JP2005539389A5 - - Google Patents
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- Publication number
- JP2005539389A5 JP2005539389A5 JP2004537254A JP2004537254A JP2005539389A5 JP 2005539389 A5 JP2005539389 A5 JP 2005539389A5 JP 2004537254 A JP2004537254 A JP 2004537254A JP 2004537254 A JP2004537254 A JP 2004537254A JP 2005539389 A5 JP2005539389 A5 JP 2005539389A5
- Authority
- JP
- Japan
- Prior art keywords
- parts
- ink
- component
- metal
- amount
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000000034 method Methods 0.000 claims 18
- 229910052751 metal Inorganic materials 0.000 claims 9
- 239000002184 metal Substances 0.000 claims 9
- 239000000178 monomer Substances 0.000 claims 5
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 claims 4
- 239000002253 acid Substances 0.000 claims 4
- 239000003999 initiator Substances 0.000 claims 3
- 238000007747 plating Methods 0.000 claims 3
- 239000000758 substrate Substances 0.000 claims 3
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims 2
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 claims 2
- 229910052802 copper Inorganic materials 0.000 claims 2
- 239000010949 copper Substances 0.000 claims 2
- 230000008021 deposition Effects 0.000 claims 2
- JKFSTSLUNHRNNX-UHFFFAOYSA-N 1-o-ethyl 2-o-(2-methylprop-2-enoyl) benzene-1,2-dicarboxylate Chemical compound CCOC(=O)C1=CC=CC=C1C(=O)OC(=O)C(C)=C JKFSTSLUNHRNNX-UHFFFAOYSA-N 0.000 claims 1
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 claims 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 claims 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 claims 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 claims 1
- 239000003513 alkali Substances 0.000 claims 1
- 238000003486 chemical etching Methods 0.000 claims 1
- 239000003086 colorant Substances 0.000 claims 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 claims 1
- 229910052737 gold Inorganic materials 0.000 claims 1
- 239000010931 gold Substances 0.000 claims 1
- 238000007641 inkjet printing Methods 0.000 claims 1
- 239000011133 lead Substances 0.000 claims 1
- 229910052759 nickel Inorganic materials 0.000 claims 1
- 229910052763 palladium Inorganic materials 0.000 claims 1
- 239000002245 particle Substances 0.000 claims 1
- 229920000642 polymer Polymers 0.000 claims 1
- 238000006116 polymerization reaction Methods 0.000 claims 1
- 229910052709 silver Inorganic materials 0.000 claims 1
- 239000004332 silver Substances 0.000 claims 1
- 239000002904 solvent Substances 0.000 claims 1
- 239000004094 surface-active agent Substances 0.000 claims 1
- 239000011135 tin Substances 0.000 claims 1
- 229910052718 tin Inorganic materials 0.000 claims 1
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| GBGB0221891.5A GB0221891D0 (en) | 2002-09-20 | 2002-09-20 | Process |
| PCT/GB2003/003679 WO2004028224A1 (en) | 2002-09-20 | 2003-08-22 | Plating process |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2005539389A JP2005539389A (ja) | 2005-12-22 |
| JP2005539389A5 true JP2005539389A5 (https=) | 2006-09-28 |
| JP4392350B2 JP4392350B2 (ja) | 2009-12-24 |
Family
ID=9944477
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2004537254A Expired - Fee Related JP4392350B2 (ja) | 2002-09-20 | 2003-08-22 | メッキ法 |
Country Status (11)
| Country | Link |
|---|---|
| US (1) | US7314573B2 (https=) |
| EP (1) | EP1543703B1 (https=) |
| JP (1) | JP4392350B2 (https=) |
| KR (1) | KR100961713B1 (https=) |
| CN (1) | CN1695406A (https=) |
| AT (1) | ATE341187T1 (https=) |
| AU (1) | AU2003260730A1 (https=) |
| DE (1) | DE60308705T2 (https=) |
| GB (1) | GB0221891D0 (https=) |
| TW (1) | TWI317251B (https=) |
| WO (1) | WO2004028224A1 (https=) |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| ATE412714T1 (de) * | 2003-05-30 | 2008-11-15 | Fujifilm Imaging Colorants Ltd | Verfahren zum ätzen einer metall- oder metalllegierung oberfläche |
| GB0324947D0 (en) * | 2003-10-25 | 2003-11-26 | Avecia Ltd | Process |
| EP2915856B1 (en) * | 2014-03-03 | 2019-10-16 | Agfa-Gevaert | Etch-resistant inkjet inks for manufacturing conductive patterns |
| CN104494310B (zh) * | 2014-09-16 | 2017-04-12 | 苏州锐发打印技术有限公司 | 用于太阳能电池网格导线制作的3d打印系统及控制方法 |
| KR102787541B1 (ko) | 2015-06-04 | 2025-03-26 | 카티바, 인크. | 금속 표면 상에서 에치 레지스트 패턴의 제조 방법 |
| JP6975463B2 (ja) | 2015-08-13 | 2021-12-01 | カティーバ， インコーポレイテッド | 金属表面上のエッチレジストパターンの製造方法 |
| US10398034B2 (en) | 2016-12-12 | 2019-08-27 | Kateeva, Inc. | Methods of etching conductive features, and related devices and systems |
| EP3786239B1 (en) * | 2019-08-26 | 2023-11-15 | Agfa-Gevaert Nv | Radiation curable composition for plating applications |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4315985A (en) * | 1972-11-30 | 1982-02-16 | International Business Machines Corporation | Fine-line circuit fabrication and photoresist application therefor |
| US4270985A (en) | 1978-07-21 | 1981-06-02 | Dynachem Corporation | Screen printing of photopolymerizable inks |
| US5270368A (en) * | 1992-07-15 | 1993-12-14 | Videojet Systems International, Inc. | Etch-resistant jet ink and process |
| US5721007A (en) * | 1994-09-08 | 1998-02-24 | The Whitaker Corporation | Process for low density additive flexible circuits and harnesses |
| JPH10282662A (ja) | 1997-04-07 | 1998-10-23 | Nippon Kayaku Co Ltd | 液状フォトレジストインク組成物及びその硬化物 |
-
2002
- 2002-09-20 GB GBGB0221891.5A patent/GB0221891D0/en not_active Ceased
-
2003
- 2003-08-22 KR KR1020057004708A patent/KR100961713B1/ko not_active Expired - Fee Related
- 2003-08-22 US US10/528,581 patent/US7314573B2/en not_active Expired - Fee Related
- 2003-08-22 JP JP2004537254A patent/JP4392350B2/ja not_active Expired - Fee Related
- 2003-08-22 DE DE60308705T patent/DE60308705T2/de not_active Expired - Lifetime
- 2003-08-22 EP EP03797363A patent/EP1543703B1/en not_active Expired - Lifetime
- 2003-08-22 CN CNA038252031A patent/CN1695406A/zh active Pending
- 2003-08-22 AT AT03797363T patent/ATE341187T1/de not_active IP Right Cessation
- 2003-08-22 WO PCT/GB2003/003679 patent/WO2004028224A1/en not_active Ceased
- 2003-08-22 AU AU2003260730A patent/AU2003260730A1/en not_active Abandoned
- 2003-09-10 TW TW092125053A patent/TWI317251B/zh not_active IP Right Cessation
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