JP2006112974A5 - - Google Patents

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Publication number
JP2006112974A5
JP2006112974A5 JP2004302063A JP2004302063A JP2006112974A5 JP 2006112974 A5 JP2006112974 A5 JP 2006112974A5 JP 2004302063 A JP2004302063 A JP 2004302063A JP 2004302063 A JP2004302063 A JP 2004302063A JP 2006112974 A5 JP2006112974 A5 JP 2006112974A5
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JP
Japan
Prior art keywords
light
beam splitter
optical unit
guides
receiving element
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Application number
JP2004302063A
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English (en)
Japanese (ja)
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JP2006112974A (ja
JP4514209B2 (ja
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Publication date
Application filed filed Critical
Priority claimed from JP2004302063A external-priority patent/JP4514209B2/ja
Priority to JP2004302063A priority Critical patent/JP4514209B2/ja
Priority to EP05021142.4A priority patent/EP1647798B1/en
Priority to US11/250,667 priority patent/US7391521B2/en
Priority to KR1020050096983A priority patent/KR100808886B1/ko
Priority to CNB2005101136743A priority patent/CN100425944C/zh
Publication of JP2006112974A publication Critical patent/JP2006112974A/ja
Publication of JP2006112974A5 publication Critical patent/JP2006112974A5/ja
Publication of JP4514209B2 publication Critical patent/JP4514209B2/ja
Application granted granted Critical
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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JP2004302063A 2004-10-15 2004-10-15 位置検出装置及び方法 Expired - Fee Related JP4514209B2 (ja)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP2004302063A JP4514209B2 (ja) 2004-10-15 2004-10-15 位置検出装置及び方法
EP05021142.4A EP1647798B1 (en) 2004-10-15 2005-09-28 Position detection apparatus and method
US11/250,667 US7391521B2 (en) 2004-10-15 2005-10-13 Position detection apparatus and method
CNB2005101136743A CN100425944C (zh) 2004-10-15 2005-10-14 位置检测装置和方法
KR1020050096983A KR100808886B1 (ko) 2004-10-15 2005-10-14 위치 검출장치 및 방법

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004302063A JP4514209B2 (ja) 2004-10-15 2004-10-15 位置検出装置及び方法

Publications (3)

Publication Number Publication Date
JP2006112974A JP2006112974A (ja) 2006-04-27
JP2006112974A5 true JP2006112974A5 (enExample) 2008-03-21
JP4514209B2 JP4514209B2 (ja) 2010-07-28

Family

ID=35447726

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2004302063A Expired - Fee Related JP4514209B2 (ja) 2004-10-15 2004-10-15 位置検出装置及び方法

Country Status (5)

Country Link
US (1) US7391521B2 (enExample)
EP (1) EP1647798B1 (enExample)
JP (1) JP4514209B2 (enExample)
KR (1) KR100808886B1 (enExample)
CN (1) CN100425944C (enExample)

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JP4914040B2 (ja) * 2005-07-28 2012-04-11 キヤノン株式会社 干渉測定装置
DE502007001288D1 (de) * 2007-01-02 2009-09-24 Isis Sentronics Gmbh Positionserkennungssystem zur berührungslosen interferometrischen Detektion der Ortsposition eines Zielobjektes und damit ausgestattetes Abtastsystem
GB0713982D0 (en) * 2007-07-18 2007-08-29 Univ Birmingham Improved interferometer
US7869056B2 (en) * 2007-10-02 2011-01-11 National Central University Linear displacement and tilting angle measuring device
JP5305732B2 (ja) * 2008-05-13 2013-10-02 キヤノン株式会社 干渉計
DE102009021580B3 (de) 2009-05-15 2010-11-25 Medizinisches Laserzentrum Lübeck GmbH Vorwärtsscannendes OCT-Endoskop
JP5629455B2 (ja) 2009-12-14 2014-11-19 キヤノン株式会社 干渉計
US20110157595A1 (en) * 2009-12-30 2011-06-30 Yerazunis William S Rotary Interferometer
DE102011111900A1 (de) * 2011-08-30 2013-02-28 Dr. Johannes Heidenhain Gmbh Vorrichtung zur interferometrischen Abstandsbestimmung
CN103940341B (zh) * 2013-01-23 2016-12-28 宁波舜宇智能科技有限公司 一种位移和倾角一体化测试仪器
JP6285661B2 (ja) * 2013-08-09 2018-02-28 キヤノン株式会社 干渉計測装置
CN103528524B (zh) * 2013-09-16 2017-03-15 广东工业大学 透视测量树脂基复合材料内部离面位移场分布的方法
DE102013221898A1 (de) * 2013-10-29 2015-04-30 Dr. Johannes Heidenhain Gmbh Vorrichtung zur Positionsbestimmung
CN103644848B (zh) * 2013-12-12 2016-02-03 哈尔滨工业大学 一种使用双频激光的三维光栅位移测量系统
CN103644849B (zh) * 2013-12-12 2016-02-03 哈尔滨工业大学 一种可测竖直位移的三维光栅位移测量系统
EP3267145B1 (en) * 2016-10-05 2019-07-17 MI-Partners BV Measuring device for accurately determining the displacement of a rotating test object provided with a light reflective surface
CN109997010B (zh) * 2016-11-18 2022-06-24 齐戈股份有限公司 用于优化干涉仪的光学性能的方法及设备
CN109341518B (zh) * 2018-08-22 2020-10-30 深圳市斯尔顿科技有限公司 Oct探测装置及微雕设备
CN109253707B (zh) * 2018-10-19 2024-02-27 成都太科光电技术有限责任公司 百微米量程透射式干涉测试装置

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US3938889A (en) * 1974-06-04 1976-02-17 The United States Of America As Represented By The Secretary Of The Air Force Method and apparatus for measuring linear thermal expansion of polymeric material
JPH073344B2 (ja) * 1987-06-15 1995-01-18 キヤノン株式会社 エンコ−ダ−
JP3003964B2 (ja) * 1991-09-20 2000-01-31 オリンパス光学工業株式会社 測長用干渉計
US5418612A (en) * 1992-02-27 1995-05-23 Renishaw, Plc Method of and apparatus for determining surface contour of diffusely reflecting objects
US5341213A (en) * 1992-07-21 1994-08-23 Avco Corporation Alignment of radiation receptor with lens by Fourier optics
US5469259A (en) * 1994-01-03 1995-11-21 International Business Machines Corporation Inspection interferometer with scanning autofocus, and phase angle control features
US5815267A (en) * 1994-09-09 1998-09-29 Canon Kabushiki Kaisha Displacement information measuring apparatus in which a light-receiving condition on a photodetector is adjustable
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US6469790B1 (en) 1996-10-28 2002-10-22 Christopher J. Manning Tilt-compensated interferometers
US6313918B1 (en) * 1998-09-18 2001-11-06 Zygo Corporation Single-pass and multi-pass interferometery systems having a dynamic beam-steering assembly for measuring distance, angle, and dispersion
JP2001076325A (ja) * 1999-09-07 2001-03-23 Canon Inc 変位検出装置及び情報記録装置
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