JP2006337631A - 検査方法及びこれを用いた液晶表示装置の製造方法 - Google Patents

検査方法及びこれを用いた液晶表示装置の製造方法 Download PDF

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Publication number
JP2006337631A
JP2006337631A JP2005161038A JP2005161038A JP2006337631A JP 2006337631 A JP2006337631 A JP 2006337631A JP 2005161038 A JP2005161038 A JP 2005161038A JP 2005161038 A JP2005161038 A JP 2005161038A JP 2006337631 A JP2006337631 A JP 2006337631A
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JP
Japan
Prior art keywords
pattern
region
seam
accuracy
exposure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2005161038A
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English (en)
Japanese (ja)
Inventor
Toshihiro Yamashita
敏広 山下
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP2005161038A priority Critical patent/JP2006337631A/ja
Priority to SG200601991A priority patent/SG127790A1/en
Priority to TW095110674A priority patent/TW200643582A/zh
Priority to CNA2006100792720A priority patent/CN1873538A/zh
Priority to KR1020060046934A priority patent/KR100812322B1/ko
Publication of JP2006337631A publication Critical patent/JP2006337631A/ja
Pending legal-status Critical Current

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    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/1303—Apparatus specially adapted to the manufacture of LCDs
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/1306—Details
    • G02F1/1309—Repairing; Testing
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133514—Colour filters
    • G02F1/133516—Methods for their manufacture, e.g. printing, electro-deposition or photolithography
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/133354—Arrangements for aligning or assembling substrates

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  • Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Optics & Photonics (AREA)
  • Manufacturing & Machinery (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Mathematical Physics (AREA)
  • Liquid Crystal (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)
JP2005161038A 2005-06-01 2005-06-01 検査方法及びこれを用いた液晶表示装置の製造方法 Pending JP2006337631A (ja)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP2005161038A JP2006337631A (ja) 2005-06-01 2005-06-01 検査方法及びこれを用いた液晶表示装置の製造方法
SG200601991A SG127790A1 (en) 2005-06-01 2006-03-24 Inspection method, and manufacturing method for liquid crystal display using inspection method
TW095110674A TW200643582A (en) 2005-06-01 2006-03-28 Inspection method, and manufacturing method for liquid crystal display using inspection method
CNA2006100792720A CN1873538A (zh) 2005-06-01 2006-04-25 检查方法及采用该检查方法的液晶显示装置的制造方法
KR1020060046934A KR100812322B1 (ko) 2005-06-01 2006-05-25 검사 방법 및 이것을 사용한 액정표시장치의 제조 방법

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005161038A JP2006337631A (ja) 2005-06-01 2005-06-01 検査方法及びこれを用いた液晶表示装置の製造方法

Publications (1)

Publication Number Publication Date
JP2006337631A true JP2006337631A (ja) 2006-12-14

Family

ID=37484041

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2005161038A Pending JP2006337631A (ja) 2005-06-01 2005-06-01 検査方法及びこれを用いた液晶表示装置の製造方法

Country Status (5)

Country Link
JP (1) JP2006337631A (ko)
KR (1) KR100812322B1 (ko)
CN (1) CN1873538A (ko)
SG (1) SG127790A1 (ko)
TW (1) TW200643582A (ko)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100911331B1 (ko) * 2008-12-30 2009-08-07 주식회사 탑 엔지니어링 어레이 테스트 장치 및 상기 어레이 테스트 장치의 기판 일지점 위치 측정 방법
KR100911330B1 (ko) * 2008-12-30 2009-08-07 주식회사 탑 엔지니어링 어레이 테스트 장치와, 상기 어레이 테스트 장치의 기판 일지점 위치 측정 방법과, 카메라 어셈블리에 촬상된 특정 위치좌표 측정 방법
CN102243382B (zh) * 2010-05-13 2014-12-31 上海天马微电子有限公司 液晶显示装置及其制作方法、检测及改善装置
TWI613494B (zh) 2016-08-23 2018-02-01 友達光電股份有限公司 標記畫素單元、應用其之顯示裝置以及製作顯示裝置的方法
CN109856930B (zh) * 2017-11-30 2021-05-25 京东方科技集团股份有限公司 对准标记、基板及其制作方法、曝光对准方法

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6077756A (en) * 1998-04-24 2000-06-20 Vanguard International Semiconductor Overlay target pattern and algorithm for layer-to-layer overlay metrology for semiconductor processing
JP2000277425A (ja) * 1999-03-26 2000-10-06 Nec Corp 電子線描画方法とその装置
JP3348783B2 (ja) * 1999-07-28 2002-11-20 日本電気株式会社 重ね合わせ用マーク及び半導体装置
JP4635354B2 (ja) * 2001-03-07 2011-02-23 株式会社ニコン 露光方法及び継ぎ誤差計測方法並びにデバイス製造方法
ATE286284T1 (de) * 2001-05-14 2005-01-15 Infineon Technologies Ag Verfahren zu durchführung einer ausrichtungsmessung von zwei mustern in unterschiedlichen schichten eines halbleiterwafers
US7190823B2 (en) * 2002-03-17 2007-03-13 United Microelectronics Corp. Overlay vernier pattern for measuring multi-layer overlay alignment accuracy and method for measuring the same

Also Published As

Publication number Publication date
TW200643582A (en) 2006-12-16
CN1873538A (zh) 2006-12-06
KR100812322B1 (ko) 2008-03-10
SG127790A1 (en) 2006-12-29
KR20060125476A (ko) 2006-12-06

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