JP2006173105A - イオン源装置及び方法 - Google Patents
イオン源装置及び方法 Download PDFInfo
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- JP2006173105A JP2006173105A JP2005348578A JP2005348578A JP2006173105A JP 2006173105 A JP2006173105 A JP 2006173105A JP 2005348578 A JP2005348578 A JP 2005348578A JP 2005348578 A JP2005348578 A JP 2005348578A JP 2006173105 A JP2006173105 A JP 2006173105A
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- ion source
- source tube
- tube
- slit opening
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H13/00—Magnetic resonance accelerators; Cyclotrons
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J27/00—Ion beam tubes
- H01J27/02—Ion sources; Ion guns
- H01J27/08—Ion sources; Ion guns using arc discharge
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- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Combustion & Propulsion (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Electron Sources, Ion Sources (AREA)
- Particle Accelerators (AREA)
- Plasma Technology (AREA)
Abstract
【解決手段】イオン源管(300)は、該イオン源管(300)の側面に沿って設けられたスリット開口部(310)を含み、スリット開口部(310)は、0.29mmよりも小さい幅を有する。イオン源管(300)はまた、該イオン源管(300)の端部内に設けられた端部開口部(314)を含む。端部開口部(314)は、イオン源管(300)の内径よりも小さくかつ該イオン源管(300)の中心軸線(316)からスリット開口部(310)の方に0〜1.5mmほど偏位している。イオン源管(300)は、プラズマ放電を収容する空洞(312)を含む。本発明はまた、イオン源管(300)を製作する方法にも関する。
【選択図】 図8
Description
310 スリット開口部
312 空洞
314 端部開口部
316 中心軸線
Claims (10)
- その中でプラズマ放電を持続するイオン源管(300)であって、
前記イオン源管(300)の側面に沿って設けられかつ0.29mmよりも小さい幅を有するスリット開口部(310)と、
前記イオン源管(300)の端部内に設けられ、該イオン源管の内径よりも小さくかつ該イオン源管(300)の中心軸線(316)から前記スリット開口部(310)の方に0〜1.5mmほど偏位した端部開口部(314)と、
プラズマ放電を収容する空洞(312)と、
を含むイオン源管(300)。 - 前記端部開口部(314)が2.5〜5mmの直径を有する、請求項1記載のイオン源管(300)。
- 内蔵形リストリクタ(324)及び前記端部開口部(314)の少なくとも1つにより、プラズマ放電の縁部が前記スリット開口部(310)から0.2〜0.5mm離れた状態になるようにする、請求項1記載のイオン源管(300)。
- 前記スリット開口部(310)が0.15mm〜0.25mmの幅を有する、請求項1記載のイオン源管(300)。
- 前記スリット開口部(310)が約0.2mmの幅を有する、請求項1記載のイオン源管(300)。
- 該イオン源管(300)がワンピース形構造である、請求項1記載のイオン源管(300)。
- 前記空洞(312)の幾何学的形状を変更するために該ワンピース形イオン源管(300)内に挿入するようになったリストリクタリング(500)をさらに含む、請求項6記載のイオン源管(300)。
- 該イオン源管(300)が銅及びタングステンを含む、請求項1記載のイオン源管(300)。
- 前記端部開口部(314)が、該イオン源管(300)の中心軸線(316)から前記スリット開口部(310)の方に0よりも大きいミリメートルほど偏位している、請求項1記載のイオン源管(300)。
- イオン源管を製作する方法であって、
イオン源管(300)の側面に沿って設けられかつ0.29mmよりも小さい幅を有するスリット開口部(310)と、
前記イオン源管(300)の端部内に設けられ、該イオン源管(300)の内径よりも小さくかつ該イオン源管(300)の中心軸線(316)から前記スリット開口部(310)の方に0〜1.5mmほど偏位した端部開口部(314)と、
その中にプラズマ放電を位置させる空洞(312)と、
を含む該イオン源管(300)を成形する段階を含む、
方法。
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US11/012,125 US7122966B2 (en) | 2004-12-16 | 2004-12-16 | Ion source apparatus and method |
US11/012,125 | 2004-12-16 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2006173105A true JP2006173105A (ja) | 2006-06-29 |
JP5079233B2 JP5079233B2 (ja) | 2012-11-21 |
Family
ID=35781241
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2005348578A Expired - Fee Related JP5079233B2 (ja) | 2004-12-16 | 2005-12-02 | イオン源装置及び方法 |
Country Status (4)
Country | Link |
---|---|
US (1) | US7122966B2 (ja) |
EP (1) | EP1672670B1 (ja) |
JP (1) | JP5079233B2 (ja) |
CN (1) | CN1816243B (ja) |
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JP2003331776A (ja) * | 2002-05-10 | 2003-11-21 | Hitachi Ltd | イオン源および質量分析装置および質量分析方法 |
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CN109890123B (zh) * | 2019-01-11 | 2021-06-25 | 陕西正泽生物技术有限公司 | 一种回旋加速器离子源位置校正工具及方法 |
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2005
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- 2005-12-15 EP EP05257689.9A patent/EP1672670B1/en not_active Expired - Fee Related
- 2005-12-16 CN CN2005101317607A patent/CN1816243B/zh not_active Expired - Fee Related
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Also Published As
Publication number | Publication date |
---|---|
CN1816243A (zh) | 2006-08-09 |
EP1672670B1 (en) | 2014-02-26 |
EP1672670A3 (en) | 2008-05-28 |
CN1816243B (zh) | 2011-03-09 |
EP1672670A2 (en) | 2006-06-21 |
JP5079233B2 (ja) | 2012-11-21 |
US20060132068A1 (en) | 2006-06-22 |
US7122966B2 (en) | 2006-10-17 |
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