AU2003267144A1 - Measurement and compensation of errors in interferometrs - Google Patents

Measurement and compensation of errors in interferometrs

Info

Publication number
AU2003267144A1
AU2003267144A1 AU2003267144A AU2003267144A AU2003267144A1 AU 2003267144 A1 AU2003267144 A1 AU 2003267144A1 AU 2003267144 A AU2003267144 A AU 2003267144A AU 2003267144 A AU2003267144 A AU 2003267144A AU 2003267144 A1 AU2003267144 A1 AU 2003267144A1
Authority
AU
Australia
Prior art keywords
interferometrs
compensation
errors
measurement
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2003267144A
Other languages
English (en)
Inventor
Henry A. Hill
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Zygo Corp
Original Assignee
Zygo Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Zygo Corp filed Critical Zygo Corp
Publication of AU2003267144A1 publication Critical patent/AU2003267144A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02015—Interferometers characterised by the beam path configuration
    • G01B9/02027—Two or more interferometric channels or interferometers
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/30—Measuring arrangements characterised by the use of optical techniques for measuring roughness or irregularity of surfaces
    • G01B11/306—Measuring arrangements characterised by the use of optical techniques for measuring roughness or irregularity of surfaces for measuring evenness
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02015—Interferometers characterised by the beam path configuration
    • G01B9/02017—Interferometers characterised by the beam path configuration with multiple interactions between the target object and light beams, e.g. beam reflections occurring from different locations
    • G01B9/02021—Interferometers characterised by the beam path configuration with multiple interactions between the target object and light beams, e.g. beam reflections occurring from different locations contacting different faces of object, e.g. opposite faces
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02055—Reduction or prevention of errors; Testing; Calibration
    • G01B9/0207—Error reduction by correction of the measurement signal based on independently determined error sources, e.g. using a reference interferometer
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02083—Interferometers characterised by particular signal processing and presentation
    • G01B9/02084—Processing in the Fourier or frequency domain when not imaged in the frequency domain
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70775—Position control, e.g. interferometers or encoders for determining the stage position
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B2290/00—Aspects of interferometers not specifically covered by any group under G01B9/02
    • G01B2290/45—Multiple detectors for detecting interferometer signals

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Signal Processing (AREA)
  • Mathematical Physics (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Instruments For Measurement Of Length By Optical Means (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
AU2003267144A 2002-09-09 2003-09-09 Measurement and compensation of errors in interferometrs Abandoned AU2003267144A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US40928502P 2002-09-09 2002-09-09
US60/409,285 2002-09-09
PCT/US2003/028587 WO2004023069A1 (en) 2002-09-09 2003-09-09 Measurement and compensation of errors in interferometrs

Publications (1)

Publication Number Publication Date
AU2003267144A1 true AU2003267144A1 (en) 2004-03-29

Family

ID=31978738

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2003267144A Abandoned AU2003267144A1 (en) 2002-09-09 2003-09-09 Measurement and compensation of errors in interferometrs

Country Status (5)

Country Link
US (1) US7321432B2 (enExample)
JP (1) JP4833549B2 (enExample)
AU (1) AU2003267144A1 (enExample)
DE (1) DE10393243T5 (enExample)
WO (1) WO2004023069A1 (enExample)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2004113826A2 (en) * 2003-06-19 2004-12-29 Zygo Corporation Compensation for imperfections in a measurement object and for beam misalignments in plane mirror interferometers
WO2005045529A2 (en) * 2003-11-04 2005-05-19 Zygo Corporation Characterization and compensation of errors in multi-axis interferometry system
WO2006041984A2 (en) * 2004-10-06 2006-04-20 Zygo Corporation Error correction in interferometry systems
WO2006102234A2 (en) * 2005-03-18 2006-09-28 Zygo Corporation Multi-axis interferometer with procedure and data processing for mirror mapping
US7636166B2 (en) * 2006-01-23 2009-12-22 Zygo Corporation Interferometer system for monitoring an object
US8715909B2 (en) * 2007-10-05 2014-05-06 Infineon Technologies Ag Lithography systems and methods of manufacturing using thereof
US8223342B2 (en) * 2009-03-16 2012-07-17 Alliant Techsystems Inc. Methods and systems for measuring target movement with an interferometer
CN102540738B (zh) * 2010-12-16 2015-02-11 上海微电子装备有限公司 一种光束间不平行角度的补偿方法
CN111971622A (zh) 2018-03-29 2020-11-20 Asml荷兰有限公司 位置测量系统、干涉仪系统和光刻装置
KR102669151B1 (ko) 2018-10-08 2024-05-27 삼성전자주식회사 조합된 모델 함수를 산출하는 방법, 리소그래피 장치 세팅 방법, 리소그래피 방법, 리소그래피 장치
TWI712773B (zh) * 2019-01-09 2020-12-11 國立嘉義大學 雷射干涉儀定位系統
CN111896625B (zh) * 2020-08-17 2023-07-14 中南大学 钢轨伤损实时监测方法及其监测系统
US11566887B1 (en) * 2021-09-03 2023-01-31 Kla Corporation Differential height measurement using interstitial mirror plate

Family Cites Families (44)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5998446U (ja) * 1982-12-22 1984-07-03 株式会社日立製作所 縮小投影露光装置
US4711573A (en) * 1983-03-07 1987-12-08 Beckman Instruments, Inc. Dynamic mirror alignment control
US4606638A (en) * 1983-11-03 1986-08-19 Zygo Corporation Distance measuring interferometer and method of use
US4662750A (en) * 1984-03-14 1987-05-05 Barger Richard L Angle sensitive interferometer and control method and apparatus
US4802765A (en) * 1986-06-12 1989-02-07 Zygo Corporation Differential plane mirror having beamsplitter/beam folder assembly
US4790651A (en) * 1987-09-30 1988-12-13 Chesapeake Laser Systems, Inc. Tracking laser interferometer
US4859066A (en) * 1988-07-08 1989-08-22 Zygo Corporation Linear and angular displacement measuring interferometer
US4881816A (en) * 1988-07-08 1989-11-21 Zygo, Corporation Linear and angular displacement measuring interferometer
JP2704734B2 (ja) * 1988-09-05 1998-01-26 キヤノン株式会社 ステージ位置決め補正方法及び装置
US5064289A (en) * 1989-02-23 1991-11-12 Hewlett-Packard Company Linear-and-angular measuring plane mirror interferometer
JP3295846B2 (ja) * 1989-06-08 2002-06-24 株式会社ニコン 位置測定方法、位置測定装置、位置決め方法、位置決め装置、および露光装置
US5151749A (en) * 1989-06-08 1992-09-29 Nikon Corporation Method of and apparatus for measuring coordinate position and positioning an object
US5187543A (en) * 1990-01-19 1993-02-16 Zygo Corporation Differential displacement measuring interferometer
DE69115914T2 (de) * 1990-08-31 1996-05-30 Commw Scient Ind Res Org Interferenzmikroskop
NL9100215A (nl) * 1991-02-07 1992-09-01 Asm Lithography Bv Inrichting voor het repeterend afbeelden van een maskerpatroon op een substraat.
US5363196A (en) * 1992-01-10 1994-11-08 Ultratech Stepper, Inc. Apparatus for measuring a departure from flatness or straightness of a nominally-plane mirror for a precision X-Y movable-stage
US5408318A (en) * 1993-08-02 1995-04-18 Nearfield Systems Incorporated Wide range straightness measuring stem using a polarized multiplexed interferometer and centered shift measurement of beam polarization components
JPH08117083A (ja) 1994-10-21 1996-05-14 Mitsuru Yoshida スリッパ自動反転機
US5663893A (en) * 1995-05-03 1997-09-02 Microunity Systems Engineering, Inc. Method for generating proximity correction features for a lithographic mask pattern
US5757489A (en) * 1995-08-24 1998-05-26 Nikon Corporation Interferometric apparatus for measuring a physical value
US5663793A (en) * 1995-09-05 1997-09-02 Zygo Corporation Homodyne interferometric receiver and calibration method having improved accuracy and functionality
JP3653827B2 (ja) * 1995-10-20 2005-06-02 株式会社ニコン 干渉計
JP3221823B2 (ja) * 1995-11-24 2001-10-22 キヤノン株式会社 投影露光装置およびこれを用いた露光方法ならびに半導体製造方法
JPH09162113A (ja) * 1995-12-04 1997-06-20 Nikon Corp 直交度測定方法及びステージ装置並びに露光装置
JP3689949B2 (ja) * 1995-12-19 2005-08-31 株式会社ニコン 投影露光装置、及び該投影露光装置を用いたパターン形成方法
EP0824722B1 (en) * 1996-03-06 2001-07-25 Asm Lithography B.V. Differential interferometer system and lithographic step-and-scan apparatus provided with such a system
JP3854640B2 (ja) * 1996-03-06 2006-12-06 株式会社 日立製作所 半導体素子製造方法
JPH09275072A (ja) * 1996-04-05 1997-10-21 Nikon Corp 移動鏡の真直度誤差補正方法及びステージ装置
DE19637777C1 (de) * 1996-09-17 1997-11-20 Leica Mikroskopie & Syst Verfahren und Vorrichtung zur Fehlerkorrektur eines Heterodyn-Interferometers
US5724136A (en) * 1996-10-15 1998-03-03 Zygo Corporation Interferometric apparatus for measuring motions of a stage relative to fixed reflectors
US5757160A (en) * 1996-12-23 1998-05-26 Svg Lithography Systems, Inc. Moving interferometer wafer stage
JPH10260009A (ja) 1997-03-21 1998-09-29 Nikon Corp 座標測定装置
US6020964A (en) * 1997-12-02 2000-02-01 Asm Lithography B.V. Interferometer system and lithograph apparatus including an interferometer system
US6236507B1 (en) * 1998-04-17 2001-05-22 Zygo Corporation Apparatus to transform two nonparallel propagating optical beam components into two orthogonally polarized beam components
US6330105B1 (en) * 1998-05-29 2001-12-11 Litton Systems, Inc. Double-pass fully isolated broadband optical signal source for fiber optic interferometric sensors
JP4065468B2 (ja) * 1998-06-30 2008-03-26 キヤノン株式会社 露光装置及びこれを用いたデバイスの製造方法
US6181420B1 (en) * 1998-10-06 2001-01-30 Zygo Corporation Interferometry system having reduced cyclic errors
US6137574A (en) * 1999-03-15 2000-10-24 Zygo Corporation Systems and methods for characterizing and correcting cyclic errors in distance measuring and dispersion interferometry
US6246481B1 (en) * 1999-11-19 2001-06-12 Zygo Corporation Systems and methods for quantifying nonlinearities in interferometry systems
US6252668B1 (en) * 1999-11-19 2001-06-26 Zygo Corporation Systems and methods for quantifying nonlinearities in interferometry systems
WO2001090686A1 (en) 2000-05-19 2001-11-29 Zygo Corporation In-situ mirror characterization
US6747744B2 (en) * 2000-11-20 2004-06-08 Zygo Corporation Interferometric servo control system for stage metrology
JP2002365016A (ja) * 2001-06-07 2002-12-18 Nikon Corp 干渉計を用いた位置測定方法、干渉式位置測定装置、露光装置及び露光方法
US20040061869A1 (en) * 2002-07-29 2004-04-01 Hill Henry A. Compensation for errors in off-axis interferometric measurements

Also Published As

Publication number Publication date
WO2004023069A1 (en) 2004-03-18
JP4833549B2 (ja) 2011-12-07
US20040085546A1 (en) 2004-05-06
US7321432B2 (en) 2008-01-22
JP2005538362A (ja) 2005-12-15
DE10393243T5 (de) 2005-09-01

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Legal Events

Date Code Title Description
MK6 Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase