JP4833549B2 - 干渉計の誤差の測定および補償 - Google Patents

干渉計の誤差の測定および補償 Download PDF

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Publication number
JP4833549B2
JP4833549B2 JP2004534827A JP2004534827A JP4833549B2 JP 4833549 B2 JP4833549 B2 JP 4833549B2 JP 2004534827 A JP2004534827 A JP 2004534827A JP 2004534827 A JP2004534827 A JP 2004534827A JP 4833549 B2 JP4833549 B2 JP 4833549B2
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Prior art keywords
interferometer
mirror
stage
measurement
axis
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JP2004534827A
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Japanese (ja)
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JP2005538362A5 (enExample
JP2005538362A (ja
Inventor
エイ． ヒル、ヘンリー
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Zygo Corp
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Zygo Corp
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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02015—Interferometers characterised by the beam path configuration
    • G01B9/02027—Two or more interferometric channels or interferometers
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/30—Measuring arrangements characterised by the use of optical techniques for measuring roughness or irregularity of surfaces
    • G01B11/306—Measuring arrangements characterised by the use of optical techniques for measuring roughness or irregularity of surfaces for measuring evenness
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02015—Interferometers characterised by the beam path configuration
    • G01B9/02017—Interferometers characterised by the beam path configuration with multiple interactions between the target object and light beams, e.g. beam reflections occurring from different locations
    • G01B9/02021—Interferometers characterised by the beam path configuration with multiple interactions between the target object and light beams, e.g. beam reflections occurring from different locations contacting different faces of object, e.g. opposite faces
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02055—Reduction or prevention of errors; Testing; Calibration
    • G01B9/0207—Error reduction by correction of the measurement signal based on independently determined error sources, e.g. using a reference interferometer
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02083—Interferometers characterised by particular signal processing and presentation
    • G01B9/02084—Processing in the Fourier or frequency domain when not imaged in the frequency domain
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70775—Position control, e.g. interferometers or encoders for determining the stage position
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B2290/00—Aspects of interferometers not specifically covered by any group under G01B9/02
    • G01B2290/45—Multiple detectors for detecting interferometer signals

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Signal Processing (AREA)
  • Mathematical Physics (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Instruments For Measurement Of Length By Optical Means (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2004534827A 2002-09-09 2003-09-09 干渉計の誤差の測定および補償 Expired - Fee Related JP4833549B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US40928502P 2002-09-09 2002-09-09
US60/409,285 2002-09-09
PCT/US2003/028587 WO2004023069A1 (en) 2002-09-09 2003-09-09 Measurement and compensation of errors in interferometrs

Publications (3)

Publication Number Publication Date
JP2005538362A JP2005538362A (ja) 2005-12-15
JP2005538362A5 JP2005538362A5 (enExample) 2011-09-01
JP4833549B2 true JP4833549B2 (ja) 2011-12-07

Family

ID=31978738

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2004534827A Expired - Fee Related JP4833549B2 (ja) 2002-09-09 2003-09-09 干渉計の誤差の測定および補償

Country Status (5)

Country Link
US (1) US7321432B2 (enExample)
JP (1) JP4833549B2 (enExample)
AU (1) AU2003267144A1 (enExample)
DE (1) DE10393243T5 (enExample)
WO (1) WO2004023069A1 (enExample)

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WO2004113826A2 (en) * 2003-06-19 2004-12-29 Zygo Corporation Compensation for imperfections in a measurement object and for beam misalignments in plane mirror interferometers
WO2005045529A2 (en) * 2003-11-04 2005-05-19 Zygo Corporation Characterization and compensation of errors in multi-axis interferometry system
WO2006041984A2 (en) * 2004-10-06 2006-04-20 Zygo Corporation Error correction in interferometry systems
WO2006102234A2 (en) * 2005-03-18 2006-09-28 Zygo Corporation Multi-axis interferometer with procedure and data processing for mirror mapping
US7636166B2 (en) * 2006-01-23 2009-12-22 Zygo Corporation Interferometer system for monitoring an object
US8715909B2 (en) * 2007-10-05 2014-05-06 Infineon Technologies Ag Lithography systems and methods of manufacturing using thereof
US8223342B2 (en) * 2009-03-16 2012-07-17 Alliant Techsystems Inc. Methods and systems for measuring target movement with an interferometer
CN102540738B (zh) * 2010-12-16 2015-02-11 上海微电子装备有限公司 一种光束间不平行角度的补偿方法
CN111971622A (zh) 2018-03-29 2020-11-20 Asml荷兰有限公司 位置测量系统、干涉仪系统和光刻装置
KR102669151B1 (ko) 2018-10-08 2024-05-27 삼성전자주식회사 조합된 모델 함수를 산출하는 방법, 리소그래피 장치 세팅 방법, 리소그래피 방법, 리소그래피 장치
TWI712773B (zh) * 2019-01-09 2020-12-11 國立嘉義大學 雷射干涉儀定位系統
CN111896625B (zh) * 2020-08-17 2023-07-14 中南大学 钢轨伤损实时监测方法及其监测系统
US11566887B1 (en) * 2021-09-03 2023-01-31 Kla Corporation Differential height measurement using interstitial mirror plate

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Publication number Publication date
WO2004023069A1 (en) 2004-03-18
US20040085546A1 (en) 2004-05-06
US7321432B2 (en) 2008-01-22
JP2005538362A (ja) 2005-12-15
AU2003267144A1 (en) 2004-03-29
DE10393243T5 (de) 2005-09-01

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