JP2006041540A5 - - Google Patents

Download PDF

Info

Publication number
JP2006041540A5
JP2006041540A5 JP2005221109A JP2005221109A JP2006041540A5 JP 2006041540 A5 JP2006041540 A5 JP 2006041540A5 JP 2005221109 A JP2005221109 A JP 2005221109A JP 2005221109 A JP2005221109 A JP 2005221109A JP 2006041540 A5 JP2006041540 A5 JP 2006041540A5
Authority
JP
Japan
Prior art keywords
polarization
manipulator
polarization manipulator
manipulators
illumination system
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2005221109A
Other languages
English (en)
Japanese (ja)
Other versions
JP4795745B2 (ja
JP2006041540A (ja
Filing date
Publication date
Application filed filed Critical
Publication of JP2006041540A publication Critical patent/JP2006041540A/ja
Publication of JP2006041540A5 publication Critical patent/JP2006041540A5/ja
Application granted granted Critical
Publication of JP4795745B2 publication Critical patent/JP4795745B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

JP2005221109A 2004-07-29 2005-07-29 マイクロリソグラフィ用投影露光装置のための照明システム Expired - Fee Related JP4795745B2 (ja)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
US59198504P 2004-07-29 2004-07-29
US60/591,985 2004-07-29
US63156404P 2004-11-29 2004-11-29
US60/631,564 2004-11-29

Publications (3)

Publication Number Publication Date
JP2006041540A JP2006041540A (ja) 2006-02-09
JP2006041540A5 true JP2006041540A5 (enExample) 2008-09-04
JP4795745B2 JP4795745B2 (ja) 2011-10-19

Family

ID=35241233

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2005221109A Expired - Fee Related JP4795745B2 (ja) 2004-07-29 2005-07-29 マイクロリソグラフィ用投影露光装置のための照明システム

Country Status (5)

Country Link
US (1) US20060055909A1 (enExample)
EP (1) EP1621930A3 (enExample)
JP (1) JP4795745B2 (enExample)
KR (1) KR101212921B1 (enExample)
TW (1) TWI413853B (enExample)

Families Citing this family (36)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101547077B1 (ko) 2003-04-09 2015-08-25 가부시키가이샤 니콘 노광 방법 및 장치, 그리고 디바이스 제조 방법
JP4323903B2 (ja) * 2003-09-12 2009-09-02 キヤノン株式会社 照明光学系及びそれを用いた露光装置
TWI569308B (zh) 2003-10-28 2017-02-01 尼康股份有限公司 照明光學裝置、曝光裝置、曝光方法以及元件製造 方法
TWI385414B (zh) * 2003-11-20 2013-02-11 尼康股份有限公司 光學照明裝置、照明方法、曝光裝置、曝光方法以及元件製造方法
TWI379344B (en) * 2004-02-06 2012-12-11 Nikon Corp Polarization changing device, optical illumination apparatus, light-exposure apparatus and light-exposure method
US20060204204A1 (en) * 2004-12-20 2006-09-14 Markus Zenzinger Method for improving the optical polarization properties of a microlithographic projection exposure apparatus
TWI423301B (zh) * 2005-01-21 2014-01-11 尼康股份有限公司 照明光學裝置、曝光裝置、曝光方法以及元件製造方法
US20080192224A1 (en) * 2005-02-12 2008-08-14 Carl Zeiss Smt Ag Microlithographic Projection Exposure Apparatus
DE102006031807A1 (de) * 2005-07-12 2007-01-18 Carl Zeiss Smt Ag Beleuchtungseinrichtung einer mikrolithographischen Projektionsbelichtungsanlage, sowie Depolarisator
KR100835495B1 (ko) 2006-05-12 2008-06-04 주식회사 하이닉스반도체 반도체 소자의 노광 장비 및 노광 방법
CN101479667B (zh) * 2006-07-03 2011-12-07 卡尔蔡司Smt有限责任公司 修正/修复光刻投影物镜的方法
DE102006038643B4 (de) * 2006-08-17 2009-06-10 Carl Zeiss Smt Ag Mikrolithographische Projektionsbelichtungsanlage sowie mikrolithographisches Belichtungsverfahren
US8035803B2 (en) * 2006-09-06 2011-10-11 Carl Zeiss Smt Gmbh Subsystem of an illumination system of a microlithographic projection exposure apparatus
DE102006050653A1 (de) 2006-10-24 2008-04-30 Carl Zeiss Smt Ag Verfahren und Vorrichtung zum stoffschlüssigen Verbinden eines optischen Elementes mit einer Fassung
WO2008064859A2 (en) 2006-12-01 2008-06-05 Carl Zeiss Smt Ag Optical system with an exchangeable, manipulable correction arrangement for reducing image aberrations
DE102007009867A1 (de) * 2007-02-28 2008-09-11 Carl Zeiss Smt Ag Abbildungsvorrichtung mit auswechselbaren Blenden sowie Verfahren hierzu
DE102007031691A1 (de) 2007-07-06 2009-01-08 Carl Zeiss Smt Ag Verfahren zum Betreiben einer Mikrolithographischen Projektionsbelichtunganlagen
US8077388B2 (en) * 2007-09-13 2011-12-13 University Of Utah Research Foundation Light polarization converter for converting linearly polarized light into radially polarized light and related methods
DE102007055567A1 (de) 2007-11-20 2009-05-28 Carl Zeiss Smt Ag Optisches System
DE102008009601A1 (de) * 2008-02-15 2009-08-20 Carl Zeiss Smt Ag Optisches System für eine mikrolithographische Projektionsbelichtungsanlage sowie mikrolithographisches Belichtungsverfahren
EP2202580B1 (en) 2008-12-23 2011-06-22 Carl Zeiss SMT GmbH Illumination system of a microlithographic projection exposure apparatus
US20110037962A1 (en) * 2009-08-17 2011-02-17 Nikon Corporation Polarization converting unit, illumination optical system, exposure apparatus, and device manufacturing method
JP5531518B2 (ja) * 2009-09-08 2014-06-25 株式会社ニコン 偏光変換ユニット、照明光学系、露光装置、およびデバイス製造方法
US8982324B2 (en) * 2009-12-15 2015-03-17 Asml Holding N.V. Polarization designs for lithographic apparatus
DE102009055184B4 (de) 2009-12-22 2011-11-10 Carl Zeiss Smt Gmbh Optisches System, insbesondere einer mikrolithographischen Projektionsbelichtungsanlage
US20110205519A1 (en) * 2010-02-25 2011-08-25 Nikon Corporation Polarization converting unit, illumination optical system, exposure apparatus, and device manufacturing method
US9389519B2 (en) * 2010-02-25 2016-07-12 Nikon Corporation Measuring method and measuring apparatus of pupil transmittance distribution, exposure method and exposure apparatus, and device manufacturing method
NL2006196A (en) * 2010-03-12 2011-09-13 Asml Netherlands Bv Lithographic apparatus and method.
WO2012041339A1 (en) * 2010-09-28 2012-04-05 Carl Zeiss Smt Gmbh Optical system of a microlithographic projection exposure apparatus and method of reducing image placement errors
US8654332B2 (en) * 2011-06-22 2014-02-18 Teledyne Scientific & Imaging, Llc Chip-scale optics module for optical interrogators
DE102012206150B9 (de) 2012-04-16 2014-06-12 Carl Zeiss Smt Gmbh Optisches System, insbesondere einer mikrolithographischen Projektionsbelichtungsanlage
DE102012206151A1 (de) 2012-04-16 2013-05-02 Carl Zeiss Smt Gmbh Optisches System, insbesondere einer mikrolithographischen Projektionsbelichtungsanlage
DE102012206287A1 (de) 2012-04-17 2013-10-17 Carl Zeiss Smt Gmbh Optisches System, insbesondere einer mikrolithographischen Projektionsbelichtungsanlage
DE102012212864A1 (de) 2012-07-23 2013-08-22 Carl Zeiss Smt Gmbh Optisches System, insbesondere einer mikrolithographischen Projektionsbelichtungsanlage
DE102012223230A1 (de) 2012-12-14 2014-02-13 Carl Zeiss Smt Gmbh Optisches System, insbesondere einer mikrolithographischen Projektionsbelichtungsanlage
DE102023210859A1 (de) * 2023-11-02 2025-05-08 Carl Zeiss Smt Gmbh Projektionssystem mit minimierten thermisch induzierten oszillierenden Aberrationen

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2569711B2 (ja) * 1988-04-07 1997-01-08 株式会社ニコン 露光制御装置及び該装置による露光方法
US5233460A (en) 1992-01-31 1993-08-03 Regents Of The University Of California Method and means for reducing speckle in coherent laser pulses
US5442184A (en) 1993-12-10 1995-08-15 Texas Instruments Incorporated System and method for semiconductor processing using polarized radiant energy
US6285443B1 (en) 1993-12-13 2001-09-04 Carl-Zeiss-Stiftung Illuminating arrangement for a projection microlithographic apparatus
EP0658810B1 (de) * 1993-12-13 1998-11-25 Carl Zeiss Beleuchtungseinrichtung für ein optisches System mit einem Reticle-Maskierungssystem
DE19520563A1 (de) * 1995-06-06 1996-12-12 Zeiss Carl Fa Beleuchtungseinrichtung für ein Projektions-Mikrolithographie-Gerät
US5815247A (en) * 1995-09-21 1998-09-29 Siemens Aktiengesellschaft Avoidance of pattern shortening by using off axis illumination with dipole and polarizing apertures
DE19535392A1 (de) * 1995-09-23 1997-03-27 Zeiss Carl Fa Radial polarisationsdrehende optische Anordnung und Mikrolithographie-Projektionsbelichtungsanlage damit
DE19921795A1 (de) 1999-05-11 2000-11-23 Zeiss Carl Fa Projektions-Belichtungsanlage und Belichtungsverfahren der Mikrolithographie
US6392890B1 (en) 2000-12-20 2002-05-21 Nortel Networks Limited Method and device for heat dissipation in an electronics system
TW200412617A (en) * 2002-12-03 2004-07-16 Nikon Corp Optical illumination device, method for adjusting optical illumination device, exposure device and exposure method
EP1668420B1 (en) * 2003-09-26 2008-05-21 Carl Zeiss SMT AG Exposure method as well as projection exposure system for carrying out the method
US6970233B2 (en) * 2003-12-03 2005-11-29 Texas Instruments Incorporated System and method for custom-polarized photolithography illumination
JP4497968B2 (ja) * 2004-03-18 2010-07-07 キヤノン株式会社 照明装置、露光装置及びデバイス製造方法

Similar Documents

Publication Publication Date Title
JP2006041540A5 (enExample)
CN101568884B (zh) 光学系统、具体而言微光刻投射曝光设备的照明系统或投射物镜
JP4414414B2 (ja) リソグラフィ装置およびデバイス製造方法
CN102939566B (zh) 微光刻投射曝光设备的光学系统
TWI342470B (en) Microlithographic projection exposure apparatus and method
JP4795745B2 (ja) マイクロリソグラフィ用投影露光装置のための照明システム
US7929116B2 (en) Polarized radiation in lithographic apparatus and device manufacturing method
TW452677B (en) Projection exposure system and an exposure method in microlithography
US9500956B2 (en) Optical system of a microlithographic projection exposure apparatus, and microlithographic exposure
JP2010192914A5 (enExample)
CN1797202B (zh) 光刻设备中的偏振辐射和器件制造方法
TWI652508B (zh) 照明方法
JP2006018292A (ja) モザイクタイル波長板のための層構造
JP2015518183A5 (enExample)
TW200528927A (en) Stationary and dynamic radial transverse electric polarizer for high numerical aperture systems
TW200306462A (en) Exposure apparatus for irradiating a sensitized substrate
JP6510979B2 (ja) マイクロリソグラフィ投影露光装置の光学系
JP5846471B2 (ja) 偏光影響光学装置及びマイクロリソグラフィ投影露光装置の光学系
JP2016503186A5 (enExample)
CN105404056A (zh) 一种液晶退偏器、制备方法和退偏测试系统
CN102928990A (zh) 改变光束偏振方向二维分布的装置
JP2012504320A5 (enExample)
JP2008277815A5 (enExample)
JP2015534653A5 (enExample)
JP2016510425A (ja) マイクロリソグラフィ投影露光装置の光学系