JP2005538362A5 - - Google Patents

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Publication number
JP2005538362A5
JP2005538362A5 JP2004534827A JP2004534827A JP2005538362A5 JP 2005538362 A5 JP2005538362 A5 JP 2005538362A5 JP 2004534827 A JP2004534827 A JP 2004534827A JP 2004534827 A JP2004534827 A JP 2004534827A JP 2005538362 A5 JP2005538362 A5 JP 2005538362A5
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JP
Japan
Prior art keywords
interferometer
mirror
stage
measurement
axis
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JP2004534827A
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English (en)
Japanese (ja)
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JP4833549B2 (ja
JP2005538362A (ja
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Priority claimed from PCT/US2003/028587 external-priority patent/WO2004023069A1/en
Publication of JP2005538362A publication Critical patent/JP2005538362A/ja
Publication of JP2005538362A5 publication Critical patent/JP2005538362A5/ja
Application granted granted Critical
Publication of JP4833549B2 publication Critical patent/JP4833549B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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JP2004534827A 2002-09-09 2003-09-09 干渉計の誤差の測定および補償 Expired - Fee Related JP4833549B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US40928502P 2002-09-09 2002-09-09
US60/409,285 2002-09-09
PCT/US2003/028587 WO2004023069A1 (en) 2002-09-09 2003-09-09 Measurement and compensation of errors in interferometrs

Publications (3)

Publication Number Publication Date
JP2005538362A JP2005538362A (ja) 2005-12-15
JP2005538362A5 true JP2005538362A5 (enExample) 2011-09-01
JP4833549B2 JP4833549B2 (ja) 2011-12-07

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ID=31978738

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2004534827A Expired - Fee Related JP4833549B2 (ja) 2002-09-09 2003-09-09 干渉計の誤差の測定および補償

Country Status (5)

Country Link
US (1) US7321432B2 (enExample)
JP (1) JP4833549B2 (enExample)
AU (1) AU2003267144A1 (enExample)
DE (1) DE10393243T5 (enExample)
WO (1) WO2004023069A1 (enExample)

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WO2006102234A2 (en) * 2005-03-18 2006-09-28 Zygo Corporation Multi-axis interferometer with procedure and data processing for mirror mapping
US7636166B2 (en) * 2006-01-23 2009-12-22 Zygo Corporation Interferometer system for monitoring an object
US8715909B2 (en) * 2007-10-05 2014-05-06 Infineon Technologies Ag Lithography systems and methods of manufacturing using thereof
US8223342B2 (en) * 2009-03-16 2012-07-17 Alliant Techsystems Inc. Methods and systems for measuring target movement with an interferometer
CN102540738B (zh) * 2010-12-16 2015-02-11 上海微电子装备有限公司 一种光束间不平行角度的补偿方法
CN111971622A (zh) 2018-03-29 2020-11-20 Asml荷兰有限公司 位置测量系统、干涉仪系统和光刻装置
KR102669151B1 (ko) 2018-10-08 2024-05-27 삼성전자주식회사 조합된 모델 함수를 산출하는 방법, 리소그래피 장치 세팅 방법, 리소그래피 방법, 리소그래피 장치
TWI712773B (zh) * 2019-01-09 2020-12-11 國立嘉義大學 雷射干涉儀定位系統
CN111896625B (zh) * 2020-08-17 2023-07-14 中南大学 钢轨伤损实时监测方法及其监测系统
US11566887B1 (en) * 2021-09-03 2023-01-31 Kla Corporation Differential height measurement using interstitial mirror plate

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