AU2003234413A1 - Compensation for geometric effects of beam misalignments in plane mirror interferometers - Google Patents

Compensation for geometric effects of beam misalignments in plane mirror interferometers

Info

Publication number
AU2003234413A1
AU2003234413A1 AU2003234413A AU2003234413A AU2003234413A1 AU 2003234413 A1 AU2003234413 A1 AU 2003234413A1 AU 2003234413 A AU2003234413 A AU 2003234413A AU 2003234413 A AU2003234413 A AU 2003234413A AU 2003234413 A1 AU2003234413 A1 AU 2003234413A1
Authority
AU
Australia
Prior art keywords
compensation
plane mirror
geometric effects
mirror interferometers
beam misalignments
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2003234413A
Other languages
English (en)
Inventor
Henry A. Hill
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Zygo Corp
Original Assignee
Zygo Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Zygo Corp filed Critical Zygo Corp
Publication of AU2003234413A1 publication Critical patent/AU2003234413A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02001—Interferometers characterised by controlling or generating intrinsic radiation properties
    • G01B9/02002—Interferometers characterised by controlling or generating intrinsic radiation properties using two or more frequencies
    • G01B9/02003—Interferometers characterised by controlling or generating intrinsic radiation properties using two or more frequencies using beat frequencies
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02015—Interferometers characterised by the beam path configuration
    • G01B9/02017—Interferometers characterised by the beam path configuration with multiple interactions between the target object and light beams, e.g. beam reflections occurring from different locations
    • G01B9/02018—Multipass interferometers, e.g. double-pass
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02015—Interferometers characterised by the beam path configuration
    • G01B9/02017—Interferometers characterised by the beam path configuration with multiple interactions between the target object and light beams, e.g. beam reflections occurring from different locations
    • G01B9/02019—Interferometers characterised by the beam path configuration with multiple interactions between the target object and light beams, e.g. beam reflections occurring from different locations contacting different points on same face of object
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02055—Reduction or prevention of errors; Testing; Calibration
    • G01B9/02056—Passive reduction of errors
    • G01B9/02061—Reduction or prevention of effects of tilts or misalignment
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70775—Position control, e.g. interferometers or encoders for determining the stage position
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B2290/00—Aspects of interferometers not specifically covered by any group under G01B9/02
    • G01B2290/70—Using polarization in the interferometer

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Instruments For Measurement Of Length By Optical Means (AREA)
  • Length Measuring Devices By Optical Means (AREA)
AU2003234413A 2002-05-13 2003-05-13 Compensation for geometric effects of beam misalignments in plane mirror interferometers Abandoned AU2003234413A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US37800402P 2002-05-13 2002-05-13
US60/378,004 2002-05-13
PCT/US2003/014915 WO2003095940A2 (en) 2002-05-13 2003-05-13 Compensation for geometric effects of beam misalignments in plane mirror interferometers

Publications (1)

Publication Number Publication Date
AU2003234413A1 true AU2003234413A1 (en) 2003-11-11

Family

ID=29420359

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2003234413A Abandoned AU2003234413A1 (en) 2002-05-13 2003-05-13 Compensation for geometric effects of beam misalignments in plane mirror interferometers

Country Status (4)

Country Link
US (1) US7330274B2 (enExample)
JP (1) JP2005525548A (enExample)
AU (1) AU2003234413A1 (enExample)
WO (1) WO2003095940A2 (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN112013972A (zh) * 2019-05-28 2020-12-01 中国科学院上海光学精密机械研究所 横向剪切干涉波前传感器的剪切量标定装置及方法

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2004113826A2 (en) 2003-06-19 2004-12-29 Zygo Corporation Compensation for imperfections in a measurement object and for beam misalignments in plane mirror interferometers
WO2005045529A2 (en) * 2003-11-04 2005-05-19 Zygo Corporation Characterization and compensation of errors in multi-axis interferometry system
WO2006041984A2 (en) * 2004-10-06 2006-04-20 Zygo Corporation Error correction in interferometry systems
US7405833B2 (en) * 2004-11-05 2008-07-29 Zygo Corporation Method for calibration and removal of wavefront errors
WO2006102234A2 (en) * 2005-03-18 2006-09-28 Zygo Corporation Multi-axis interferometer with procedure and data processing for mirror mapping
US7359057B2 (en) * 2005-08-26 2008-04-15 Ball Aerospace & Technologies Corp. Method and apparatus for measuring small shifts in optical wavelengths
JP4659019B2 (ja) * 2007-12-21 2011-03-30 大学共同利用機関法人自然科学研究機構 波面センサ
US8934104B2 (en) * 2010-01-22 2015-01-13 Universitaet Stuttgart Method and arrangement for robust interferometry for detecting a feature of an object
CN102834766B (zh) * 2010-04-01 2015-04-22 皇家飞利浦电子股份有限公司 激光扫描系统、毛发切割设备和相应的方法
US9213227B2 (en) * 2011-08-18 2015-12-15 Nikon Corporation Custom color or polarization sensitive CCD for separating multiple signals in autofocus projection system
DE102016014802B4 (de) 2016-12-13 2018-09-27 Universität Stuttgart Anordnung und Verfahren zur robusten Zweistrahl-Interferometrie mit einer Dreifach-Reflexions-Anordnung
US10883816B2 (en) 2017-03-22 2021-01-05 Asml Netherlands B.V. Position measurement system, zeroing method, lithographic apparatus and device manufacturing method
US10998163B2 (en) * 2018-05-11 2021-05-04 University Of Maryland, College Park Cryogenic trapped-ion system
CN110553580B (zh) * 2019-06-04 2022-05-20 南京英特飞光电技术有限公司 一种倾斜入射相移干涉仪和直角棱镜大面测量方法
CN110441311B (zh) * 2019-07-22 2021-10-08 中国科学院上海光学精密机械研究所 用于多物面成像的多轴多焦镜头
CN111707616B (zh) * 2020-06-30 2023-02-21 西安工业大学 角分辨散射检测装置的多轴运动系统和检测方法
US20240053136A1 (en) * 2020-12-18 2024-02-15 Rapid Phenotyping Pty Limited Method of Processing Interferometry Signal, and Associated Interferometer
CN113607047B (zh) * 2021-08-04 2022-04-22 中国科学院长春光学精密机械与物理研究所 外差干涉信号模拟系统

Family Cites Families (43)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4790651A (en) * 1987-09-30 1988-12-13 Chesapeake Laser Systems, Inc. Tracking laser interferometer
JP2704734B2 (ja) * 1988-09-05 1998-01-26 キヤノン株式会社 ステージ位置決め補正方法及び装置
US5064289A (en) * 1989-02-23 1991-11-12 Hewlett-Packard Company Linear-and-angular measuring plane mirror interferometer
US5151749A (en) * 1989-06-08 1992-09-29 Nikon Corporation Method of and apparatus for measuring coordinate position and positioning an object
JP3295846B2 (ja) * 1989-06-08 2002-06-24 株式会社ニコン 位置測定方法、位置測定装置、位置決め方法、位置決め装置、および露光装置
US5187543A (en) * 1990-01-19 1993-02-16 Zygo Corporation Differential displacement measuring interferometer
DE69115914T2 (de) * 1990-08-31 1996-05-30 Commw Scient Ind Res Org Interferenzmikroskop
NL9100215A (nl) * 1991-02-07 1992-09-01 Asm Lithography Bv Inrichting voor het repeterend afbeelden van een maskerpatroon op een substraat.
EP0514579B1 (en) * 1991-05-24 1995-07-19 Hewlett-Packard Company A heterodyne interferometer arrangement
US5363196A (en) * 1992-01-10 1994-11-08 Ultratech Stepper, Inc. Apparatus for measuring a departure from flatness or straightness of a nominally-plane mirror for a precision X-Y movable-stage
US5464715A (en) * 1993-04-02 1995-11-07 Nikon Corporation Method of driving mask stage and method of mask alignment
US5408318A (en) * 1993-08-02 1995-04-18 Nearfield Systems Incorporated Wide range straightness measuring stem using a polarized multiplexed interferometer and centered shift measurement of beam polarization components
JPH08117083A (ja) 1994-10-21 1996-05-14 Mitsuru Yoshida スリッパ自動反転機
JPH08227839A (ja) * 1995-02-20 1996-09-03 Nikon Corp 移動鏡曲がりの計測方法
JPH0933218A (ja) * 1995-07-25 1997-02-07 Nikon Corp 光波干渉測定装置
US5663793A (en) * 1995-09-05 1997-09-02 Zygo Corporation Homodyne interferometric receiver and calibration method having improved accuracy and functionality
JP3653827B2 (ja) * 1995-10-20 2005-06-02 株式会社ニコン 干渉計
JPH09162113A (ja) * 1995-12-04 1997-06-20 Nikon Corp 直交度測定方法及びステージ装置並びに露光装置
EP0824722B1 (en) * 1996-03-06 2001-07-25 Asm Lithography B.V. Differential interferometer system and lithographic step-and-scan apparatus provided with such a system
JPH09275072A (ja) * 1996-04-05 1997-10-21 Nikon Corp 移動鏡の真直度誤差補正方法及びステージ装置
DE19637777C1 (de) * 1996-09-17 1997-11-20 Leica Mikroskopie & Syst Verfahren und Vorrichtung zur Fehlerkorrektur eines Heterodyn-Interferometers
US5724136A (en) * 1996-10-15 1998-03-03 Zygo Corporation Interferometric apparatus for measuring motions of a stage relative to fixed reflectors
US5757160A (en) * 1996-12-23 1998-05-26 Svg Lithography Systems, Inc. Moving interferometer wafer stage
JPH10260009A (ja) 1997-03-21 1998-09-29 Nikon Corp 座標測定装置
US6057921A (en) * 1997-07-08 2000-05-02 Etec Systems, Inc. Two piece mirror arrangement for interferometrically controlled stage
US6020964A (en) * 1997-12-02 2000-02-01 Asm Lithography B.V. Interferometer system and lithograph apparatus including an interferometer system
US6330105B1 (en) * 1998-05-29 2001-12-11 Litton Systems, Inc. Double-pass fully isolated broadband optical signal source for fiber optic interferometric sensors
JP4065468B2 (ja) * 1998-06-30 2008-03-26 キヤノン株式会社 露光装置及びこれを用いたデバイスの製造方法
US6181420B1 (en) * 1998-10-06 2001-01-30 Zygo Corporation Interferometry system having reduced cyclic errors
US6137574A (en) * 1999-03-15 2000-10-24 Zygo Corporation Systems and methods for characterizing and correcting cyclic errors in distance measuring and dispersion interferometry
US6252668B1 (en) * 1999-11-19 2001-06-26 Zygo Corporation Systems and methods for quantifying nonlinearities in interferometry systems
US6246481B1 (en) * 1999-11-19 2001-06-12 Zygo Corporation Systems and methods for quantifying nonlinearities in interferometry systems
US6687013B2 (en) * 2000-03-28 2004-02-03 Hitachi, Ltd. Laser interferometer displacement measuring system, exposure apparatus, and electron beam lithography apparatus
WO2001090686A1 (en) * 2000-05-19 2001-11-29 Zygo Corporation In-situ mirror characterization
US6541759B1 (en) * 2000-06-20 2003-04-01 Zygo Corporation Interferometry system having a dynamic beam-steering assembly for measuring angle and distance and employing optical fibers for remote photoelectric detection
US6747744B2 (en) * 2000-11-20 2004-06-08 Zygo Corporation Interferometric servo control system for stage metrology
JP2004530869A (ja) * 2001-03-13 2004-10-07 ザイゴ　コーポレーション 平均干渉位置測定におけるサイクリック・エラーの低減
US7019843B2 (en) * 2001-05-10 2006-03-28 Zygo Corporation Method and apparatus for stage mirror mapping
JP2002365016A (ja) * 2001-06-07 2002-12-18 Nikon Corp 干渉計を用いた位置測定方法、干渉式位置測定装置、露光装置及び露光方法
JP2005518523A (ja) * 2001-08-20 2005-06-23 ザイゴ コーポレイション インサイチュでの鏡の特徴付け
US7030994B2 (en) * 2002-02-12 2006-04-18 Zygo Corporation Method and apparatus to measure fiber optic pickup errors in interferometry systems
WO2004113826A2 (en) * 2003-06-19 2004-12-29 Zygo Corporation Compensation for imperfections in a measurement object and for beam misalignments in plane mirror interferometers
US7375823B2 (en) * 2004-04-22 2008-05-20 Zygo Corporation Interferometry systems and methods of using interferometry systems

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN112013972A (zh) * 2019-05-28 2020-12-01 中国科学院上海光学精密机械研究所 横向剪切干涉波前传感器的剪切量标定装置及方法
CN112013972B (zh) * 2019-05-28 2024-03-01 中国科学院上海光学精密机械研究所 横向剪切干涉波前传感器的剪切量标定装置及方法

Also Published As

Publication number Publication date
US7330274B2 (en) 2008-02-12
WO2003095940A3 (en) 2004-02-12
JP2005525548A (ja) 2005-08-25
US20030223077A1 (en) 2003-12-04
WO2003095940A2 (en) 2003-11-20

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Legal Events

Date Code Title Description
MK6 Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase
TH Corrigenda

Free format text: IN VOL 18, NO 2, PAGE(S) 614 UNDER THE HEADING APPLICATIONS OPI - NAME INDEX UNDER THE NAME ZYGO CORPORATION, APPLICATION NO. 2003234413, UNDER INID(43) CORRECT THE PUBLICATION DATE TO READ 24.11.2003