JP2006114225A - 荷電粒子線装置 - Google Patents

荷電粒子線装置 Download PDF

Info

Publication number
JP2006114225A
JP2006114225A JP2004297117A JP2004297117A JP2006114225A JP 2006114225 A JP2006114225 A JP 2006114225A JP 2004297117 A JP2004297117 A JP 2004297117A JP 2004297117 A JP2004297117 A JP 2004297117A JP 2006114225 A JP2006114225 A JP 2006114225A
Authority
JP
Japan
Prior art keywords
charged particle
particle beam
sample
column
detector
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP2004297117A
Other languages
English (en)
Japanese (ja)
Other versions
JP2006114225A5 (enExample
Inventor
Taku Oshima
卓 大嶋
Mitsugi Sato
佐藤　　貢
Souichi Katagiri
創一 片桐
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi High Tech Corp
Original Assignee
Hitachi High Technologies Corp
Hitachi High Tech Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi High Technologies Corp, Hitachi High Tech Corp filed Critical Hitachi High Technologies Corp
Priority to JP2004297117A priority Critical patent/JP2006114225A/ja
Priority to US11/196,399 priority patent/US7339167B2/en
Publication of JP2006114225A publication Critical patent/JP2006114225A/ja
Publication of JP2006114225A5 publication Critical patent/JP2006114225A5/ja
Withdrawn legal-status Critical Current

Links

Images

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/244—Detectors; Associated components or circuits therefor
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/02—Details
    • H01J2237/026—Shields
    • H01J2237/0268—Liner tubes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/04—Means for controlling the discharge
    • H01J2237/047—Changing particle velocity
    • H01J2237/0475—Changing particle velocity decelerating
    • H01J2237/04756—Changing particle velocity decelerating with electrostatic means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/10—Lenses
    • H01J2237/12—Lenses electrostatic
    • H01J2237/1205—Microlenses
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/10—Lenses
    • H01J2237/12—Lenses electrostatic
    • H01J2237/121—Lenses electrostatic characterised by shape
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/18—Vacuum control means
    • H01J2237/188—Differential pressure
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/244—Detection characterized by the detecting means
    • H01J2237/2446—Position sensitive detectors
    • H01J2237/24465—Sectored detectors, e.g. quadrants
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/26—Electron or ion microscopes
    • H01J2237/2611—Stereoscopic measurements and/or imaging
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30—Electron or ion beam tubes for processing objects
    • H01J2237/317—Processing objects on a microscale
    • H01J2237/31749—Focused ion beam

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
JP2004297117A 2004-10-12 2004-10-12 荷電粒子線装置 Withdrawn JP2006114225A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2004297117A JP2006114225A (ja) 2004-10-12 2004-10-12 荷電粒子線装置
US11/196,399 US7339167B2 (en) 2004-10-12 2005-08-04 Charged particle beam apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004297117A JP2006114225A (ja) 2004-10-12 2004-10-12 荷電粒子線装置

Publications (2)

Publication Number Publication Date
JP2006114225A true JP2006114225A (ja) 2006-04-27
JP2006114225A5 JP2006114225A5 (enExample) 2007-10-11

Family

ID=36144328

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2004297117A Withdrawn JP2006114225A (ja) 2004-10-12 2004-10-12 荷電粒子線装置

Country Status (2)

Country Link
US (1) US7339167B2 (enExample)
JP (1) JP2006114225A (enExample)

Cited By (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007311117A (ja) * 2006-05-17 2007-11-29 Hitachi High-Technologies Corp 電子レンズ及びそれを用いた荷電粒子線装置
JP2008016454A (ja) * 2006-07-07 2008-01-24 Hermes Microvision Inc レンズ内の分割された検出器で側面像や平面像を集めるための電子ビーム装置
JP2008141141A (ja) * 2006-12-05 2008-06-19 Horiba Ltd 試料搬送システム
JP2009004112A (ja) * 2007-06-19 2009-01-08 Hitachi High-Technologies Corp 荷電粒子線装置およびその真空立上げ方法
JP2009069073A (ja) * 2007-09-14 2009-04-02 Horon:Kk モールド検査方法およびモールド検査装置
JP2009099468A (ja) * 2007-10-18 2009-05-07 Hitachi High-Technologies Corp 荷電粒子線応用装置
JP2009540512A (ja) * 2006-06-07 2009-11-19 エフ・イ−・アイ・カンパニー 小型の走査型電子顕微鏡
WO2013062158A1 (ko) * 2011-10-27 2013-05-02 에스엔유 프리시젼 주식회사 주사전자현미경용 빈필터 제어방법 및 전자빔 정렬 기능을 구비한 주사전자현미경
KR20130134160A (ko) * 2012-05-30 2013-12-10 삼성디스플레이 주식회사 주사 전자 현미경을 이용한 검사 시스템
WO2014030433A1 (ja) * 2012-08-22 2014-02-27 株式会社 日立ハイテクノロジーズ 複合荷電粒子線装置
JP2017517120A (ja) * 2014-05-30 2017-06-22 エフ・イ−・アイ・カンパニー スライス・アンド・ビュー試料画像化のための方法および装置
JP2020064780A (ja) * 2018-10-18 2020-04-23 株式会社日立ハイテクサイエンス 荷電粒子ビーム装置、試料加工観察方法
WO2021255886A1 (ja) * 2020-06-18 2021-12-23 株式会社日立ハイテク 荷電粒子線装置
JP2025520162A (ja) * 2022-05-31 2025-07-01 カール・ツァイス・エスエムティー・ゲーエムベーハー 集束イオンビーム形状に起因する制約から荷電粒子ビーム装置の作動距離を分離するためのデュアルビームシステムおよび方法
US12512294B2 (en) 2020-06-18 2025-12-30 Hitachi High-Tech Corporation Charged particle beam device

Families Citing this family (32)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2806527B1 (fr) * 2000-03-20 2002-10-25 Schlumberger Technologies Inc Colonne a focalisation simultanee d'un faisceau de particules et d'un faisceau optique
US6897443B2 (en) * 2003-06-02 2005-05-24 Harald Gross Portable scanning electron microscope
US7544523B2 (en) * 2005-12-23 2009-06-09 Fei Company Method of fabricating nanodevices
US20080054180A1 (en) * 2006-05-25 2008-03-06 Charles Silver Apparatus and method of detecting secondary electrons
DE102006059162B4 (de) * 2006-12-14 2009-07-09 Carl Zeiss Nts Gmbh Teilchenoptische Anordnung
US8835845B2 (en) * 2007-06-01 2014-09-16 Fei Company In-situ STEM sample preparation
US8252115B2 (en) * 2008-04-02 2012-08-28 Raytheon Company System and method for growing nanotubes with a specified isotope composition via ion implantation using a catalytic transmembrane
EP2219204B1 (en) * 2009-02-12 2012-03-21 ICT, Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Arrangement and method for the contrast improvement in a charged particle beam device for inspecting a specimen
JP2010225534A (ja) * 2009-03-25 2010-10-07 Netcomsec Co Ltd コレクタ及び電子管
JP5352335B2 (ja) * 2009-04-28 2013-11-27 株式会社日立ハイテクノロジーズ 複合荷電粒子線装置
FR2955938B1 (fr) * 2010-01-29 2012-08-03 Commissariat Energie Atomique Dispositif electronique de pilotage et d'amplification pour une sonde locale piezoelectrique de mesure de force sous un faisceau de particules
DE102010056337A1 (de) * 2010-12-27 2012-06-28 Carl Zeiss Nts Gmbh Teilchenstrahlsystem und Spektroskopieverfahren
DE102011006588A1 (de) * 2011-03-31 2012-10-04 Carl Zeiss Nts Gmbh Teilchenstrahlgerät mit Detektoranordnung
EP2518755B1 (en) * 2011-04-26 2014-10-15 FEI Company In-column detector for particle-optical column
JP5860642B2 (ja) * 2011-09-07 2016-02-16 株式会社日立ハイテクノロジーズ 走査電子顕微鏡
EP2629317B1 (en) 2012-02-20 2015-01-28 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Charged particle beam device with dynamic focus and method of operating thereof
US8933414B2 (en) * 2013-02-27 2015-01-13 Fei Company Focused ion beam low kV enhancement
US9190241B2 (en) * 2013-03-25 2015-11-17 Hermes-Microvision, Inc. Charged particle beam apparatus
JP6124679B2 (ja) * 2013-05-15 2017-05-10 日本電子株式会社 走査荷電粒子顕微鏡および画像取得方法
US10236156B2 (en) 2015-03-25 2019-03-19 Hermes Microvision Inc. Apparatus of plural charged-particle beams
US9859097B2 (en) 2015-09-01 2018-01-02 The Board Of Trustees Of The Leland Stanford Junior University Vacuum tube electron microscope
US10614994B2 (en) * 2016-09-23 2020-04-07 Hitachi High-Technologies Corporation Electron microscope
CZ309855B6 (cs) * 2017-09-20 2023-12-20 Tescan Group, A.S. Zařízení s iontovým tubusem a rastrovacím elektronovým mikroskopem
JP7017437B2 (ja) 2018-03-06 2022-02-08 Ｔａｓｍｉｔ株式会社 反射電子のエネルギースペクトルを測定する装置および方法
DE102018204683B3 (de) * 2018-03-27 2019-08-08 Carl Zeiss Microscopy Gmbh Elektronenstrahlmikroskop
JP7068117B2 (ja) * 2018-09-18 2022-05-16 株式会社日立ハイテク 荷電粒子線装置
US11984295B2 (en) 2020-01-06 2024-05-14 Asml Netherlands B.V. Charged particle assessment tool, inspection method
CN113692102B (zh) * 2020-05-19 2024-12-13 四川智研科技有限公司 减少电子加速器噪声的结构及方法
ES2899769B2 (es) * 2020-09-14 2022-10-28 Consorcio Para La Construccion Equipamiento Y Explotacion Del Laboratorio De Luz De Sincrotron Dispositivo de conexion extraible para la excitacion de muestras con senales electricas de alta frecuencia a alto voltaje en microscopios de electrones
DE102021122390B3 (de) * 2021-08-30 2023-01-26 Carl Zeiss Microscopy Gmbh Teilchenstrahlgerät, Verfahren zum Betreiben des Teilchenstrahlgeräts und Computerprogrammprodukt
CN114235938B (zh) * 2021-12-03 2023-06-20 中国科学院地质与地球物理研究所 一种动态离子探针超低真空装置及实现方法
DE102022124933A1 (de) * 2022-09-28 2024-03-28 Carl Zeiss Multisem Gmbh Vielstrahl-Teilchenmikroskop mit verbessertem Strahlrohr

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3263485B2 (ja) 1993-06-15 2002-03-04 三井化学株式会社 表面保護粘着フィルム
US5644132A (en) 1994-06-20 1997-07-01 Opan Technologies Ltd. System for high resolution imaging and measurement of topographic and material features on a specimen
DE69817787T2 (de) * 1997-12-23 2004-04-01 Fei Co., Hillsboro Rasterelektronenmikroskop mit elektrostatischem objektiv und elektrische abtastvorrichtung
DE19828476A1 (de) * 1998-06-26 1999-12-30 Leo Elektronenmikroskopie Gmbh Teilchenstrahlgerät
EP1022766B1 (en) * 1998-11-30 2004-02-04 Advantest Corporation Particle beam apparatus
DE69924240T2 (de) * 1999-06-23 2006-02-09 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Ladungsträgerteilchenstrahlvorrichtung
JP3915351B2 (ja) 1999-11-19 2007-05-16 日本精工株式会社 トロイダル型無段変速機用パワーローラユニットの梱包方法
EP1122761B1 (en) 2000-02-01 2004-05-26 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Optical column for charged particle beam device
EP1160825B1 (en) * 2000-05-31 2008-02-13 Advantest Corporation Particle beam apparatus
AUPQ932200A0 (en) * 2000-08-11 2000-08-31 Danilatos, Gerasimos Daniel Environmental scanning electron microscope
EP1350259B1 (en) * 2000-12-22 2004-08-25 Fei Company Sem provided with a secondary electron detector having a central electrode
DE60118070T2 (de) * 2001-09-04 2006-08-17 Advantest Corp. Partikelstrahlgerät
US7223974B2 (en) * 2002-05-22 2007-05-29 Applied Materials, Israel, Ltd. Charged particle beam column and method for directing a charged particle beam
US7141791B2 (en) * 2004-09-07 2006-11-28 Kla-Tencor Technologies Corporation Apparatus and method for E-beam dark field imaging

Cited By (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007311117A (ja) * 2006-05-17 2007-11-29 Hitachi High-Technologies Corp 電子レンズ及びそれを用いた荷電粒子線装置
JP2009540512A (ja) * 2006-06-07 2009-11-19 エフ・イ−・アイ・カンパニー 小型の走査型電子顕微鏡
JP2010257995A (ja) * 2006-06-07 2010-11-11 Fei Co 小型の走査型電子顕微鏡
JP2008016454A (ja) * 2006-07-07 2008-01-24 Hermes Microvision Inc レンズ内の分割された検出器で側面像や平面像を集めるための電子ビーム装置
JP2008141141A (ja) * 2006-12-05 2008-06-19 Horiba Ltd 試料搬送システム
JP2009004112A (ja) * 2007-06-19 2009-01-08 Hitachi High-Technologies Corp 荷電粒子線装置およびその真空立上げ方法
JP2009069073A (ja) * 2007-09-14 2009-04-02 Horon:Kk モールド検査方法およびモールド検査装置
JP2009099468A (ja) * 2007-10-18 2009-05-07 Hitachi High-Technologies Corp 荷電粒子線応用装置
WO2013062158A1 (ko) * 2011-10-27 2013-05-02 에스엔유 프리시젼 주식회사 주사전자현미경용 빈필터 제어방법 및 전자빔 정렬 기능을 구비한 주사전자현미경
KR101914231B1 (ko) 2012-05-30 2018-11-02 삼성디스플레이 주식회사 주사 전자 현미경을 이용한 검사 시스템
KR20130134160A (ko) * 2012-05-30 2013-12-10 삼성디스플레이 주식회사 주사 전자 현미경을 이용한 검사 시스템
WO2014030433A1 (ja) * 2012-08-22 2014-02-27 株式会社 日立ハイテクノロジーズ 複合荷電粒子線装置
US9478389B2 (en) 2012-08-22 2016-10-25 Hitachi High-Technologies Corporation Scanning electron microscope
JP2014041734A (ja) * 2012-08-22 2014-03-06 Hitachi High-Technologies Corp 複合荷電粒子線装置
JP2017517120A (ja) * 2014-05-30 2017-06-22 エフ・イ−・アイ・カンパニー スライス・アンド・ビュー試料画像化のための方法および装置
JP2020064780A (ja) * 2018-10-18 2020-04-23 株式会社日立ハイテクサイエンス 荷電粒子ビーム装置、試料加工観察方法
JP7152757B2 (ja) 2018-10-18 2022-10-13 株式会社日立ハイテクサイエンス 試料加工観察方法
WO2021255886A1 (ja) * 2020-06-18 2021-12-23 株式会社日立ハイテク 荷電粒子線装置
US12512294B2 (en) 2020-06-18 2025-12-30 Hitachi High-Tech Corporation Charged particle beam device
JP2025520162A (ja) * 2022-05-31 2025-07-01 カール・ツァイス・エスエムティー・ゲーエムベーハー 集束イオンビーム形状に起因する制約から荷電粒子ビーム装置の作動距離を分離するためのデュアルビームシステムおよび方法

Also Published As

Publication number Publication date
US7339167B2 (en) 2008-03-04
US20060076489A1 (en) 2006-04-13

Similar Documents

Publication Publication Date Title
JP2006114225A (ja) 荷電粒子線装置
US10522327B2 (en) Method of operating a charged particle beam specimen inspection system
EP2080014B1 (en) An interface, a method for observing an object within a non-vacuum environment and a scanning electron microscope
JP7250948B2 (ja) 電流測定一体型アパーチャアレイ
JP5897841B2 (ja) 異物付着防止機能を備えた電子線検査装置及び方法
WO2002013227A1 (en) Sheet beam test apparatus
JP4141211B2 (ja) 粒子ビーム装置
US8759761B2 (en) Charged corpuscular particle beam irradiating method, and charged corpuscular particle beam apparatus
CN1406391A (zh) 带电粒子束设备的光学柱
WO2014002734A1 (ja) 荷電粒子線装置
JP2014238962A (ja) 電子線装置
US8963084B2 (en) Contamination reduction electrode for particle detector
EP1498930A1 (en) Charged particle beam device with multi-source array
JP2001283759A (ja) 走査電子顕微鏡
CN115398590B (zh) 用于检查和/或成像样品的带电粒子束装置和方法
US8008629B2 (en) Charged particle beam device and method for inspecting specimen
Miyoshi et al. Development of a projection imaging electron microscope with electrostatic lenses
KR20240116858A (ko) 전자 현미경, 전자 현미경을 위한 전자 공급원, 및 전자 현미경을 작동시키는 방법들
KR102181455B1 (ko) 시료 관찰 장치 및 방법
JP7547648B2 (ja) 荷電粒子ビーム装置、走査電子顕微鏡および荷電粒子ビーム装置を動作させる方法
US20250046562A1 (en) Objective lens and charged particle beam apparatus including same
JPH0498746A (ja) 荷電粒子線装置
CN120239895A (zh) 带电粒子光学装置、评估设备、评估样品的方法
EP3696846A1 (en) Apparatus for and method of producing a monochromatic charged particle beam
JP2017134927A (ja) 検査装置

Legal Events

Date Code Title Description
RD04 Notification of resignation of power of attorney

Free format text: JAPANESE INTERMEDIATE CODE: A7424

Effective date: 20060509

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20070725

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20070725

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20070725

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20070827

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20091007

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20091013

A761 Written withdrawal of application

Free format text: JAPANESE INTERMEDIATE CODE: A761

Effective date: 20091113