2003-12-22 状態推定結果に基づきサンプリングレートを調整する方法 Expired - Fee Related JP4745668B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US10/406,675 US6766214B1 (en) 2003-04-03 2003-04-03 Adjusting a sampling rate based on state estimation results
US10/406,675 2003-04-03
PCT/US2003/041177 WO2004095154A1 (en) 2003-04-03 2003-12-22 Adjusting a sampling rate based on state estimation results

Publications (3)

Publication Number Publication Date
JP2006515114A JP2006515114A (ja) 2006-05-18
JP2006515114A5 true JP2006515114A5 (enExample) 2007-02-15
JP4745668B2 JP4745668B2 (ja) 2011-08-10

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ID=32681863

Family Applications (1)

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JP2004571185A Expired - Fee Related JP4745668B2 (ja) 2003-04-03 2003-12-22 状態推定結果に基づきサンプリングレートを調整する方法

Country Status (9)

Country Link
US (1) US6766214B1 (enExample)
JP (1) JP4745668B2 (enExample)
KR (1) KR101113203B1 (enExample)
CN (1) CN100498615C (enExample)
AU (1) AU2003300341A1 (enExample)
DE (1) DE10394223B4 (enExample)
GB (1) GB2416045B (enExample)
TW (1) TWI330323B (enExample)
WO (1) WO2004095154A1 (enExample)

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US7962440B2 (en) * 2007-09-27 2011-06-14 Rockwell Automation Technologies, Inc. Adaptive industrial systems via embedded historian data
US7809656B2 (en) * 2007-09-27 2010-10-05 Rockwell Automation Technologies, Inc. Microhistorians as proxies for data transfer
US7882218B2 (en) * 2007-09-27 2011-02-01 Rockwell Automation Technologies, Inc. Platform independent historian
US20090089671A1 (en) * 2007-09-28 2009-04-02 Rockwell Automation Technologies, Inc. Programmable controller programming with embedded macro capability
JP2009224374A (ja) * 2008-03-13 2009-10-01 Oki Semiconductor Co Ltd Ｐｅｂ装置及びその制御方法
CN101872714B (zh) * 2009-04-24 2012-06-20 中芯国际集成电路制造(上海)有限公司 晶圆在线检测方法及系统
NL2004887A (en) * 2009-06-24 2010-12-27 Asml Netherlands Bv Method for selecting sample positions on a substrate, method for providing a representation of a model of properties of a substrate, method of providing a representation of the variation of properties of a substrate across the substrate and device manufacturing method.
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US9588441B2 (en) * 2012-05-18 2017-03-07 Kla-Tencor Corporation Method and device for using substrate geometry to determine optimum substrate analysis sampling
CN103887203A (zh) * 2014-03-24 2014-06-25 上海华力微电子有限公司 一种扫描机台程式使用浮动阈值进行晶圆检测的方法
TWI607825B (zh) * 2016-11-29 2017-12-11 財團法人工業技術研究院 自動化加工程式切削力優化系統及方法
EP3709110A1 (de) * 2019-03-14 2020-09-16 GKN Sinter Metals Engineering GmbH Verfahren zur steuerung eines produktionsprozesses zur herstellung von bauteilen
EP3783448B1 (de) * 2019-08-19 2025-10-22 GKN Sinter Metals Engineering GmbH Verfahren zur prüfung eines produktionsprozesses zur herstellung von bauteilen
EP3848767B1 (de) * 2020-01-13 2023-11-01 Hexagon Technology Center GmbH Verfahren zur qualitätskontrolle von werkstücken sowie koordinatenmessgerät und computerprogramm
CN114305368B (zh) * 2020-09-27 2025-05-20 深圳海翼智新科技有限公司 心率监测方法、装置及设备

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