JP2006261608A5 - - Google Patents

Download PDF

Info

Publication number
JP2006261608A5
JP2006261608A5 JP2005080595A JP2005080595A JP2006261608A5 JP 2006261608 A5 JP2006261608 A5 JP 2006261608A5 JP 2005080595 A JP2005080595 A JP 2005080595A JP 2005080595 A JP2005080595 A JP 2005080595A JP 2006261608 A5 JP2006261608 A5 JP 2006261608A5
Authority
JP
Japan
Prior art keywords
manufacturing apparatus
device manufacturing
chamber
load lock
pressure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP2005080595A
Other languages
English (en)
Japanese (ja)
Other versions
JP2006261608A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP2005080595A priority Critical patent/JP2006261608A/ja
Priority claimed from JP2005080595A external-priority patent/JP2006261608A/ja
Priority to US11/376,240 priority patent/US20060207680A1/en
Publication of JP2006261608A publication Critical patent/JP2006261608A/ja
Publication of JP2006261608A5 publication Critical patent/JP2006261608A5/ja
Withdrawn legal-status Critical Current

Links

JP2005080595A 2005-03-18 2005-03-18 デバイス製造装置及び制御方法 Withdrawn JP2006261608A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2005080595A JP2006261608A (ja) 2005-03-18 2005-03-18 デバイス製造装置及び制御方法
US11/376,240 US20060207680A1 (en) 2005-03-18 2006-03-16 Device manufacturing apparatus and method of controlling same

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005080595A JP2006261608A (ja) 2005-03-18 2005-03-18 デバイス製造装置及び制御方法

Publications (2)

Publication Number Publication Date
JP2006261608A JP2006261608A (ja) 2006-09-28
JP2006261608A5 true JP2006261608A5 (enExample) 2008-05-08

Family

ID=37009066

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2005080595A Withdrawn JP2006261608A (ja) 2005-03-18 2005-03-18 デバイス製造装置及び制御方法

Country Status (2)

Country Link
US (1) US20060207680A1 (enExample)
JP (1) JP2006261608A (enExample)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4963678B2 (ja) * 2007-04-06 2012-06-27 キヤノン株式会社 雰囲気置換方法
JP2011091160A (ja) * 2009-10-21 2011-05-06 Ulvac Japan Ltd 基板搬送装置及び基板処理装置
JP5597433B2 (ja) * 2010-04-16 2014-10-01 株式会社日立ハイテクノロジーズ 真空処理装置
JP5617708B2 (ja) * 2011-03-16 2014-11-05 東京エレクトロン株式会社 蓋体開閉装置
KR20180045316A (ko) * 2016-10-25 2018-05-04 삼성전자주식회사 설비 전방 단부 모듈 및 이를 포함하는 반도체 제조 장치
US10388547B2 (en) * 2017-06-23 2019-08-20 Applied Materials, Inc. Side storage pods, equipment front end modules, and methods for processing substrates
KR102360219B1 (ko) 2017-06-23 2022-02-08 어플라이드 머티어리얼스, 인코포레이티드 인덱서블 측면 저장 포드 장치, 가열식 측면 저장 포드 장치, 시스템들, 및 방법들
JP7812776B2 (ja) * 2022-12-01 2026-02-10 東京エレクトロン株式会社 搬送モジュールおよび搬送方法

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6852194B2 (en) * 2001-05-21 2005-02-08 Tokyo Electron Limited Processing apparatus, transferring apparatus and transferring method
US20030029715A1 (en) * 2001-07-25 2003-02-13 Applied Materials, Inc. An Apparatus For Annealing Substrates In Physical Vapor Deposition Systems
KR100443121B1 (ko) * 2001-11-29 2004-08-04 삼성전자주식회사 반도체 공정의 수행 방법 및 반도체 공정 장치

Similar Documents

Publication Publication Date Title
MY148631A (en) Apparatus and methods for transporting and processing substrates
CN201327292Y (zh) 连续式真空气氛烧结炉
TW200730268A (en) Tunnel washer system with improved cleaning efficiency
TW200705551A (en) Method for forming a high density dielectric film by chemical vapor deposition
TW200644085A (en) A plasma enhanced atomic layer deposition system having reduced contamination
TW200636855A (en) Vertical batch processing apparatus
WO2005079870A3 (fr) Installation de sterilisation d'articles par bombardement electronique
WO2008052164A3 (en) Multi-chamber air distribution support surface product and method
WO2008120294A1 (ja) 搬送装置
WO2007103870A3 (en) Bypass thermal adjuster for vacuum semiconductor processing
JP2009533844A5 (enExample)
WO2009137773A3 (en) Apparatus and methods for hyperbaric rapid thermal processing
WO2009031419A1 (ja) 真空処理システム
USD527751S1 (en) Transfer-chamber
TW200729331A (en) Vacuum processing device
JP2012222156A5 (enExample)
WO2009011166A1 (ja) 真空処理装置および真空処理方法
WO2009060539A1 (ja) インライン型ウェハ搬送装置
ATE371683T1 (de) Polarisierte gegenstände und herstellungsverfahren dafür
JP2004175656A5 (enExample)
JP2008300806A5 (enExample)
WO2007007268A3 (en) Procedure and machine for reconstituting powders of vegetal origin
WO2009034822A1 (ja) 基板処理装置、基板処理装置の汚染抑制方法及び記憶媒体
SG137731A1 (en) Process apparatuses
JP2006310736A5 (enExample)