JP2006117505A - ビスマス系酸化物超電導薄膜及びその作製法 - Google Patents
ビスマス系酸化物超電導薄膜及びその作製法 Download PDFInfo
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- JP2006117505A JP2006117505A JP2005090130A JP2005090130A JP2006117505A JP 2006117505 A JP2006117505 A JP 2006117505A JP 2005090130 A JP2005090130 A JP 2005090130A JP 2005090130 A JP2005090130 A JP 2005090130A JP 2006117505 A JP2006117505 A JP 2006117505A
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- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B25/00—Single-crystal growth by chemical reaction of reactive gases, e.g. chemical vapour-deposition growth
- C30B25/02—Epitaxial-layer growth
- C30B25/18—Epitaxial-layer growth characterised by the substrate
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- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B25/00—Single-crystal growth by chemical reaction of reactive gases, e.g. chemical vapour-deposition growth
- C30B25/02—Epitaxial-layer growth
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
- C30B29/10—Inorganic compounds or compositions
- C30B29/16—Oxides
- C30B29/22—Complex oxides
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N60/00—Superconducting devices
- H10N60/01—Manufacture or treatment
- H10N60/0268—Manufacture or treatment of devices comprising copper oxide
- H10N60/0296—Processes for depositing or forming superconductor layers
- H10N60/0576—Processes for depositing or forming superconductor layers characterised by the substrate
- H10N60/0604—Monocrystalline substrates, e.g. epitaxial growth
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N60/00—Superconducting devices
- H10N60/01—Manufacture or treatment
- H10N60/0912—Manufacture or treatment of Josephson-effect devices
- H10N60/0941—Manufacture or treatment of Josephson-effect devices comprising high-Tc ceramic materials
Abstract
【解決手段】 a軸配向したBi系酸化物超電導薄膜の作製方法は、Bi系酸化物超電導薄膜の(100) 面と格子定数の整合性の良い(110)面のLaSrAlO4単結晶基板又は(110)面のLaSrGaO4単結晶基板を用いてエピタキシャル成長することにある。この方法により、通常得られやすいBi-2212ではなく、Bi系酸化物超電導体でも最も高い超電導転移温度を示すBi-2223のa軸配向膜を選択的に作製することができる。
【選択図】 図2
Description
Claims (7)
- 基板上に酸化物超電導薄膜を作製する方法において、該薄膜の単結晶の格子定数が該基板の単結晶の格子定数の約整数倍であるようにしたことを特徴とする酸化物超電導薄膜の作製方法。
- 上記酸化物超電導薄膜は、Bi2Sr2Ca2Cu3O10±X(Xは、1より小さい正の数)又はBi2Sr2CuO6±Y(Yは、1より小さい正の数)薄膜であることを特徴とする請求項1に記載の酸化物超電導薄膜の作製方法。
- 上記単結晶基板は、LaSrAlO4、LaSrGaO4、α-Al2O3又はNdAlO3であることを特徴とする請求項1又は2のいずれかに記載の酸化物超電導薄膜の作製方法。
- 基板上に堆積された酸化物超電導薄膜であって、該薄膜の単結晶の格子定数は、該基板の単結晶の格子定数の約整数倍であることを特徴とする酸化物超電導薄膜。
- 上記酸化物超電導薄膜は、Bi2Sr2Ca2Cu3O10±X(Xは、1より小さい正の数)又はBi2Sr2CuO6±Y(Yは、1より小さい正の数)薄膜であることを特徴とする請求項4に記載の酸化物超電導薄膜。
- 上記単結晶基板は、LaSrAlO4、LaSrGaO4、α-Al2O3又はNdAlO3であることを特徴とする請求項4又は5のいずれかに記載の酸化物超電導薄膜。
- ジョセフソン素子であって、請求項4ないし6のいずれかに記載の酸化物超電導薄膜を用いて作製したことを特徴とするジョセフソン素子。
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2005090130A JP4452805B2 (ja) | 2004-09-21 | 2005-03-25 | ビスマス系酸化物超電導薄膜及びその作製法 |
US11/228,787 US7507691B2 (en) | 2004-09-21 | 2005-09-16 | Bismuth based oxide superconductor thin films and method of manufacturing the same |
US12/400,563 US20090197770A1 (en) | 2004-09-21 | 2009-03-09 | Bismuth based oxide superconductor thin films and method of manufacturing the same |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2004273999 | 2004-09-21 | ||
JP2005090130A JP4452805B2 (ja) | 2004-09-21 | 2005-03-25 | ビスマス系酸化物超電導薄膜及びその作製法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2006117505A true JP2006117505A (ja) | 2006-05-11 |
JP4452805B2 JP4452805B2 (ja) | 2010-04-21 |
Family
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Application Number | Title | Priority Date | Filing Date |
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JP2005090130A Expired - Fee Related JP4452805B2 (ja) | 2004-09-21 | 2005-03-25 | ビスマス系酸化物超電導薄膜及びその作製法 |
Country Status (2)
Country | Link |
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US (2) | US7507691B2 (ja) |
JP (1) | JP4452805B2 (ja) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2006273699A (ja) * | 2005-03-30 | 2006-10-12 | National Institute Of Advanced Industrial & Technology | 高品質Bi系酸化物超電導薄膜の作製法 |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4452805B2 (ja) * | 2004-09-21 | 2010-04-21 | 独立行政法人産業技術総合研究所 | ビスマス系酸化物超電導薄膜及びその作製法 |
US8633472B2 (en) * | 2009-09-14 | 2014-01-21 | Los Alamos National Security, Llc | Tunable terahertz radiation source |
US11289639B2 (en) * | 2011-03-30 | 2022-03-29 | Ambature, Inc. | Electrical, mechanical, computing, and/or other devices formed of extremely low resistance materials |
EP2691996A4 (en) * | 2011-03-30 | 2015-01-28 | Ambature Inc | ELECTRICAL AND MECHANICAL CALCULATION AND / OR OTHER DEVICES MADE FROM MATERIALS OF EXTREMELY LOW RESISTANCE |
CN102820116B (zh) * | 2012-05-04 | 2014-11-26 | 清华大学 | 一种高温超导薄膜磁体 |
CN102832333B (zh) * | 2012-09-15 | 2014-09-17 | 西北有色金属研究院 | 一种Bi-2212超导线/带材的热处理方法 |
CN112863762A (zh) * | 2021-01-20 | 2021-05-28 | 东北大学 | 一种制备大尺寸高温超导薄膜的方法 |
Family Cites Families (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CA1336566C (en) * | 1987-05-31 | 1995-08-08 | Naoji Fujimori | Superconducting thin film |
US5206214A (en) * | 1987-05-31 | 1993-04-27 | Sumitomo Electric Industries, Ltd. | Method of preparing thin film of superconductor |
US5110790A (en) * | 1988-11-10 | 1992-05-05 | Martin Marietta Energy Systems, Inc. | Superconducting thin films on potassium tantalate substrates |
JP2530492B2 (ja) * | 1988-12-23 | 1996-09-04 | 株式会社小松製作所 | 酸化物超伝導薄膜の作製方法及びそれに用いる基板 |
US5055445A (en) * | 1989-09-25 | 1991-10-08 | Litton Systems, Inc. | Method of forming oxidic high Tc superconducting materials on substantially lattice matched monocrystalline substrates utilizing liquid phase epitaxy |
JPH04187521A (ja) * | 1990-11-21 | 1992-07-06 | Sumitomo Electric Ind Ltd | 酸化物超電導薄膜の作製方法 |
JPH057027A (ja) | 1990-11-30 | 1993-01-14 | Toshiba Corp | 酸化物超電導薄膜およびその製造方法ならびに超電導トンネル接合およびその製造方法 |
EP0532815A1 (en) * | 1991-09-16 | 1993-03-24 | International Business Machines Corporation | Method for manufacturing lattice-matched substrates for high-Tc superconductor films |
US5691279A (en) * | 1993-06-22 | 1997-11-25 | The United States Of America As Represented By The Secretary Of The Army | C-axis oriented high temperature superconductors deposited onto new compositions of garnet |
JP3188358B2 (ja) * | 1994-03-25 | 2001-07-16 | 財団法人国際超電導産業技術研究センター | 酸化物超電導体薄膜の製造方法 |
KR0175359B1 (ko) * | 1995-12-15 | 1999-02-01 | 양승택 | 초전도체-절연체-초전도체 조셉슨 터널 접합구조의 제조방법 |
JPH09246611A (ja) | 1996-03-07 | 1997-09-19 | Toshiba Corp | 光変調方法 |
JP2958455B1 (ja) * | 1998-03-27 | 1999-10-06 | 工業技術院長 | 酸化物薄膜の結晶成長方法 |
US6531235B2 (en) * | 2001-06-06 | 2003-03-11 | Max-Planck-Institute für Mikrostrukturphysik | Non-c-axis oriented bismuth-layered perovskite ferroelectric structure epitaxially grown on buffered silicon |
JP4452805B2 (ja) * | 2004-09-21 | 2010-04-21 | 独立行政法人産業技術総合研究所 | ビスマス系酸化物超電導薄膜及びその作製法 |
-
2005
- 2005-03-25 JP JP2005090130A patent/JP4452805B2/ja not_active Expired - Fee Related
- 2005-09-16 US US11/228,787 patent/US7507691B2/en not_active Expired - Fee Related
-
2009
- 2009-03-09 US US12/400,563 patent/US20090197770A1/en not_active Abandoned
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2006273699A (ja) * | 2005-03-30 | 2006-10-12 | National Institute Of Advanced Industrial & Technology | 高品質Bi系酸化物超電導薄膜の作製法 |
JP4572386B2 (ja) * | 2005-03-30 | 2010-11-04 | 独立行政法人産業技術総合研究所 | 高品質Bi系酸化物超電導薄膜の作製法 |
Also Published As
Publication number | Publication date |
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JP4452805B2 (ja) | 2010-04-21 |
US20090197770A1 (en) | 2009-08-06 |
US20060084578A1 (en) | 2006-04-20 |
US7507691B2 (en) | 2009-03-24 |
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