DE10393243T5 - Messung und Fehlerausgleichung bei Interferometern - Google Patents
Messung und Fehlerausgleichung bei Interferometern Download PDFInfo
- Publication number
- DE10393243T5 DE10393243T5 DE10393243T DE10393243T DE10393243T5 DE 10393243 T5 DE10393243 T5 DE 10393243T5 DE 10393243 T DE10393243 T DE 10393243T DE 10393243 T DE10393243 T DE 10393243T DE 10393243 T5 DE10393243 T5 DE 10393243T5
- Authority
- DE
- Germany
- Prior art keywords
- axis
- mirror
- interferometer
- measuring
- relative
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Ceased
Links
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- 238000000034 method Methods 0.000 claims abstract description 131
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- 230000005855 radiation Effects 0.000 claims description 69
- 238000005305 interferometry Methods 0.000 claims description 58
- 238000001459 lithography Methods 0.000 claims description 39
- 230000008569 process Effects 0.000 claims description 34
- 239000000758 substrate Substances 0.000 claims description 29
- 238000004519 manufacturing process Methods 0.000 claims description 24
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Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B9/00—Measuring instruments characterised by the use of optical techniques
- G01B9/02—Interferometers
- G01B9/02015—Interferometers characterised by the beam path configuration
- G01B9/02027—Two or more interferometric channels or interferometers
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/30—Measuring arrangements characterised by the use of optical techniques for measuring roughness or irregularity of surfaces
- G01B11/306—Measuring arrangements characterised by the use of optical techniques for measuring roughness or irregularity of surfaces for measuring evenness
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B9/00—Measuring instruments characterised by the use of optical techniques
- G01B9/02—Interferometers
- G01B9/02015—Interferometers characterised by the beam path configuration
- G01B9/02017—Interferometers characterised by the beam path configuration with multiple interactions between the target object and light beams, e.g. beam reflections occurring from different locations
- G01B9/02021—Interferometers characterised by the beam path configuration with multiple interactions between the target object and light beams, e.g. beam reflections occurring from different locations contacting different faces of object, e.g. opposite faces
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B9/00—Measuring instruments characterised by the use of optical techniques
- G01B9/02—Interferometers
- G01B9/02055—Reduction or prevention of errors; Testing; Calibration
- G01B9/0207—Error reduction by correction of the measurement signal based on independently determined error sources, e.g. using a reference interferometer
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B9/00—Measuring instruments characterised by the use of optical techniques
- G01B9/02—Interferometers
- G01B9/02083—Interferometers characterised by particular signal processing and presentation
- G01B9/02084—Processing in the Fourier or frequency domain when not imaged in the frequency domain
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70775—Position control, e.g. interferometers or encoders for determining the stage position
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B2290/00—Aspects of interferometers not specifically covered by any group under G01B9/02
- G01B2290/45—Multiple detectors for detecting interferometer signals
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Signal Processing (AREA)
- Mathematical Physics (AREA)
- Length Measuring Devices By Optical Means (AREA)
- Instruments For Measurement Of Length By Optical Means (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US40928502P | 2002-09-09 | 2002-09-09 | |
| US60/409,285 | 2002-09-09 | ||
| PCT/US2003/028587 WO2004023069A1 (en) | 2002-09-09 | 2003-09-09 | Measurement and compensation of errors in interferometrs |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| DE10393243T5 true DE10393243T5 (de) | 2005-09-01 |
Family
ID=31978738
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE10393243T Ceased DE10393243T5 (de) | 2002-09-09 | 2003-09-09 | Messung und Fehlerausgleichung bei Interferometern |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US7321432B2 (enExample) |
| JP (1) | JP4833549B2 (enExample) |
| AU (1) | AU2003267144A1 (enExample) |
| DE (1) | DE10393243T5 (enExample) |
| WO (1) | WO2004023069A1 (enExample) |
Families Citing this family (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2004113826A2 (en) * | 2003-06-19 | 2004-12-29 | Zygo Corporation | Compensation for imperfections in a measurement object and for beam misalignments in plane mirror interferometers |
| WO2005045529A2 (en) * | 2003-11-04 | 2005-05-19 | Zygo Corporation | Characterization and compensation of errors in multi-axis interferometry system |
| WO2006041984A2 (en) * | 2004-10-06 | 2006-04-20 | Zygo Corporation | Error correction in interferometry systems |
| WO2006102234A2 (en) * | 2005-03-18 | 2006-09-28 | Zygo Corporation | Multi-axis interferometer with procedure and data processing for mirror mapping |
| US7636166B2 (en) * | 2006-01-23 | 2009-12-22 | Zygo Corporation | Interferometer system for monitoring an object |
| US8715909B2 (en) * | 2007-10-05 | 2014-05-06 | Infineon Technologies Ag | Lithography systems and methods of manufacturing using thereof |
| US8223342B2 (en) * | 2009-03-16 | 2012-07-17 | Alliant Techsystems Inc. | Methods and systems for measuring target movement with an interferometer |
| CN102540738B (zh) * | 2010-12-16 | 2015-02-11 | 上海微电子装备有限公司 | 一种光束间不平行角度的补偿方法 |
| CN111971622A (zh) | 2018-03-29 | 2020-11-20 | Asml荷兰有限公司 | 位置测量系统、干涉仪系统和光刻装置 |
| KR102669151B1 (ko) | 2018-10-08 | 2024-05-27 | 삼성전자주식회사 | 조합된 모델 함수를 산출하는 방법, 리소그래피 장치 세팅 방법, 리소그래피 방법, 리소그래피 장치 |
| TWI712773B (zh) * | 2019-01-09 | 2020-12-11 | 國立嘉義大學 | 雷射干涉儀定位系統 |
| CN111896625B (zh) * | 2020-08-17 | 2023-07-14 | 中南大学 | 钢轨伤损实时监测方法及其监测系统 |
| US11566887B1 (en) * | 2021-09-03 | 2023-01-31 | Kla Corporation | Differential height measurement using interstitial mirror plate |
Family Cites Families (44)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5998446U (ja) * | 1982-12-22 | 1984-07-03 | 株式会社日立製作所 | 縮小投影露光装置 |
| US4711573A (en) * | 1983-03-07 | 1987-12-08 | Beckman Instruments, Inc. | Dynamic mirror alignment control |
| US4606638A (en) * | 1983-11-03 | 1986-08-19 | Zygo Corporation | Distance measuring interferometer and method of use |
| US4662750A (en) * | 1984-03-14 | 1987-05-05 | Barger Richard L | Angle sensitive interferometer and control method and apparatus |
| US4802765A (en) * | 1986-06-12 | 1989-02-07 | Zygo Corporation | Differential plane mirror having beamsplitter/beam folder assembly |
| US4790651A (en) * | 1987-09-30 | 1988-12-13 | Chesapeake Laser Systems, Inc. | Tracking laser interferometer |
| US4859066A (en) * | 1988-07-08 | 1989-08-22 | Zygo Corporation | Linear and angular displacement measuring interferometer |
| US4881816A (en) * | 1988-07-08 | 1989-11-21 | Zygo, Corporation | Linear and angular displacement measuring interferometer |
| JP2704734B2 (ja) * | 1988-09-05 | 1998-01-26 | キヤノン株式会社 | ステージ位置決め補正方法及び装置 |
| US5064289A (en) * | 1989-02-23 | 1991-11-12 | Hewlett-Packard Company | Linear-and-angular measuring plane mirror interferometer |
| JP3295846B2 (ja) * | 1989-06-08 | 2002-06-24 | 株式会社ニコン | 位置測定方法、位置測定装置、位置決め方法、位置決め装置、および露光装置 |
| US5151749A (en) * | 1989-06-08 | 1992-09-29 | Nikon Corporation | Method of and apparatus for measuring coordinate position and positioning an object |
| US5187543A (en) * | 1990-01-19 | 1993-02-16 | Zygo Corporation | Differential displacement measuring interferometer |
| DE69115914T2 (de) * | 1990-08-31 | 1996-05-30 | Commw Scient Ind Res Org | Interferenzmikroskop |
| NL9100215A (nl) * | 1991-02-07 | 1992-09-01 | Asm Lithography Bv | Inrichting voor het repeterend afbeelden van een maskerpatroon op een substraat. |
| US5363196A (en) * | 1992-01-10 | 1994-11-08 | Ultratech Stepper, Inc. | Apparatus for measuring a departure from flatness or straightness of a nominally-plane mirror for a precision X-Y movable-stage |
| US5408318A (en) * | 1993-08-02 | 1995-04-18 | Nearfield Systems Incorporated | Wide range straightness measuring stem using a polarized multiplexed interferometer and centered shift measurement of beam polarization components |
| JPH08117083A (ja) | 1994-10-21 | 1996-05-14 | Mitsuru Yoshida | スリッパ自動反転機 |
| US5663893A (en) * | 1995-05-03 | 1997-09-02 | Microunity Systems Engineering, Inc. | Method for generating proximity correction features for a lithographic mask pattern |
| US5757489A (en) * | 1995-08-24 | 1998-05-26 | Nikon Corporation | Interferometric apparatus for measuring a physical value |
| US5663793A (en) * | 1995-09-05 | 1997-09-02 | Zygo Corporation | Homodyne interferometric receiver and calibration method having improved accuracy and functionality |
| JP3653827B2 (ja) * | 1995-10-20 | 2005-06-02 | 株式会社ニコン | 干渉計 |
| JP3221823B2 (ja) * | 1995-11-24 | 2001-10-22 | キヤノン株式会社 | 投影露光装置およびこれを用いた露光方法ならびに半導体製造方法 |
| JPH09162113A (ja) * | 1995-12-04 | 1997-06-20 | Nikon Corp | 直交度測定方法及びステージ装置並びに露光装置 |
| JP3689949B2 (ja) * | 1995-12-19 | 2005-08-31 | 株式会社ニコン | 投影露光装置、及び該投影露光装置を用いたパターン形成方法 |
| EP0824722B1 (en) * | 1996-03-06 | 2001-07-25 | Asm Lithography B.V. | Differential interferometer system and lithographic step-and-scan apparatus provided with such a system |
| JP3854640B2 (ja) * | 1996-03-06 | 2006-12-06 | 株式会社 日立製作所 | 半導体素子製造方法 |
| JPH09275072A (ja) * | 1996-04-05 | 1997-10-21 | Nikon Corp | 移動鏡の真直度誤差補正方法及びステージ装置 |
| DE19637777C1 (de) * | 1996-09-17 | 1997-11-20 | Leica Mikroskopie & Syst | Verfahren und Vorrichtung zur Fehlerkorrektur eines Heterodyn-Interferometers |
| US5724136A (en) * | 1996-10-15 | 1998-03-03 | Zygo Corporation | Interferometric apparatus for measuring motions of a stage relative to fixed reflectors |
| US5757160A (en) * | 1996-12-23 | 1998-05-26 | Svg Lithography Systems, Inc. | Moving interferometer wafer stage |
| JPH10260009A (ja) | 1997-03-21 | 1998-09-29 | Nikon Corp | 座標測定装置 |
| US6020964A (en) * | 1997-12-02 | 2000-02-01 | Asm Lithography B.V. | Interferometer system and lithograph apparatus including an interferometer system |
| US6236507B1 (en) * | 1998-04-17 | 2001-05-22 | Zygo Corporation | Apparatus to transform two nonparallel propagating optical beam components into two orthogonally polarized beam components |
| US6330105B1 (en) * | 1998-05-29 | 2001-12-11 | Litton Systems, Inc. | Double-pass fully isolated broadband optical signal source for fiber optic interferometric sensors |
| JP4065468B2 (ja) * | 1998-06-30 | 2008-03-26 | キヤノン株式会社 | 露光装置及びこれを用いたデバイスの製造方法 |
| US6181420B1 (en) * | 1998-10-06 | 2001-01-30 | Zygo Corporation | Interferometry system having reduced cyclic errors |
| US6137574A (en) * | 1999-03-15 | 2000-10-24 | Zygo Corporation | Systems and methods for characterizing and correcting cyclic errors in distance measuring and dispersion interferometry |
| US6246481B1 (en) * | 1999-11-19 | 2001-06-12 | Zygo Corporation | Systems and methods for quantifying nonlinearities in interferometry systems |
| US6252668B1 (en) * | 1999-11-19 | 2001-06-26 | Zygo Corporation | Systems and methods for quantifying nonlinearities in interferometry systems |
| WO2001090686A1 (en) | 2000-05-19 | 2001-11-29 | Zygo Corporation | In-situ mirror characterization |
| US6747744B2 (en) * | 2000-11-20 | 2004-06-08 | Zygo Corporation | Interferometric servo control system for stage metrology |
| JP2002365016A (ja) * | 2001-06-07 | 2002-12-18 | Nikon Corp | 干渉計を用いた位置測定方法、干渉式位置測定装置、露光装置及び露光方法 |
| US20040061869A1 (en) * | 2002-07-29 | 2004-04-01 | Hill Henry A. | Compensation for errors in off-axis interferometric measurements |
-
2003
- 2003-09-09 AU AU2003267144A patent/AU2003267144A1/en not_active Abandoned
- 2003-09-09 DE DE10393243T patent/DE10393243T5/de not_active Ceased
- 2003-09-09 WO PCT/US2003/028587 patent/WO2004023069A1/en not_active Ceased
- 2003-09-09 US US10/659,103 patent/US7321432B2/en not_active Expired - Fee Related
- 2003-09-09 JP JP2004534827A patent/JP4833549B2/ja not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| WO2004023069A1 (en) | 2004-03-18 |
| JP4833549B2 (ja) | 2011-12-07 |
| US20040085546A1 (en) | 2004-05-06 |
| US7321432B2 (en) | 2008-01-22 |
| JP2005538362A (ja) | 2005-12-15 |
| AU2003267144A1 (en) | 2004-03-29 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| 8110 | Request for examination paragraph 44 | ||
| R002 | Refusal decision in examination/registration proceedings | ||
| R003 | Refusal decision now final |