SG127790A1 - Inspection method, and manufacturing method for liquid crystal display using inspection method - Google Patents

Inspection method, and manufacturing method for liquid crystal display using inspection method

Info

Publication number
SG127790A1
SG127790A1 SG200601991A SG200601991A SG127790A1 SG 127790 A1 SG127790 A1 SG 127790A1 SG 200601991 A SG200601991 A SG 200601991A SG 200601991 A SG200601991 A SG 200601991A SG 127790 A1 SG127790 A1 SG 127790A1
Authority
SG
Singapore
Prior art keywords
inspection method
pattern element
region
joints
accuracy
Prior art date
Application number
SG200601991A
Other languages
English (en)
Inventor
Toshihiro Yamashita
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Publication of SG127790A1 publication Critical patent/SG127790A1/en

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/1303—Apparatus specially adapted to the manufacture of LCDs
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/1306—Details
    • G02F1/1309—Repairing; Testing
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133514—Colour filters
    • G02F1/133516—Methods for their manufacture, e.g. printing, electro-deposition or photolithography
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/133354—Arrangements for aligning or assembling substrates

Landscapes

  • Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Optics & Photonics (AREA)
  • Manufacturing & Machinery (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Mathematical Physics (AREA)
  • Liquid Crystal (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)
SG200601991A 2005-06-01 2006-03-24 Inspection method, and manufacturing method for liquid crystal display using inspection method SG127790A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005161038A JP2006337631A (ja) 2005-06-01 2005-06-01 検査方法及びこれを用いた液晶表示装置の製造方法

Publications (1)

Publication Number Publication Date
SG127790A1 true SG127790A1 (en) 2006-12-29

Family

ID=37484041

Family Applications (1)

Application Number Title Priority Date Filing Date
SG200601991A SG127790A1 (en) 2005-06-01 2006-03-24 Inspection method, and manufacturing method for liquid crystal display using inspection method

Country Status (5)

Country Link
JP (1) JP2006337631A (ko)
KR (1) KR100812322B1 (ko)
CN (1) CN1873538A (ko)
SG (1) SG127790A1 (ko)
TW (1) TW200643582A (ko)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100911331B1 (ko) * 2008-12-30 2009-08-07 주식회사 탑 엔지니어링 어레이 테스트 장치 및 상기 어레이 테스트 장치의 기판 일지점 위치 측정 방법
KR100911330B1 (ko) * 2008-12-30 2009-08-07 주식회사 탑 엔지니어링 어레이 테스트 장치와, 상기 어레이 테스트 장치의 기판 일지점 위치 측정 방법과, 카메라 어셈블리에 촬상된 특정 위치좌표 측정 방법
CN102243382B (zh) * 2010-05-13 2014-12-31 上海天马微电子有限公司 液晶显示装置及其制作方法、检测及改善装置
TWI613494B (zh) 2016-08-23 2018-02-01 友達光電股份有限公司 標記畫素單元、應用其之顯示裝置以及製作顯示裝置的方法
CN109856930B (zh) * 2017-11-30 2021-05-25 京东方科技集团股份有限公司 对准标记、基板及其制作方法、曝光对准方法

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6077756A (en) * 1998-04-24 2000-06-20 Vanguard International Semiconductor Overlay target pattern and algorithm for layer-to-layer overlay metrology for semiconductor processing
US20030174879A1 (en) * 2002-03-17 2003-09-18 Tzu-Ching Chen Overlay vernier pattern for measuring multi-layer overlay alignment accuracy and method for measuring the same
US6801313B1 (en) * 1999-07-28 2004-10-05 Nec Electronics Corporation Overlay mark, method of measuring overlay accuracy, method of making alignment and semiconductor device therewith
EP1258834B1 (en) * 2001-05-14 2004-12-29 Infineon Technologies AG Method for performing an alignment measurement of two patterns in different layers on a semiconductor wafer

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000277425A (ja) * 1999-03-26 2000-10-06 Nec Corp 電子線描画方法とその装置
JP4635354B2 (ja) * 2001-03-07 2011-02-23 株式会社ニコン 露光方法及び継ぎ誤差計測方法並びにデバイス製造方法

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6077756A (en) * 1998-04-24 2000-06-20 Vanguard International Semiconductor Overlay target pattern and algorithm for layer-to-layer overlay metrology for semiconductor processing
US6801313B1 (en) * 1999-07-28 2004-10-05 Nec Electronics Corporation Overlay mark, method of measuring overlay accuracy, method of making alignment and semiconductor device therewith
EP1258834B1 (en) * 2001-05-14 2004-12-29 Infineon Technologies AG Method for performing an alignment measurement of two patterns in different layers on a semiconductor wafer
US20030174879A1 (en) * 2002-03-17 2003-09-18 Tzu-Ching Chen Overlay vernier pattern for measuring multi-layer overlay alignment accuracy and method for measuring the same

Also Published As

Publication number Publication date
TW200643582A (en) 2006-12-16
JP2006337631A (ja) 2006-12-14
CN1873538A (zh) 2006-12-06
KR100812322B1 (ko) 2008-03-10
KR20060125476A (ko) 2006-12-06

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