JP2006148086A - レーザ照射方法、レーザ照射装置、および半導体装置の作製方法 - Google Patents
レーザ照射方法、レーザ照射装置、および半導体装置の作製方法 Download PDFInfo
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- JP2006148086A JP2006148086A JP2005305339A JP2005305339A JP2006148086A JP 2006148086 A JP2006148086 A JP 2006148086A JP 2005305339 A JP2005305339 A JP 2005305339A JP 2005305339 A JP2005305339 A JP 2005305339A JP 2006148086 A JP2006148086 A JP 2006148086A
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Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2008270780A (ja) * | 2007-03-23 | 2008-11-06 | Semiconductor Energy Lab Co Ltd | 結晶性半導体膜の作製方法及び薄膜トランジスタの作製方法 |
| WO2008128080A3 (en) * | 2007-04-13 | 2009-02-12 | Saint Gobain Ceramics | Electrostatic dissipative stage for use in forming lcd products |
| JP2009088497A (ja) * | 2007-09-14 | 2009-04-23 | Semiconductor Energy Lab Co Ltd | 半導体装置及び電子機器 |
| JP2011528504A (ja) * | 2008-07-16 | 2011-11-17 | サイオニクス、インク． | パルス状レーザ加工から半導体を保護する薄い犠牲マスキング膜 |
| US8853062B2 (en) | 2011-10-18 | 2014-10-07 | Samsung Display Co., Ltd. | Laser crystallization apparatus and laser crystallization method using the apparatus |
| DE102014213421A1 (de) | 2013-07-12 | 2015-01-15 | Aisin Seiki Kabushiki Kaisha | Laserbearbeitungsvorrichtung und Laserbearbeitungsverfahren |
| CN110890263A (zh) * | 2018-09-10 | 2020-03-17 | 三星电子株式会社 | 干法清洗设备和干法清洗方法 |
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Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2008270780A (ja) * | 2007-03-23 | 2008-11-06 | Semiconductor Energy Lab Co Ltd | 結晶性半導体膜の作製方法及び薄膜トランジスタの作製方法 |
| KR101438379B1 (ko) | 2007-03-23 | 2014-09-05 | 가부시키가이샤 한도오따이 에네루기 켄큐쇼 | 결정성 반도체막의 제조방법 및 박막트랜지스터의 제조방법 |
| WO2008128080A3 (en) * | 2007-04-13 | 2009-02-12 | Saint Gobain Ceramics | Electrostatic dissipative stage for use in forming lcd products |
| JP2009088497A (ja) * | 2007-09-14 | 2009-04-23 | Semiconductor Energy Lab Co Ltd | 半導体装置及び電子機器 |
| JP2011528504A (ja) * | 2008-07-16 | 2011-11-17 | サイオニクス、インク． | パルス状レーザ加工から半導体を保護する薄い犠牲マスキング膜 |
| US8853062B2 (en) | 2011-10-18 | 2014-10-07 | Samsung Display Co., Ltd. | Laser crystallization apparatus and laser crystallization method using the apparatus |
| DE102014213421A1 (de) | 2013-07-12 | 2015-01-15 | Aisin Seiki Kabushiki Kaisha | Laserbearbeitungsvorrichtung und Laserbearbeitungsverfahren |
| CN110890263A (zh) * | 2018-09-10 | 2020-03-17 | 三星电子株式会社 | 干法清洗设备和干法清洗方法 |
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