JP2006132945A - 蛍光ｘ線分析装置の検出下限モニタ - Google Patents

蛍光ｘ線分析装置の検出下限モニタ Download PDF

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Publication number
JP2006132945A
JP2006132945A JP2004318763A JP2004318763A JP2006132945A JP 2006132945 A JP2006132945 A JP 2006132945A JP 2004318763 A JP2004318763 A JP 2004318763A JP 2004318763 A JP2004318763 A JP 2004318763A JP 2006132945 A JP2006132945 A JP 2006132945A
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ray
intensity
sample
real time
detection limit
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JP2004318763A
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Japanese (ja)
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JP2006132945A5 (enExample
Inventor
Yoshitake Matoba
吉毅 的場
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Hitachi High Tech Science Corp
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SII NanoTechnology Inc
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Priority to JP2004318763A priority Critical patent/JP2006132945A/ja
Priority to US11/264,403 priority patent/US7289598B2/en
Publication of JP2006132945A publication Critical patent/JP2006132945A/ja
Publication of JP2006132945A5 publication Critical patent/JP2006132945A5/ja
Pending legal-status Critical Current

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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/22—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material
    • G01N23/223—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material by irradiating the sample with X-rays or gamma-rays and by measuring X-ray fluorescence
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2223/00—Investigating materials by wave or particle radiation
    • G01N2223/07—Investigating materials by wave or particle radiation secondary emission
    • G01N2223/076—X-ray fluorescence

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  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
JP2004318763A 2004-11-02 2004-11-02 蛍光ｘ線分析装置の検出下限モニタ Pending JP2006132945A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2004318763A JP2006132945A (ja) 2004-11-02 2004-11-02 蛍光ｘ線分析装置の検出下限モニタ
US11/264,403 US7289598B2 (en) 2004-11-02 2005-11-01 X-ray fluorescent analysis apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004318763A JP2006132945A (ja) 2004-11-02 2004-11-02 蛍光ｘ線分析装置の検出下限モニタ

Publications (2)

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JP2006132945A true JP2006132945A (ja) 2006-05-25
JP2006132945A5 JP2006132945A5 (enExample) 2007-06-28

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JP2004318763A Pending JP2006132945A (ja) 2004-11-02 2004-11-02 蛍光ｘ線分析装置の検出下限モニタ

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US (1) US7289598B2 (enExample)
JP (1) JP2006132945A (enExample)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008002951A (ja) * 2006-06-22 2008-01-10 Sii Nanotechnology Inc エネルギー分散型放射線検出システム及び対象元素の含有量測定方法
JP2008203245A (ja) * 2007-01-23 2008-09-04 Sii Nanotechnology Inc Ｘ線分析装置及びｘ線分析方法
JP2008309742A (ja) * 2007-06-18 2008-12-25 Shimadzu Corp 蛍光ｘ線分析装置
JP2020003331A (ja) * 2018-06-28 2020-01-09 株式会社リガク バックグラウンド除去方法及び蛍光ｘ線分析装置
WO2024176942A1 (ja) * 2023-02-24 2024-08-29 株式会社リガク 蛍光ｘ線分析装置

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5307503B2 (ja) * 2008-07-01 2013-10-02 株式会社日立ハイテクサイエンス Ｘ線分析装置及びｘ線分析方法
CA3178717A1 (en) * 2020-04-03 2021-10-07 Decision Tree, Llc Systems and methods for interpreting high energy interactions

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03221852A (ja) 1990-01-26 1991-09-30 Central Glass Co Ltd ＴｉＢ↓２中の酸素の簡易分析方法
JP2964137B2 (ja) * 1997-04-08 1999-10-18 セイコーインスツルメンツ株式会社 試料中心を検出できる蛍光ｘ線分析装置
US6005915A (en) * 1997-11-07 1999-12-21 Advanced Micro Devices, Inc. Apparatus and method for measuring the roughness of a target material surface based upon the scattering of incident X-ray photons
JP3820049B2 (ja) * 1998-07-16 2006-09-13 パナリティカル ビー ヴィ 薄膜の蛍光ｘ線分析方法及び装置
DE10050116A1 (de) * 1999-10-21 2001-04-26 Koninkl Philips Electronics Nv Verfahren und Vorrichtung zum Untersuchen einer Probe mit Hilfe von Röntgenfluoreszenzanalyse
JP3907890B2 (ja) 1999-11-02 2007-04-18 日本電子株式会社 Ｘ線元素分析装置
US6765986B2 (en) * 2001-02-08 2004-07-20 Niton Corporation X-ray fluorescence analyzer
FI113897B (fi) * 2001-11-23 2004-06-30 Planmed Oy Automaattivalotusmenetelmä ja automaattivalotusjärjestelmä
JP2004150990A (ja) 2002-10-31 2004-05-27 Ours Tex Kk 蛍光ｘ線分析装置
JP2004151045A (ja) * 2002-11-01 2004-05-27 Hitachi High-Technologies Corp 電子顕微鏡またはｘ線分析装置及び試料の分析方法
US7016462B1 (en) * 2002-11-08 2006-03-21 Interscience, Inc. Ionic pre-concentration XRF identification and analysis device, system and method
JP4005547B2 (ja) * 2003-09-04 2007-11-07 エスアイアイ・ナノテクノロジー株式会社 プラスティックを分析するｘ線分析装置
JP4095566B2 (ja) * 2003-09-05 2008-06-04 キヤノン株式会社 光学素子を評価する方法
WO2006013728A1 (ja) * 2004-08-06 2006-02-09 Matsushita Electric Industrial Co., Ltd. 蛍光ｘ線分析方法および蛍光ｘ線分析装置

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008002951A (ja) * 2006-06-22 2008-01-10 Sii Nanotechnology Inc エネルギー分散型放射線検出システム及び対象元素の含有量測定方法
JP2008203245A (ja) * 2007-01-23 2008-09-04 Sii Nanotechnology Inc Ｘ線分析装置及びｘ線分析方法
JP2008309742A (ja) * 2007-06-18 2008-12-25 Shimadzu Corp 蛍光ｘ線分析装置
JP2020003331A (ja) * 2018-06-28 2020-01-09 株式会社リガク バックグラウンド除去方法及び蛍光ｘ線分析装置
WO2024176942A1 (ja) * 2023-02-24 2024-08-29 株式会社リガク 蛍光ｘ線分析装置
JP2024120518A (ja) * 2023-02-24 2024-09-05 株式会社リガク 蛍光ｘ線分析装置
JP7698901B2 (ja) 2023-02-24 2025-06-26 株式会社リガク 蛍光ｘ線分析装置
EP4650761A1 (en) 2023-02-24 2025-11-19 Rigaku Corporation X-ray fluorescence spectrometer

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US20060093085A1 (en) 2006-05-04
US7289598B2 (en) 2007-10-30

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