TW200737295A - Method for detecting semiconductor manufacturing conditions - Google Patents
Method for detecting semiconductor manufacturing conditionsInfo
- Publication number
- TW200737295A TW200737295A TW095109327A TW95109327A TW200737295A TW 200737295 A TW200737295 A TW 200737295A TW 095109327 A TW095109327 A TW 095109327A TW 95109327 A TW95109327 A TW 95109327A TW 200737295 A TW200737295 A TW 200737295A
- Authority
- TW
- Taiwan
- Prior art keywords
- manufacturing conditions
- pattern areas
- pitches
- semiconductor manufacturing
- detecting semiconductor
- Prior art date
Links
Landscapes
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
Abstract
A method for detecting semiconductor-manufacturing conditions includes providing a photomask with a plurality of pattern areas each having a plurality of test lines with different pitches, exposing a plurality of wafer with the photomask in different manufacturing conditions, measuring the critical dimensions of the plurality of pattern areas, generating a library of relationships between the pitches and the critical dimension of the pattern areas, exposing a test wafer in an unknown manufacturing condition, finding out a relationships between the pitches and the critical dimension of the pattern areas of the test wafer, searching for a most similar relationship in the library, and detecting a set of manufacturing parameters used to expose the test wafer.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
TW95109327A TWI294141B (en) | 2006-03-17 | 2006-03-17 | Method for detecting semiconductor manufacturing conditions |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
TW95109327A TWI294141B (en) | 2006-03-17 | 2006-03-17 | Method for detecting semiconductor manufacturing conditions |
Publications (2)
Publication Number | Publication Date |
---|---|
TW200737295A true TW200737295A (en) | 2007-10-01 |
TWI294141B TWI294141B (en) | 2008-03-01 |
Family
ID=45068071
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW95109327A TWI294141B (en) | 2006-03-17 | 2006-03-17 | Method for detecting semiconductor manufacturing conditions |
Country Status (1)
Country | Link |
---|---|
TW (1) | TWI294141B (en) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8830447B2 (en) | 2009-05-12 | 2014-09-09 | Asml Netherlands B.V. | Inspection method for lithography |
TWI488245B (en) * | 2009-05-19 | 2015-06-11 | United Microelectronics Corp | Method for inspecting photoresist pattern |
US9182682B2 (en) | 2008-12-30 | 2015-11-10 | Asml Netherlands B.V. | Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method |
CN112038249A (en) * | 2020-08-27 | 2020-12-04 | 上海华力集成电路制造有限公司 | Method for detecting abnormal process of photoetching process |
TWI750303B (en) * | 2017-01-24 | 2021-12-21 | 美商蘭姆研究公司 | Virtual metrology systems and methods for using feedforward critical dimension data to predict other critical dimensions of a wafer |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TW201409012A (en) * | 2012-08-20 | 2014-03-01 | Fittech Co Ltd | Inspection method |
-
2006
- 2006-03-17 TW TW95109327A patent/TWI294141B/en active
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US9182682B2 (en) | 2008-12-30 | 2015-11-10 | Asml Netherlands B.V. | Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method |
US8830447B2 (en) | 2009-05-12 | 2014-09-09 | Asml Netherlands B.V. | Inspection method for lithography |
TWI553427B (en) * | 2009-05-12 | 2016-10-11 | Asml荷蘭公司 | Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method |
TWI488245B (en) * | 2009-05-19 | 2015-06-11 | United Microelectronics Corp | Method for inspecting photoresist pattern |
TWI750303B (en) * | 2017-01-24 | 2021-12-21 | 美商蘭姆研究公司 | Virtual metrology systems and methods for using feedforward critical dimension data to predict other critical dimensions of a wafer |
CN112038249A (en) * | 2020-08-27 | 2020-12-04 | 上海华力集成电路制造有限公司 | Method for detecting abnormal process of photoetching process |
Also Published As
Publication number | Publication date |
---|---|
TWI294141B (en) | 2008-03-01 |
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