JP2005525548A5 - - Google Patents
Download PDFInfo
- Publication number
- JP2005525548A5 JP2005525548A5 JP2004503890A JP2004503890A JP2005525548A5 JP 2005525548 A5 JP2005525548 A5 JP 2005525548A5 JP 2004503890 A JP2004503890 A JP 2004503890A JP 2004503890 A JP2004503890 A JP 2004503890A JP 2005525548 A5 JP2005525548 A5 JP 2005525548A5
- Authority
- JP
- Japan
- Prior art keywords
- interferometer
- measurement object
- wafer
- relative
- defect
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000000034 method Methods 0.000 claims 57
- 238000005259 measurement Methods 0.000 claims 35
- 230000003287 optical effect Effects 0.000 claims 19
- 230000007547 defect Effects 0.000 claims 13
- 230000005855 radiation Effects 0.000 claims 13
- 238000004519 manufacturing process Methods 0.000 claims 10
- 238000001459 lithography Methods 0.000 claims 7
- 238000012544 monitoring process Methods 0.000 claims 7
- 239000000758 substrate Substances 0.000 claims 7
- 230000000694 effects Effects 0.000 claims 5
- 238000003384 imaging method Methods 0.000 claims 5
- 238000006073 displacement reaction Methods 0.000 claims 3
- 238000005286 illumination Methods 0.000 claims 2
- 238000000059 patterning Methods 0.000 claims 2
- 238000005305 interferometry Methods 0.000 claims 1
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US37800402P | 2002-05-13 | 2002-05-13 | |
| PCT/US2003/014915 WO2003095940A2 (en) | 2002-05-13 | 2003-05-13 | Compensation for geometric effects of beam misalignments in plane mirror interferometers |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2005525548A JP2005525548A (ja) | 2005-08-25 |
| JP2005525548A5 true JP2005525548A5 (enExample) | 2006-06-29 |
Family
ID=29420359
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2004503890A Pending JP2005525548A (ja) | 2002-05-13 | 2003-05-13 | 平面ミラー干渉計におけるビーム・ミスアライメントの幾何学的影響の補償 |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US7330274B2 (enExample) |
| JP (1) | JP2005525548A (enExample) |
| AU (1) | AU2003234413A1 (enExample) |
| WO (1) | WO2003095940A2 (enExample) |
Families Citing this family (19)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2004113826A2 (en) | 2003-06-19 | 2004-12-29 | Zygo Corporation | Compensation for imperfections in a measurement object and for beam misalignments in plane mirror interferometers |
| WO2005045529A2 (en) * | 2003-11-04 | 2005-05-19 | Zygo Corporation | Characterization and compensation of errors in multi-axis interferometry system |
| WO2006041984A2 (en) * | 2004-10-06 | 2006-04-20 | Zygo Corporation | Error correction in interferometry systems |
| US7405833B2 (en) * | 2004-11-05 | 2008-07-29 | Zygo Corporation | Method for calibration and removal of wavefront errors |
| WO2006102234A2 (en) * | 2005-03-18 | 2006-09-28 | Zygo Corporation | Multi-axis interferometer with procedure and data processing for mirror mapping |
| US7359057B2 (en) * | 2005-08-26 | 2008-04-15 | Ball Aerospace & Technologies Corp. | Method and apparatus for measuring small shifts in optical wavelengths |
| JP4659019B2 (ja) * | 2007-12-21 | 2011-03-30 | 大学共同利用機関法人自然科学研究機構 | 波面センサ |
| US8934104B2 (en) * | 2010-01-22 | 2015-01-13 | Universitaet Stuttgart | Method and arrangement for robust interferometry for detecting a feature of an object |
| CN102834766B (zh) * | 2010-04-01 | 2015-04-22 | 皇家飞利浦电子股份有限公司 | 激光扫描系统、毛发切割设备和相应的方法 |
| US9213227B2 (en) * | 2011-08-18 | 2015-12-15 | Nikon Corporation | Custom color or polarization sensitive CCD for separating multiple signals in autofocus projection system |
| DE102016014802B4 (de) | 2016-12-13 | 2018-09-27 | Universität Stuttgart | Anordnung und Verfahren zur robusten Zweistrahl-Interferometrie mit einer Dreifach-Reflexions-Anordnung |
| US10883816B2 (en) | 2017-03-22 | 2021-01-05 | Asml Netherlands B.V. | Position measurement system, zeroing method, lithographic apparatus and device manufacturing method |
| US10998163B2 (en) * | 2018-05-11 | 2021-05-04 | University Of Maryland, College Park | Cryogenic trapped-ion system |
| CN112013972B (zh) * | 2019-05-28 | 2024-03-01 | 中国科学院上海光学精密机械研究所 | 横向剪切干涉波前传感器的剪切量标定装置及方法 |
| CN110553580B (zh) * | 2019-06-04 | 2022-05-20 | 南京英特飞光电技术有限公司 | 一种倾斜入射相移干涉仪和直角棱镜大面测量方法 |
| CN110441311B (zh) * | 2019-07-22 | 2021-10-08 | 中国科学院上海光学精密机械研究所 | 用于多物面成像的多轴多焦镜头 |
| CN111707616B (zh) * | 2020-06-30 | 2023-02-21 | 西安工业大学 | 角分辨散射检测装置的多轴运动系统和检测方法 |
| US20240053136A1 (en) * | 2020-12-18 | 2024-02-15 | Rapid Phenotyping Pty Limited | Method of Processing Interferometry Signal, and Associated Interferometer |
| CN113607047B (zh) * | 2021-08-04 | 2022-04-22 | 中国科学院长春光学精密机械与物理研究所 | 外差干涉信号模拟系统 |
Family Cites Families (43)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4790651A (en) * | 1987-09-30 | 1988-12-13 | Chesapeake Laser Systems, Inc. | Tracking laser interferometer |
| JP2704734B2 (ja) * | 1988-09-05 | 1998-01-26 | キヤノン株式会社 | ステージ位置決め補正方法及び装置 |
| US5064289A (en) * | 1989-02-23 | 1991-11-12 | Hewlett-Packard Company | Linear-and-angular measuring plane mirror interferometer |
| US5151749A (en) * | 1989-06-08 | 1992-09-29 | Nikon Corporation | Method of and apparatus for measuring coordinate position and positioning an object |
| JP3295846B2 (ja) * | 1989-06-08 | 2002-06-24 | 株式会社ニコン | 位置測定方法、位置測定装置、位置決め方法、位置決め装置、および露光装置 |
| US5187543A (en) * | 1990-01-19 | 1993-02-16 | Zygo Corporation | Differential displacement measuring interferometer |
| DE69115914T2 (de) * | 1990-08-31 | 1996-05-30 | Commw Scient Ind Res Org | Interferenzmikroskop |
| NL9100215A (nl) * | 1991-02-07 | 1992-09-01 | Asm Lithography Bv | Inrichting voor het repeterend afbeelden van een maskerpatroon op een substraat. |
| EP0514579B1 (en) * | 1991-05-24 | 1995-07-19 | Hewlett-Packard Company | A heterodyne interferometer arrangement |
| US5363196A (en) * | 1992-01-10 | 1994-11-08 | Ultratech Stepper, Inc. | Apparatus for measuring a departure from flatness or straightness of a nominally-plane mirror for a precision X-Y movable-stage |
| US5464715A (en) * | 1993-04-02 | 1995-11-07 | Nikon Corporation | Method of driving mask stage and method of mask alignment |
| US5408318A (en) * | 1993-08-02 | 1995-04-18 | Nearfield Systems Incorporated | Wide range straightness measuring stem using a polarized multiplexed interferometer and centered shift measurement of beam polarization components |
| JPH08117083A (ja) | 1994-10-21 | 1996-05-14 | Mitsuru Yoshida | スリッパ自動反転機 |
| JPH08227839A (ja) * | 1995-02-20 | 1996-09-03 | Nikon Corp | 移動鏡曲がりの計測方法 |
| JPH0933218A (ja) * | 1995-07-25 | 1997-02-07 | Nikon Corp | 光波干渉測定装置 |
| US5663793A (en) * | 1995-09-05 | 1997-09-02 | Zygo Corporation | Homodyne interferometric receiver and calibration method having improved accuracy and functionality |
| JP3653827B2 (ja) * | 1995-10-20 | 2005-06-02 | 株式会社ニコン | 干渉計 |
| JPH09162113A (ja) * | 1995-12-04 | 1997-06-20 | Nikon Corp | 直交度測定方法及びステージ装置並びに露光装置 |
| EP0824722B1 (en) * | 1996-03-06 | 2001-07-25 | Asm Lithography B.V. | Differential interferometer system and lithographic step-and-scan apparatus provided with such a system |
| JPH09275072A (ja) * | 1996-04-05 | 1997-10-21 | Nikon Corp | 移動鏡の真直度誤差補正方法及びステージ装置 |
| DE19637777C1 (de) * | 1996-09-17 | 1997-11-20 | Leica Mikroskopie & Syst | Verfahren und Vorrichtung zur Fehlerkorrektur eines Heterodyn-Interferometers |
| US5724136A (en) * | 1996-10-15 | 1998-03-03 | Zygo Corporation | Interferometric apparatus for measuring motions of a stage relative to fixed reflectors |
| US5757160A (en) * | 1996-12-23 | 1998-05-26 | Svg Lithography Systems, Inc. | Moving interferometer wafer stage |
| JPH10260009A (ja) | 1997-03-21 | 1998-09-29 | Nikon Corp | 座標測定装置 |
| US6057921A (en) * | 1997-07-08 | 2000-05-02 | Etec Systems, Inc. | Two piece mirror arrangement for interferometrically controlled stage |
| US6020964A (en) * | 1997-12-02 | 2000-02-01 | Asm Lithography B.V. | Interferometer system and lithograph apparatus including an interferometer system |
| US6330105B1 (en) * | 1998-05-29 | 2001-12-11 | Litton Systems, Inc. | Double-pass fully isolated broadband optical signal source for fiber optic interferometric sensors |
| JP4065468B2 (ja) * | 1998-06-30 | 2008-03-26 | キヤノン株式会社 | 露光装置及びこれを用いたデバイスの製造方法 |
| US6181420B1 (en) * | 1998-10-06 | 2001-01-30 | Zygo Corporation | Interferometry system having reduced cyclic errors |
| US6137574A (en) * | 1999-03-15 | 2000-10-24 | Zygo Corporation | Systems and methods for characterizing and correcting cyclic errors in distance measuring and dispersion interferometry |
| US6252668B1 (en) * | 1999-11-19 | 2001-06-26 | Zygo Corporation | Systems and methods for quantifying nonlinearities in interferometry systems |
| US6246481B1 (en) * | 1999-11-19 | 2001-06-12 | Zygo Corporation | Systems and methods for quantifying nonlinearities in interferometry systems |
| US6687013B2 (en) * | 2000-03-28 | 2004-02-03 | Hitachi, Ltd. | Laser interferometer displacement measuring system, exposure apparatus, and electron beam lithography apparatus |
| WO2001090686A1 (en) * | 2000-05-19 | 2001-11-29 | Zygo Corporation | In-situ mirror characterization |
| US6541759B1 (en) * | 2000-06-20 | 2003-04-01 | Zygo Corporation | Interferometry system having a dynamic beam-steering assembly for measuring angle and distance and employing optical fibers for remote photoelectric detection |
| US6747744B2 (en) * | 2000-11-20 | 2004-06-08 | Zygo Corporation | Interferometric servo control system for stage metrology |
| JP2004530869A (ja) * | 2001-03-13 | 2004-10-07 | ザイゴ コーポレーション | 平均干渉位置測定におけるサイクリック・エラーの低減 |
| US7019843B2 (en) * | 2001-05-10 | 2006-03-28 | Zygo Corporation | Method and apparatus for stage mirror mapping |
| JP2002365016A (ja) * | 2001-06-07 | 2002-12-18 | Nikon Corp | 干渉計を用いた位置測定方法、干渉式位置測定装置、露光装置及び露光方法 |
| JP2005518523A (ja) * | 2001-08-20 | 2005-06-23 | ザイゴ コーポレイション | インサイチュでの鏡の特徴付け |
| US7030994B2 (en) * | 2002-02-12 | 2006-04-18 | Zygo Corporation | Method and apparatus to measure fiber optic pickup errors in interferometry systems |
| WO2004113826A2 (en) * | 2003-06-19 | 2004-12-29 | Zygo Corporation | Compensation for imperfections in a measurement object and for beam misalignments in plane mirror interferometers |
| US7375823B2 (en) * | 2004-04-22 | 2008-05-20 | Zygo Corporation | Interferometry systems and methods of using interferometry systems |
-
2003
- 2003-05-13 WO PCT/US2003/014915 patent/WO2003095940A2/en not_active Ceased
- 2003-05-13 US US10/437,271 patent/US7330274B2/en not_active Expired - Fee Related
- 2003-05-13 JP JP2004503890A patent/JP2005525548A/ja active Pending
- 2003-05-13 AU AU2003234413A patent/AU2003234413A1/en not_active Abandoned
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP2005525548A5 (enExample) | ||
| KR101247898B1 (ko) | 위치 검출 장치, 노광 장치, 디바이스 제조 방법, 위치 검출 방법 및 노광 방법 | |
| JP2022019719A (ja) | 検査装置の照明源、検査装置および検査方法 | |
| TWI795633B (zh) | 基於空心光子晶體光纖之用於產生寬帶輻射的光學組件 | |
| JP7147738B2 (ja) | 計測装置及び計測方法、並びに露光装置 | |
| TWI637246B (zh) | Projection exposure device and method | |
| CN101180582B (zh) | 光刻设备和器件制造方法 | |
| WO2007123189A1 (ja) | 露光装置及び露光方法並びにデバイスの製造方法 | |
| TWI771783B (zh) | 微影裝置、圖案形成方法以及物品的製造方法 | |
| TWI417679B (zh) | 微影裝置及圖案化元件 | |
| JP2020190742A (ja) | リソグラフィ装置 | |
| JP2004014876A (ja) | 調整方法、空間像計測方法及び像面計測方法、並びに露光装置 | |
| JP2015535953A (ja) | 定量的レチクル歪み測定システム | |
| JP6496077B2 (ja) | 位置測定システム、干渉計、及びリソグラフィ装置 | |
| JP4099122B2 (ja) | リソグラフ装置およびデバイスの製造方法 | |
| WO1999050893A1 (en) | Exposure method and exposure system | |
| JP2006030021A (ja) | 位置検出装置及び位置検出方法 | |
| JP5773735B2 (ja) | 露光装置、および、デバイス製造方法 | |
| TW200931184A (en) | Exposure apparatus, exposure method, and device manufacturing method | |
| JP2022125866A (ja) | 露光装置、および物品の製造方法 | |
| WO2005001913A1 (ja) | ステージ制御装置及び方法並びに露光装置及び方法 | |
| JP4418782B2 (ja) | リソグラフィ装置、デバイス製造方法、較正方法およびコンピュータ・プログラム製品 | |
| JPH09199407A (ja) | 投影露光装置及び半導体ディバイスの製造方法 | |
| TWI747494B (zh) | 作為對準源之雷射模組、度量衡系統、及微影裝置 | |
| KR20080114423A (ko) | 전자빔 리소그래피 장비의 포토마스크 위치 보정 장치 |