JP2006145526A - 蛍光マーカを局所化する方法 - Google Patents
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- G01N21/62—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light
- G01N21/63—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light optically excited
- G01N21/64—Fluorescence; Phosphorescence
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- G01N21/62—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light
- G01N21/63—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light optically excited
- G01N21/64—Fluorescence; Phosphorescence
- G01N21/6428—Measuring fluorescence of fluorescent products of reactions or of fluorochrome labelled reactive substances, e.g. measuring quenching effects, using measuring "optrodes"
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- G01N23/22—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material
- G01N23/225—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material using electron or ion
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- G01N21/62—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light
- G01N21/63—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light optically excited
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Abstract
【解決手段】このために、サンプル(4)は蛍光ビーム(11)により照射され、サンプル(4)は粒子ビーム(3)により同時に走査される。走査中、マーカは、粒子ビーム(3)により照射され、照射されたマーカはもはや蛍光放射線を放出しないような方式で損傷を受ける。これは、蛍光放射線束の減少に繋がる。この減少は検出される。サンプルに関して粒子ビーム(3)の位置を認識することにより、マーカが損傷された瞬間が理解され、従って、サンプルにおけるマーカの位置が又、理解される。
【選択図】図1
Description
− サンプルにマーカを与える段階;
− 第1放射線ビームによりサンプルを照射する段階であって、その結果、励起領域がサンプル中に形成され、その励起領域においてマーカが励起される、段階;
− 励起に応じてマーカから放射される蛍光放射線を検出する段階;及び
− 第2放射線ビームの支援により、励起領域の一部における蛍光放射線の検出を抑制する段階;
を有する方法に関する。
− 第2放射線ビームは、サンプルにおいて走査される収束粒子ビームである。
− その粒子ビームの焦点は、励起領域の断面より小さい断面を有する。
− 粒子ビームにおける粒子のエネルギーは、損傷の結果として、粒子により照射されたマーカから放出される蛍光放射線束を低下させるに十分である。
− サンプルに対する収束粒子ビームの位置は、蛍光放射線束が少なくとも前に検出された閾値により減少される瞬間に登録される。
2 回折ユニット
3 荷電粒子ビーム
4 サンプル
5 サンプル支持台
6 シーリング手段
7 真空チャンバ
8 粒子検出器
9 ガス注入器
10 レーザ
11 光ビーム
12 半透過型ミラー
13 レンズ
14 位置
15 カラーフィルタ
16 検出器
17 ミラー
20 制御ユニット
21 モニタ
22 画像
Claims (7)
- 調べられるサンプルにおいて放射線により励起されるマーカを局所化する方法であって:
前記サンプルにマーカを与える段階;
第1放射線ビームでサンプルを照射する段階であって、その結果、励起領域がサンプルにおいて形成され、その励起領域においてマーカが励起される、段階;
前記励起に応じてマーカから発せられる蛍光放射線を検出する段階;及び
第2放射線ビームの支援により、前記励起領域の一部において蛍光放射線の検出を抑制する段階;
を有する方法であって、
前記第2放射線ビームは前記サンプルにおいて走査される収束粒子ビームであり;
前記粒子ビームの焦点は前記励起領域の断面より小さい断面を有し;
前記粒子ビームにおける前記粒子のエネルギーは、損傷の結果として、前記粒子により衝突されたマーカから発せられる蛍光放射線束を低下させるに十分であり;そして
前記サンプルに関して前記収束粒子ビームの位置は、前記蛍光放射線束が少なくとも前に決定された閾値により減少する瞬間に登録される;
ことを特徴とする方法。 - 請求項1に記載の方法であって、前記粒子ビームの前記断面は、前記励起領域の前記断面より少なくとも10倍小さい、ことを特徴とする方法。
- 請求項1又は2に記載の方法であって、励起は光子ビームを用いて起こる、ことを特徴とする方法。
- 請求項1乃至3の何れ一項に記載の方法であって、前記収束粒子ビームは収束イオンビームである、ことを特徴とする方法。
- 請求項1乃至3の何れ一項に記載の方法であって、前記収束粒子ビームは収束電子ビームである、ことを特徴とする方法。
- 請求項1乃至5の何れ一項に記載の方法であって、エッチングするように、収束粒子ビームによる照射中にガスが導入される、ことを特徴とする方法。
- 請求項1乃至6の何れ一項に記載の方法を実行するための装置であって:
マーカを励起するために第1放射線ビームを生成するための手段;
励起されたマーカから発せられる蛍光放射線束を検出するための検出手段;及び
第2放射線ビームを生成するための手段
を有する装置であって、
前記第2放射線ビームを生成するための前記手段は収束粒子ビームを生成し、前記粒子ビームはサンプルにおいて走査され;そして
登録手段は、検出された蛍光放射線束における所定の減少により前記サンプルに対して前記収束粒子ビームの一部を決定するために存在する;
ことを特徴とする装置。
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
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NL1027462A NL1027462C2 (nl) | 2004-11-09 | 2004-11-09 | Werkwijze voor het lokaliseren van fluorescente markers. |
Publications (2)
Publication Number | Publication Date |
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JP2006145526A true JP2006145526A (ja) | 2006-06-08 |
JP4418789B2 JP4418789B2 (ja) | 2010-02-24 |
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JP2005323569A Expired - Fee Related JP4418789B2 (ja) | 2004-11-09 | 2005-11-08 | 蛍光マーカを局所化する方法 |
Country Status (6)
Country | Link |
---|---|
US (1) | US7317515B2 (ja) |
EP (1) | EP1655597B1 (ja) |
JP (1) | JP4418789B2 (ja) |
CN (1) | CN100565189C (ja) |
DE (1) | DE602005004354T2 (ja) |
NL (1) | NL1027462C2 (ja) |
Cited By (8)
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JP2009523227A (ja) * | 2005-12-22 | 2009-06-18 | エフ イー アイ カンパニ | 試料中のラベルを特定する方法 |
JP2009250904A (ja) * | 2008-04-10 | 2009-10-29 | Jeol Ltd | 検査装置及び検査方法 |
JP2012199224A (ja) * | 2011-01-30 | 2012-10-18 | Fei Co | 生体試料中の多数の蛍光マーカーを局在化するためのシステム及び方法 |
JP2014128871A (ja) * | 2012-12-04 | 2014-07-10 | Fei Co | 微少流体送達システム |
JP2014160068A (ja) * | 2013-02-19 | 2014-09-04 | Fei Co | 蛍光マーカの原位置再活性化 |
WO2017062060A1 (en) * | 2015-10-07 | 2017-04-13 | Intel Corporation | In-situ laser assisted processes in focused ion beam applications |
KR101917720B1 (ko) | 2017-07-31 | 2019-02-08 | 한미반도체 주식회사 | 웨이퍼 마킹 장치 및 웨이퍼 마킹방법 |
US11183362B2 (en) | 2017-11-27 | 2021-11-23 | Hitachi High-Tech Corporation | Charged particle beam apparatus and sample observation method using the same |
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EP1890136A1 (en) * | 2006-08-16 | 2008-02-20 | FEI Company | Method for obtaining images from slices of a specimen |
JP5873227B2 (ja) * | 2007-12-06 | 2016-03-01 | エフ・イ−・アイ・カンパニー | デコレーションを用いたスライス・アンド・ビュー |
US7961397B2 (en) * | 2008-08-29 | 2011-06-14 | Omniprobe, Inc | Single-channel optical processing system for energetic-beam microscopes |
DE102008054148B9 (de) * | 2008-10-31 | 2021-12-30 | Hellma Materials Gmbh & Co. Kg | Verfahren zur Bestimmung der Laserstabilität von optischem Material sowie damit erhaltene Kristalle und deren Verwendung |
JP5492409B2 (ja) * | 2008-12-26 | 2014-05-14 | 株式会社堀場製作所 | 電子顕微鏡装置 |
DE102009015341A1 (de) | 2009-03-27 | 2010-10-07 | Carl Zeiss Ag | Verfahren und Vorrichtungen zur optischen Untersuchung von Proben |
DE102009046211B4 (de) * | 2009-10-30 | 2017-08-24 | Carl Zeiss Microscopy Gmbh | Detektionsvorrichtung und Teilchenstrahlgerät mit Detektionsvorrichtung |
US8350237B2 (en) | 2010-03-31 | 2013-01-08 | Fei Company | Automated slice milling for viewing a feature |
JP5770434B2 (ja) * | 2010-06-24 | 2015-08-26 | 株式会社堀場製作所 | 電子顕微鏡装置 |
NL2005080C2 (en) * | 2010-07-14 | 2012-01-17 | Univ Delft Tech | Inspection apparatus and replaceable door for a vacuum chamber of such an inspection apparatus. |
EP2601477B1 (en) * | 2010-08-02 | 2021-09-22 | Oxford Instruments America, Inc. | Method for acquiring simultaneous and overlapping optical and charged particle beam images |
EP2509097A1 (en) * | 2011-04-07 | 2012-10-10 | FEI Company | Method of protecting a radiation detector in a charged particle instrument |
DE102013209104A1 (de) | 2013-05-16 | 2014-11-20 | Carl Zeiss Microscopy Gmbh | Vorrichtung und Verfahren zur spektroskopischen Analyse |
NL2012029C2 (en) * | 2013-12-24 | 2015-06-26 | Mapper Lithography Ip Bv | Charged particle lithography system with sensor assembly. |
NL2012218C2 (en) | 2014-02-06 | 2015-08-10 | Univ Delft Tech | Method and apparatus for determining a density of fluorescent markers in a sample. |
KR101725137B1 (ko) * | 2015-08-21 | 2017-04-26 | 한국표준과학연구원 | 전자현미경용 시료실 장치 및 이를 구비한 전자현미경 |
EP3159728A1 (en) | 2015-10-21 | 2017-04-26 | FEI Company | Standing wave interferometric microscope |
JP2017083234A (ja) * | 2015-10-26 | 2017-05-18 | オムロン株式会社 | 三次元形状計測装置、三次元形状計測システム、プログラム、コンピュータ読み取り可能な記録媒体、および三次元形状計測方法 |
EP3364248A1 (en) | 2017-02-15 | 2018-08-22 | Centre National De La Recherche Scientifique | Electron-beam lithography process adapted for a sample comprising at least one fragile nanostructure |
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DE4233686A1 (de) * | 1992-10-02 | 1994-04-07 | Ism Ingenieurbuero Fuer Spezia | Verfahren zur selektiven optischen Darstellung bzw. Markierung vorbestimmter Atome, Moleküle oder Molekülgruppen |
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-
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- 2004-11-09 NL NL1027462A patent/NL1027462C2/nl not_active IP Right Cessation
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- 2005-11-03 EP EP05077512A patent/EP1655597B1/en not_active Ceased
- 2005-11-03 DE DE602005004354T patent/DE602005004354T2/de active Active
- 2005-11-08 JP JP2005323569A patent/JP4418789B2/ja not_active Expired - Fee Related
- 2005-11-08 US US11/268,975 patent/US7317515B2/en active Active
- 2005-11-09 CN CNB2005101247002A patent/CN100565189C/zh not_active Expired - Fee Related
Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
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JP2009523227A (ja) * | 2005-12-22 | 2009-06-18 | エフ イー アイ カンパニ | 試料中のラベルを特定する方法 |
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JP2012199224A (ja) * | 2011-01-30 | 2012-10-18 | Fei Co | 生体試料中の多数の蛍光マーカーを局在化するためのシステム及び方法 |
JP2014128871A (ja) * | 2012-12-04 | 2014-07-10 | Fei Co | 微少流体送達システム |
JP2014160068A (ja) * | 2013-02-19 | 2014-09-04 | Fei Co | 蛍光マーカの原位置再活性化 |
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US11183362B2 (en) | 2017-11-27 | 2021-11-23 | Hitachi High-Tech Corporation | Charged particle beam apparatus and sample observation method using the same |
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Publication number | Publication date |
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EP1655597B1 (en) | 2008-01-16 |
CN100565189C (zh) | 2009-12-02 |
NL1027462C2 (nl) | 2006-05-10 |
JP4418789B2 (ja) | 2010-02-24 |
US20060098188A1 (en) | 2006-05-11 |
DE602005004354T2 (de) | 2008-05-21 |
DE602005004354D1 (de) | 2008-03-06 |
US7317515B2 (en) | 2008-01-08 |
EP1655597A1 (en) | 2006-05-10 |
CN1789982A (zh) | 2006-06-21 |
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