JP4262153B2 - 位置決め装置およびそれを用いた露光装置 - Google Patents

位置決め装置およびそれを用いた露光装置 Download PDF

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Publication number
JP4262153B2
JP4262153B2 JP2004196455A JP2004196455A JP4262153B2 JP 4262153 B2 JP4262153 B2 JP 4262153B2 JP 2004196455 A JP2004196455 A JP 2004196455A JP 2004196455 A JP2004196455 A JP 2004196455A JP 4262153 B2 JP4262153 B2 JP 4262153B2
Authority
JP
Japan
Prior art keywords
movement stage
mirror
fine movement
optical system
exposure apparatus
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2004196455A
Other languages
English (en)
Japanese (ja)
Other versions
JP2006019549A5 (enExample
JP2006019549A (ja
Inventor
英雄 田中
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2004196455A priority Critical patent/JP4262153B2/ja
Priority to US11/157,781 priority patent/US7193723B2/en
Priority to EP05254122A priority patent/EP1612608A3/en
Priority to KR1020050058982A priority patent/KR100658572B1/ko
Publication of JP2006019549A publication Critical patent/JP2006019549A/ja
Publication of JP2006019549A5 publication Critical patent/JP2006019549A5/ja
Application granted granted Critical
Publication of JP4262153B2 publication Critical patent/JP4262153B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70775—Position control, e.g. interferometers or encoders for determining the stage position
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/24—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures
    • G01B11/2441—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures using interferometry
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7085—Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
    • G03F9/7023—Aligning or positioning in direction perpendicular to substrate surface
    • G03F9/7026—Focusing
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
    • G03F9/7023—Aligning or positioning in direction perpendicular to substrate surface
    • G03F9/703—Gap setting, e.g. in proximity printer
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67242—Apparatus for monitoring, sorting or marking
    • H01L21/67259—Position monitoring, e.g. misposition detection or presence detection

Landscapes

  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Public Health (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Health & Medical Sciences (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2004196455A 2004-07-02 2004-07-02 位置決め装置およびそれを用いた露光装置 Expired - Fee Related JP4262153B2 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2004196455A JP4262153B2 (ja) 2004-07-02 2004-07-02 位置決め装置およびそれを用いた露光装置
US11/157,781 US7193723B2 (en) 2004-07-02 2005-06-21 Positioning apparatus and photolithography apparatus including the same
EP05254122A EP1612608A3 (en) 2004-07-02 2005-06-30 Positioning apparatus and photolithography apparatus including the same
KR1020050058982A KR100658572B1 (ko) 2004-07-02 2005-07-01 위치결정장치 및 그것을 포함하는 노광장치

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004196455A JP4262153B2 (ja) 2004-07-02 2004-07-02 位置決め装置およびそれを用いた露光装置

Publications (3)

Publication Number Publication Date
JP2006019549A JP2006019549A (ja) 2006-01-19
JP2006019549A5 JP2006019549A5 (enExample) 2007-08-16
JP4262153B2 true JP4262153B2 (ja) 2009-05-13

Family

ID=34941792

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2004196455A Expired - Fee Related JP4262153B2 (ja) 2004-07-02 2004-07-02 位置決め装置およびそれを用いた露光装置

Country Status (4)

Country Link
US (1) US7193723B2 (enExample)
EP (1) EP1612608A3 (enExample)
JP (1) JP4262153B2 (enExample)
KR (1) KR100658572B1 (enExample)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102009025977A1 (de) 2009-06-16 2010-12-23 Q-Cells Se Solarzelle und Herstellungsverfahren einer Solarzelle
DE102011006055A1 (de) * 2011-03-24 2012-09-27 Carl Zeiss Smt Gmbh Positionsmessvorrichtung sowie Positioniersystem für eine Maskeninspektionseinrichtung
CN102998913B (zh) * 2012-12-27 2015-02-04 苏州大学 同步定位光刻曝光装置及方法
CN103309177B (zh) * 2013-06-19 2015-02-11 清华大学 一种光刻机工件台系统
CN112113509B (zh) * 2019-06-20 2022-06-17 上海微电子装备（集团）股份有限公司 龙门式测量装置及龙门式测量方法

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3531894B2 (ja) * 1996-09-13 2004-05-31 キヤノン株式会社 投影露光装置
US6020964A (en) * 1997-12-02 2000-02-01 Asm Lithography B.V. Interferometer system and lithograph apparatus including an interferometer system
JP3630964B2 (ja) 1997-12-26 2005-03-23 キヤノン株式会社 ステージ装置、およびこれを用いた露光装置ならびにデバイス製造方法
JP2000049066A (ja) * 1998-07-27 2000-02-18 Canon Inc 露光装置およびデバイス製造方法
US6160628A (en) * 1999-06-29 2000-12-12 Nikon Corporation Interferometer system and method for lens column alignment
JP2001160535A (ja) * 1999-09-20 2001-06-12 Nikon Corp 露光装置、及び該装置を用いるデバイス製造方法
JP2001143997A (ja) 1999-11-15 2001-05-25 Canon Inc 位置決め装置、露光装置、及びデバイスの製造方法
JP3762307B2 (ja) 2001-02-15 2006-04-05 キヤノン株式会社 レーザ干渉干渉計システムを含む露光装置
JP2003123832A (ja) 2001-10-11 2003-04-25 Nec Tokin Corp ラミネートフィルム外装蓄電デバイスおよびその製造方法
US7443511B2 (en) * 2003-11-25 2008-10-28 Asml Netherlands B.V. Integrated plane mirror and differential plane mirror interferometer system

Also Published As

Publication number Publication date
US20060001889A1 (en) 2006-01-05
EP1612608A2 (en) 2006-01-04
KR20060049732A (ko) 2006-05-19
EP1612608A3 (en) 2007-10-31
KR100658572B1 (ko) 2006-12-19
US7193723B2 (en) 2007-03-20
JP2006019549A (ja) 2006-01-19

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