JP2006269941A - 導光装置、露光装置、並びにデバイス製造方法 - Google Patents

導光装置、露光装置、並びにデバイス製造方法 Download PDF

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Publication number
JP2006269941A
JP2006269941A JP2005088933A JP2005088933A JP2006269941A JP 2006269941 A JP2006269941 A JP 2006269941A JP 2005088933 A JP2005088933 A JP 2005088933A JP 2005088933 A JP2005088933 A JP 2005088933A JP 2006269941 A JP2006269941 A JP 2006269941A
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JP
Japan
Prior art keywords
optical
light
temperature
light guide
optical member
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP2005088933A
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English (en)
Japanese (ja)
Other versions
JP2006269941A5 (enExample
Inventor
Mitsuru Hiura
充 樋浦
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2005088933A priority Critical patent/JP2006269941A/ja
Priority to EP06006019A priority patent/EP1705521A3/en
Priority to US11/387,683 priority patent/US7295285B2/en
Publication of JP2006269941A publication Critical patent/JP2006269941A/ja
Publication of JP2006269941A5 publication Critical patent/JP2006269941A5/ja
Withdrawn legal-status Critical Current

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70883—Environment aspects, e.g. pressure of beam-path gas, temperature of optical system
    • G03F7/70891—Temperature
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70916—Pollution mitigation, i.e. mitigating effect of contamination or debris, e.g. foil traps

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  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Toxicology (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2005088933A 2005-03-25 2005-03-25 導光装置、露光装置、並びにデバイス製造方法 Withdrawn JP2006269941A (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2005088933A JP2006269941A (ja) 2005-03-25 2005-03-25 導光装置、露光装置、並びにデバイス製造方法
EP06006019A EP1705521A3 (en) 2005-03-25 2006-03-23 Exposure apparatus and device manufacturing method
US11/387,683 US7295285B2 (en) 2005-03-25 2006-03-24 Exposure apparatus and device manufacturing method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005088933A JP2006269941A (ja) 2005-03-25 2005-03-25 導光装置、露光装置、並びにデバイス製造方法

Publications (2)

Publication Number Publication Date
JP2006269941A true JP2006269941A (ja) 2006-10-05
JP2006269941A5 JP2006269941A5 (enExample) 2008-05-08

Family

ID=36649049

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2005088933A Withdrawn JP2006269941A (ja) 2005-03-25 2005-03-25 導光装置、露光装置、並びにデバイス製造方法

Country Status (3)

Country Link
US (1) US7295285B2 (enExample)
EP (1) EP1705521A3 (enExample)
JP (1) JP2006269941A (enExample)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009295800A (ja) * 2008-06-05 2009-12-17 Komatsu Ltd Ｅｕｖ光発生装置における集光ミラーのクリーニング方法および装置
JP2010506423A (ja) * 2006-10-10 2010-02-25 エーエスエムエル ネザーランズ ビー．ブイ． クリーニング方法、装置およびクリーニングシステム
JP2015018918A (ja) * 2013-07-10 2015-01-29 キヤノン株式会社 反射型原版、露光方法及びデバイス製造方法

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006269941A (ja) 2005-03-25 2006-10-05 Canon Inc 導光装置、露光装置、並びにデバイス製造方法
US20070291361A1 (en) * 2006-06-19 2007-12-20 Credence Systems Corporation Lens housing with integrated thermal management
JP2009081304A (ja) * 2007-09-26 2009-04-16 Canon Inc 投影光学系、露光装置及びデバイス製造方法
DE102009045223A1 (de) * 2009-09-30 2011-03-31 Carl Zeiss Smt Gmbh Optische Anordnung in einer Projektionsbelichtungsanlage für die EUV-Lithographie
JP5648551B2 (ja) * 2011-03-18 2015-01-07 株式会社リコー エッジ検出装置及びそれを備えた画像形成装置
DE102020206697B4 (de) * 2020-05-28 2025-05-22 Carl Zeiss Smt Gmbh Vorrichtung und Verfahren zum Temperieren von Elementen in mikrolithographischen Projektionsbelichtungsanlagen

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH09115799A (ja) * 1995-10-16 1997-05-02 Nikon Corp 走査型露光装置
JP2001143992A (ja) * 1999-11-12 2001-05-25 Nikon Corp 露光量制御装置、露光量制御方法、露光装置及び露光方法
JP2002050559A (ja) * 2000-08-01 2002-02-15 Canon Inc 露光装置及びそれを用いたデバイスの製造方法
JP2003303751A (ja) * 2002-04-05 2003-10-24 Canon Inc 投影光学系、該投影光学系を有する露光装置及び方法
JP3944008B2 (ja) * 2002-06-28 2007-07-11 キヤノン株式会社 反射ミラー装置及び露光装置及びデバイス製造方法
JP2004193468A (ja) 2002-12-13 2004-07-08 Canon Inc 露光装置
JP4458323B2 (ja) * 2003-02-13 2010-04-28 キヤノン株式会社 保持装置、当該保持装置を有する露光装置、及びデバイス製造方法
JP4458333B2 (ja) * 2003-02-13 2010-04-28 キヤノン株式会社 露光装置、およびデバイスの製造方法
US6992306B2 (en) * 2003-04-15 2006-01-31 Canon Kabushiki Kaisha Temperature adjustment apparatus, exposure apparatus having the same, and device fabricating method
JP2004363559A (ja) * 2003-05-14 2004-12-24 Canon Inc 光学部材保持装置
JP2006269941A (ja) 2005-03-25 2006-10-05 Canon Inc 導光装置、露光装置、並びにデバイス製造方法

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010506423A (ja) * 2006-10-10 2010-02-25 エーエスエムエル ネザーランズ ビー．ブイ． クリーニング方法、装置およびクリーニングシステム
JP2009295800A (ja) * 2008-06-05 2009-12-17 Komatsu Ltd Ｅｕｖ光発生装置における集光ミラーのクリーニング方法および装置
US8536550B2 (en) 2008-06-05 2013-09-17 Gigaphoton Inc. Method and apparatus for cleaning collector mirror in EUV light generator
JP2015018918A (ja) * 2013-07-10 2015-01-29 キヤノン株式会社 反射型原版、露光方法及びデバイス製造方法

Also Published As

Publication number Publication date
US20060214118A1 (en) 2006-09-28
US7295285B2 (en) 2007-11-13
EP1705521A3 (en) 2009-09-30
EP1705521A2 (en) 2006-09-27

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