JP2006083010A5 - - Google Patents

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Publication number
JP2006083010A5
JP2006083010A5 JP2004269087A JP2004269087A JP2006083010A5 JP 2006083010 A5 JP2006083010 A5 JP 2006083010A5 JP 2004269087 A JP2004269087 A JP 2004269087A JP 2004269087 A JP2004269087 A JP 2004269087A JP 2006083010 A5 JP2006083010 A5 JP 2006083010A5
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JP
Japan
Prior art keywords
thin film
raw material
substrate
material flow
film manufacturing
Prior art date
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Application number
JP2004269087A
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English (en)
Japanese (ja)
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JP2006083010A (ja
JP3932458B2 (ja
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Publication date
Application filed filed Critical
Priority to JP2004269087A priority Critical patent/JP3932458B2/ja
Priority claimed from JP2004269087A external-priority patent/JP3932458B2/ja
Priority to PCT/JP2005/017111 priority patent/WO2006030884A1/ja
Priority to US11/662,805 priority patent/US7951272B2/en
Publication of JP2006083010A publication Critical patent/JP2006083010A/ja
Publication of JP2006083010A5 publication Critical patent/JP2006083010A5/ja
Application granted granted Critical
Publication of JP3932458B2 publication Critical patent/JP3932458B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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JP2004269087A 2004-09-16 2004-09-16 薄膜製造方法 Expired - Fee Related JP3932458B2 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2004269087A JP3932458B2 (ja) 2004-09-16 2004-09-16 薄膜製造方法
PCT/JP2005/017111 WO2006030884A1 (ja) 2004-09-16 2005-09-16 薄膜製造方法
US11/662,805 US7951272B2 (en) 2004-09-16 2005-09-16 Thin film producing method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004269087A JP3932458B2 (ja) 2004-09-16 2004-09-16 薄膜製造方法

Publications (3)

Publication Number Publication Date
JP2006083010A JP2006083010A (ja) 2006-03-30
JP2006083010A5 true JP2006083010A5 (enExample) 2006-06-01
JP3932458B2 JP3932458B2 (ja) 2007-06-20

Family

ID=36060131

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2004269087A Expired - Fee Related JP3932458B2 (ja) 2004-09-16 2004-09-16 薄膜製造方法

Country Status (3)

Country Link
US (1) US7951272B2 (enExample)
JP (1) JP3932458B2 (enExample)
WO (1) WO2006030884A1 (enExample)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5007973B2 (ja) * 2007-04-03 2012-08-22 独立行政法人産業技術総合研究所 薄膜製造方法
US8845867B2 (en) * 2008-12-09 2014-09-30 Tdk Corporation Method for manufacturing magnetoresistance effect element using simultaneous sputtering of Zn and ZnO
JP5510403B2 (ja) * 2011-07-04 2014-06-04 株式会社デンソー 結晶軸傾斜膜の製造方法
US9359081B2 (en) * 2012-06-12 2016-06-07 The Boeing Company Icing condition detection system
CN102879289A (zh) * 2012-09-26 2013-01-16 中国人民解放军装甲兵工程学院 一种PbTiO3智能涂层的制备方法和PbTiO3智能涂层
CN105908147B (zh) * 2016-07-07 2017-07-21 重庆科技学院 非平衡磁控溅射电极及系统
CN106894018B (zh) * 2017-04-01 2023-06-02 三峡大学 一种原位异质形核反应制备定向生长m7c3涂层的制备装置及方法
CN112853286A (zh) * 2019-11-12 2021-05-28 应用材料公司 压电膜的物理气相沉积
CN111041437A (zh) * 2019-12-04 2020-04-21 山东科技大学 一种溅射沉积倾斜c轴压电薄膜的辅助装置
CN111270214B (zh) * 2020-03-26 2022-03-18 郑州科之诚机床工具有限公司 一种磁控溅射制备c轴择优取向氮化铝多晶薄膜的方法和氮化铝多晶薄膜

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5023918A (enExample) 1973-07-02 1975-03-14
JPH0688218A (ja) * 1990-11-15 1994-03-29 Tosoh Corp 酸化亜鉛系焼結体及びその製造方法並びに用途
US5382345A (en) * 1993-02-16 1995-01-17 Industrial Technology Research Institute Apparatus for simultaneously coating a film of magneto-optical recording medium on a plurality of disk substrates
JP3208439B2 (ja) 1994-09-07 2001-09-10 日本電信電話株式会社 膜形成用プラズマ装置
JP3449013B2 (ja) 1995-02-21 2003-09-22 株式会社村田製作所 横波トランスデューサ
US6106689A (en) * 1997-01-20 2000-08-22 Canon Kabushiki Kaisha Process for forming zinc oxide film and processes for producing semiconductor device substrate and photo-electricity generating device using the film
US6077402A (en) * 1997-05-16 2000-06-20 Applied Materials, Inc. Central coil design for ionized metal plasma deposition
US6426786B1 (en) * 1999-06-01 2002-07-30 International Business Machines Corporation Method of homeotropic alignment or tilted homeotropic alignment of liquid crystals by single oblique evaporation of oxides and liquid crystal display device formed thereby
JP2004156057A (ja) 2002-09-10 2004-06-03 Ulvac Japan Ltd 炭素薄膜の形成方法および得られた炭素薄膜
JP3561745B1 (ja) * 2003-02-11 2004-09-02 関西ティー・エル・オー株式会社 薄膜製造方法

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