JP2006019549A5 - - Google Patents

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Publication number
JP2006019549A5
JP2006019549A5 JP2004196455A JP2004196455A JP2006019549A5 JP 2006019549 A5 JP2006019549 A5 JP 2006019549A5 JP 2004196455 A JP2004196455 A JP 2004196455A JP 2004196455 A JP2004196455 A JP 2004196455A JP 2006019549 A5 JP2006019549 A5 JP 2006019549A5
Authority
JP
Japan
Prior art keywords
movement stage
mirror
optical system
fine movement
reflecting
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2004196455A
Other languages
English (en)
Japanese (ja)
Other versions
JP4262153B2 (ja
JP2006019549A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP2004196455A priority Critical patent/JP4262153B2/ja
Priority claimed from JP2004196455A external-priority patent/JP4262153B2/ja
Priority to US11/157,781 priority patent/US7193723B2/en
Priority to EP05254122A priority patent/EP1612608A3/en
Priority to KR1020050058982A priority patent/KR100658572B1/ko
Publication of JP2006019549A publication Critical patent/JP2006019549A/ja
Publication of JP2006019549A5 publication Critical patent/JP2006019549A5/ja
Application granted granted Critical
Publication of JP4262153B2 publication Critical patent/JP4262153B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

JP2004196455A 2004-07-02 2004-07-02 位置決め装置およびそれを用いた露光装置 Expired - Fee Related JP4262153B2 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2004196455A JP4262153B2 (ja) 2004-07-02 2004-07-02 位置決め装置およびそれを用いた露光装置
US11/157,781 US7193723B2 (en) 2004-07-02 2005-06-21 Positioning apparatus and photolithography apparatus including the same
EP05254122A EP1612608A3 (en) 2004-07-02 2005-06-30 Positioning apparatus and photolithography apparatus including the same
KR1020050058982A KR100658572B1 (ko) 2004-07-02 2005-07-01 위치결정장치 및 그것을 포함하는 노광장치

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004196455A JP4262153B2 (ja) 2004-07-02 2004-07-02 位置決め装置およびそれを用いた露光装置

Publications (3)

Publication Number Publication Date
JP2006019549A JP2006019549A (ja) 2006-01-19
JP2006019549A5 true JP2006019549A5 (enExample) 2007-08-16
JP4262153B2 JP4262153B2 (ja) 2009-05-13

Family

ID=34941792

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2004196455A Expired - Fee Related JP4262153B2 (ja) 2004-07-02 2004-07-02 位置決め装置およびそれを用いた露光装置

Country Status (4)

Country Link
US (1) US7193723B2 (enExample)
EP (1) EP1612608A3 (enExample)
JP (1) JP4262153B2 (enExample)
KR (1) KR100658572B1 (enExample)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102009025977A1 (de) 2009-06-16 2010-12-23 Q-Cells Se Solarzelle und Herstellungsverfahren einer Solarzelle
DE102011006055A1 (de) * 2011-03-24 2012-09-27 Carl Zeiss Smt Gmbh Positionsmessvorrichtung sowie Positioniersystem für eine Maskeninspektionseinrichtung
CN102998913B (zh) * 2012-12-27 2015-02-04 苏州大学 同步定位光刻曝光装置及方法
CN103309177B (zh) * 2013-06-19 2015-02-11 清华大学 一种光刻机工件台系统
CN112113509B (zh) * 2019-06-20 2022-06-17 上海微电子装备（集团）股份有限公司 龙门式测量装置及龙门式测量方法

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3531894B2 (ja) * 1996-09-13 2004-05-31 キヤノン株式会社 投影露光装置
US6020964A (en) * 1997-12-02 2000-02-01 Asm Lithography B.V. Interferometer system and lithograph apparatus including an interferometer system
JP3630964B2 (ja) 1997-12-26 2005-03-23 キヤノン株式会社 ステージ装置、およびこれを用いた露光装置ならびにデバイス製造方法
JP2000049066A (ja) * 1998-07-27 2000-02-18 Canon Inc 露光装置およびデバイス製造方法
US6160628A (en) * 1999-06-29 2000-12-12 Nikon Corporation Interferometer system and method for lens column alignment
JP2001160535A (ja) * 1999-09-20 2001-06-12 Nikon Corp 露光装置、及び該装置を用いるデバイス製造方法
JP2001143997A (ja) 1999-11-15 2001-05-25 Canon Inc 位置決め装置、露光装置、及びデバイスの製造方法
JP3762307B2 (ja) 2001-02-15 2006-04-05 キヤノン株式会社 レーザ干渉干渉計システムを含む露光装置
JP2003123832A (ja) 2001-10-11 2003-04-25 Nec Tokin Corp ラミネートフィルム外装蓄電デバイスおよびその製造方法
US7443511B2 (en) * 2003-11-25 2008-10-28 Asml Netherlands B.V. Integrated plane mirror and differential plane mirror interferometer system

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